Patents by Inventor Dzmitry Labetski
Dzmitry Labetski has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9013679Abstract: A collector mirror assembly includes a collector mirror that includes a reflective surface and a hole having an edge. The hole extends through the reflective surface. The assembly also includes a tubular body having an inner surface and an outer surface. The tubular body is constructed and arranged to guide a gas flow in a direction substantially transverse to the reflective surface. The outer surface of the tubular body and the edge of the hole form an opening arranged to guide a further gas flow that diverges with respect the gas flow substantially transverse to the reflective surface.Type: GrantFiled: March 18, 2011Date of Patent: April 21, 2015Assignee: ASML Netherlands B.V.Inventors: Dzmitry Labetski, Erik Roelof Loopstra, Antonius Theodorus Wilhelmus Kempen
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Publication number: 20150077729Abstract: A module for producing extreme ultraviolet radiation, including an extreme ultraviolet radiation-emitting source, the source being provided with a supply configured to supply a fluid of an ignition material to a predetermined target ignition position and a target-igniting mechanism constructed and arranged to produce a plasma from the ignition material at the target ignition position, the plasma emitting the extreme ultraviolet radiation; a collector mirror constructed and arranged to focus radiation emitted by the plasma at a focal point; and a heat sink having a thermal energy-diverting surface constructed and arranged to divert thermal energy away from the target ignition position, wherein the heat sink is located at a position proximate the target ignition position.Type: ApplicationFiled: November 4, 2014Publication date: March 19, 2015Applicant: ASML NETHERLANDS B.V.Inventors: Tjarko Adriaan Rudolf VAN EMPEL, Vadim Yevgenyevich BANINE, Vladimir Vitalevich IVANOV, Erik Roelof LOOPSTRA, Johannes Hubertus Josephina MOORS, Jan Bernard Plechelmus VAN SCHOOT, Yuri Johannes Gabriël VAN DE VIJVER, Gerardus Hubertus Petrus Maria SWINKELS, Hendrikus Gijsbertus SCHIMMEL, Dzmitry LABETSKI
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Publication number: 20150029478Abstract: A fuel stream generator comprising a nozzle connected to a fuel reservoir, wherein the nozzle is provided with a gas inlet configured to provide a sheath of gas around fuel flowing along the nozzle is disclosed. Also disclosed are a method of generating fuel droplets and a lithography apparatus incorporating the fuel stream generator.Type: ApplicationFiled: January 22, 2013Publication date: January 29, 2015Applicant: ASML Netherlands B.V.Inventors: Hendrikus Gijsbertus Schimmel, Dzmitry Labetski
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Publication number: 20150002830Abstract: Methods and apparatus are provided for promoting the coalescence of fuel droplets in a stream generated by a radiation source droplet stream generator for use in lithographic apparatus. Various examples are described in which a modulating voltage source is applied to the emitter so that the electrical characteristics of the droplets may be controlled. This results in acceleration and deceleration of droplets in the stream which causes them to merge and promotes coalescence.Type: ApplicationFiled: July 31, 2012Publication date: January 1, 2015Applicant: ASML Netherlands B.V.Inventors: Hendrikus Gijsbertus Schimmel, Johan Frederik Dijksman, Dzmitry Labetski
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Patent number: 8901521Abstract: A module for producing extreme ultraviolet radiation includes a supply configured to supply droplets of an ignition material to a predetermined target ignition position and a laser arranged to be focused on the predetermined target ignition position and to produce a plasma by hitting such a droplet which is located at the predetermined target ignition position in order to change the droplet into an extreme ultraviolet producing plasma. Also, the module includes a collector mirror having a mirror surface constructed and arranged to reflect the radiation in order to focus the radiation on a focal point. A fluid supply is constructed and arranged to form a gas flow flowing away from the mirror surface in a direction transverse with respect to the mirror surface in order to mitigate particle debris produced by the plasma.Type: GrantFiled: August 25, 2008Date of Patent: December 2, 2014Assignee: ASML Netherlands B.V.Inventors: Tjarko Adriaan Rudolf Van Empel, Vadim Yevgenyevich Banine, Vladimir Vitalevich Ivanov, Erik Roelof Loopstra, Johannes Hubertus Josephina Moors, Jan Bernard Plechelmus Van Schoot, Yuri Johannes Gabriël Van De Vijver, Gerardus Hubertus Petrus Maria Swinkels, Hendrikus Gijsbertus Schimmel, Dzmitry Labetski
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Patent number: 8755032Abstract: A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a plasma formation site located at a position in which a fuel will be contacted by a beam of radiation to form a plasma, an outlet configured to allow gas to exit the radiation source, and a contamination trap at least partially located inside the outlet. The contamination trap is configured to trap debris particles that are generated with the formation of the plasma.Type: GrantFiled: July 21, 2009Date of Patent: June 17, 2014Assignee: ASML Netherlands B.V.Inventors: Andrei Mikhailovich Yakunin, Vadim Yevgenyevich Banine, Vladimir Vitalevich Ivanov, Erik Roelof Loopstra, Vladimir Mihailovitch Krivtsun, Gerardus Hubertus Petrus Maria Swinkels, Dzmitry Labetski
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Patent number: 8749756Abstract: A lithographic apparatus is arranged to project a pattern from a patterning device onto a substrate is disclosed. The lithographic apparatus includes an illumination system and an outlet connected to a pumping system to pump away gas from between an inner wall and outer wall of the illumination system or, if a radiation source is present, between the inner wall of the illumination system and an inner wall of the radiation source.Type: GrantFiled: January 30, 2012Date of Patent: June 10, 2014Assignee: ASML Netherlands B.V.Inventors: Yuri Johannes Gabrial Van De Vijver, Jan Bernard Plechelmus Van Schoot, Gerardus Hubertus Petrus Maria Swinkels, Hendrikus Gijsbertus Schimmel, Dzmitry Labetski, Tjarko Adriaan Rudolf Van Empel
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Patent number: 8711325Abstract: The invention relates to a method for determining a suppression factor of a suppression system. The suppression system is arranged to suppress migration of a contaminant gas out of a first system. The suppression factor is an indication of the performance of the suppression system. The method includes introducing a tracer gas in the sub-system, providing a detection system configured to detect the amount of tracer gas that has migrated out of the first system, determining a first suppression factor for the suppression system for the tracer gas. The method further includes determining a second suppression factor for the suppression system for the contaminant gas based on the first suppression factor.Type: GrantFiled: November 6, 2008Date of Patent: April 29, 2014Assignee: ASML Netherlands B.V.Inventors: Hendrikus Gijsbertus Schimmel, Tjarko Adriaan Rudolf Van Empel, Hans Johannes Maria Freriks, Yuri Johannes Gabriël Van De Vijver, Gerardus Hubertus Petrus Maria Swinkels, Marc Antonius Maria Haast, Wendelin Johanna Maria Versteeg, Peter Gerardus Jonkers, Dzmitry Labetski
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Publication number: 20130088697Abstract: A collector mirror assembly includes a collector mirror that includes a reflective surface and a hole having an edge. The hole extends through the reflective surface. The assembly also includes a tubular body having an inner surface and an outer surface. The tubular body is constructed and arranged to guide a gas flow in a direction substantially transverse to the reflective surface. The outer surface of the tubular body and the edge of the hole form an opening arranged to guide a further gas flow that diverges with respect the gas flow substantially transverse to the reflective surface.Type: ApplicationFiled: March 18, 2011Publication date: April 11, 2013Applicant: ASML Netherlands B.V.Inventors: Dzmitry Labetski, Erik Roelof Loopstra, Antonius Theodorus Wilhelmus Kempen
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Publication number: 20130077070Abstract: A radiation source comprises a reservoir, a nozzle, a laser, and a positive lens. The reservoir is configured to retain a volume of fuel. The nozzle, in fluid connection with the reservoir, is configured to direct a stream of fuel along a trajectory towards a plasma formation location. The laser configured to direct laser radiation at the stream at the plasma formation location to generate, in use, a radiation generating plasma. The positive lens arrangement configured to focus an at least potential spread of trajectories of the stream of fuel toward the plasma formation location, the lens comprising an electric field generating element and/or a magnetic field generating element.Type: ApplicationFiled: August 29, 2012Publication date: March 28, 2013Applicant: ASML Netherlands B.V.Inventors: Hendrikus Gijsbertus SCHIMMEL, Johan Frederik Dijksman, Dzmitry Labetski
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Patent number: 8405055Abstract: A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a fuel supply configured to supply a fuel to a plasma formation site; a laser configured to emit a beam of radiation to the plasma formation site so that a plasma that emits extreme ultraviolet radiation is generated when the beam of radiation impacts the fuel; a fuel particulate interceptor constructed and arranged to shield at least part of the radiation source from fuel particulates that are emitted by the plasma, the fuel particulate interceptor comprising a first portion and a second portion, the second portion being positioned closer to the plasma formation site than the first portion, and the first portion being rotatable; and a fuel particulate remover constructed and arranged to remove fuel particulates from a surface of the fuel particulate interceptor and to direct the fuel particulates towards a collection location.Type: GrantFiled: September 24, 2009Date of Patent: March 26, 2013Assignee: ASML Netherlands B.V.Inventors: Dzmitry Labetski, Vadim Yevgenyevich Banine, Erik Roelof Loopstra, Johannes Hubertus Josephina Moors, Gerardus Hubertus Petrus Maria Swinkels
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Patent number: 8368032Abstract: A plasma radiation source includes a vessel configured to catch a source material transmitted along a trajectory, and a decelerator configured to reduce a speed of the source material in a section of the trajectory downstream of a plasma initiation site.Type: GrantFiled: February 25, 2010Date of Patent: February 5, 2013Assignee: ASML Netherlands B.V.Inventors: Dzmitry Labetski, Erik Roelof Loopstra, Gerardus Hubertus Petrus Maria Swinkels, Tom Van Zutphen
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Publication number: 20120327381Abstract: A radiation source for generating extreme ultraviolet radiation for a lithographic apparatus has a debris mitigation device comprising a nozzle arranged at or near an intermediate focus (IF) of the beam of radiation. The nozzle serves to direct a flow of gas (330) towards the radiation source or collector optic in order to deflect particulate debris (43) emitted by the radiation source.Type: ApplicationFiled: January 31, 2011Publication date: December 27, 2012Applicant: ASML Netherlands B.V.Inventors: Dzmitry Labetski, Vadim Yevgenyevich Banine, Erik Roelof Loopstra, Andrei Mikhailovich Yakunin
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Publication number: 20120182536Abstract: An EUV lithographic apparatus includes a source collector apparatus in which the extreme ultraviolet radiation is generated by exciting a fuel to provide a plasma emitting the radiation. The source collector apparatus includes a chamber in fluid communication with a guide way external to the chamber. A pump for circulating buffer gas is part of the guide way, and provides a closed loop buffer gas flow. The gas flowing through the guide way traverses a gas decomposer wherein a compound of fuel material and buffer gas material is decomposed, so that decomposed buffer gas material can be fed back into the closed loop flow path.Type: ApplicationFiled: September 24, 2010Publication date: July 19, 2012Applicant: ASML Netherlands B.V.Inventors: Erik Roelof Loopstra, Vadim Yevgenyevich Banine, Gerardus Hubertus Petrus Maria Swinkels, Sven Pekelder, Dzmitry Labetski, Uwe Bruno Heini Stamm, William N. Partlo
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Patent number: 8220315Abstract: A gas gauge has a gas delivery tube arranged to determine a distance to an object. The gas delivery tube includes a gas conduit through which a suitable measurement gas is supplied. The measurement gas leaves the gas delivery tube under pressure via an outlet and impinges on the object in an interaction area, wherein a pressure of a recoiled gas is measured by a pressure detector. A gas having a low atomic number may be used. The pressure sensor may include a membrane positioned in the gas delivery tube at least partially enveloping the gas conduit at or near the gas outlet. The pressure sensor may include a membrane disk arranged about the gas conduit. The pressure sensor may include a suitable plurality of pressure elements arranged in a substantially common plane and which may be spaced apart yet enveloping the gas conduit.Type: GrantFiled: October 30, 2009Date of Patent: July 17, 2012Assignee: ASML Netherlands B.V.Inventors: Dzmitry Labetski, Yuri Johannes Gabriël Van De Vijver
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Publication number: 20120147348Abstract: A lithographic apparatus is arranged to project a pattern from a patterning device onto a substrate is disclosed. The lithographic apparatus includes an illumination system and an outlet connected to a pumping system to pump away gas from between an inner wall and outer wall of the illumination system or, if a radiation source is present, between the inner wall of the illumination system and an inner wall of the radiation source.Type: ApplicationFiled: January 30, 2012Publication date: June 14, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Yuri Johannes Gabriel VAN DE VIJVER, Tjarko Adriaan Rudolf VAN EMPEL, Jan Bernard Plechelmus VAN SCHOOT, Gerardus Hubertus Petrus Maria SWINKELS, Hendrikus Gijsbertus SCHIMMEL, Dzmitry LABETSKI
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Patent number: 8115900Abstract: A lithographic apparatus is arranged to project a pattern from a patterning device onto a substrate is disclosed. The lithographic apparatus includes an illumination system and an outlet connected to a pumping system to pump away gas from between an inner wall and outer wall of the illumination system or, if a radiation source is present, between the inner wall of the illumination system and an inner wall of the radiation source.Type: GrantFiled: September 17, 2007Date of Patent: February 14, 2012Assignee: ASML Netherlands B.V.Inventors: Yuri Johannes Gabriël Van De Vijver, Jan Bernard Plechelmus Van Schoot, Gerardus Hubertus Petrus Maria Swinkels, Hendrikus Gijsbertus Schimmel, Dzmitry Labetski, Tjarko Adriaan Rudolf Van Empel
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Publication number: 20110261329Abstract: The invention relates to a method for determining a suppression factor of a suppression system. The suppression system is arranged to suppress migration of a contaminant gas out of a first system. The suppression factor is an indication of the performance of the suppression system. The method includes introducing a tracer gas in the sub-system, providing a detection system configured to detect the amount of tracer gas that has migrated out of the first system, determining a first suppression factor for the suppression system for the tracer gas. The method further includes determining a second suppression factor for the suppression system for the contaminant gas based on the first suppression factor.Type: ApplicationFiled: November 6, 2008Publication date: October 27, 2011Applicant: ASML Netherlands B.V.Inventors: Hendrikus Gijsbertus Schimmel, Tjarko Adriaan Rudolf Van Empel, Hans Johannes Maria Freriks, Yuri Johannes Gabriël Van De Vijver, Gerardus Hubertus Petrus Maria Swinkels, Marc Antonius Maria Haast, Wendelin Johanna Maria Versteeg, Peter Gerardus Jonkers, Dzmitry Labetski
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Publication number: 20110164236Abstract: A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a plasma formation site located at a position in which a fuel will be contacted by a beam of radiation to form a plasma, an outlet configured to allow gas to exit the radiation source, and a contamination trap at least partially located inside the outlet. The contamination trap is configured to trap debris particles that are generated with the formation of the plasma.Type: ApplicationFiled: July 21, 2009Publication date: July 7, 2011Inventors: Andrei Mikhailovich Yakunin, Vadim Yevgenyevich Banine, Vladimir Vitalevich Ivanov, Erik Roelof Loopstra, Vladimir Mihailovitch Krivtsun, Gerardus Hubertus Petrus Maria Swinkels, Dzmitry Labetski
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Publication number: 20110024651Abstract: A radiation system configured to generate a radiation beam, the radiation system including a chamber including: a radiation source configured to generate radiation; a radiation beam emission aperture; a radiation collector configured to collect radiation generated by the source, and to transmit the collected radiation to the radiation beam emission aperture; and a spectral purity filter configured to enhance a spectral purity of the radiation to be emitted via the aperture, wherein the spectral purity filter is configured to divide the chamber into a high pressure region and a low pressure region.Type: ApplicationFiled: November 7, 2008Publication date: February 3, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Hendrikus Gijsbertus Schimmel, Tjarko Adriaan Rudolf Van Empel, Gerardus Hubertus Petrus Maria Swinkels, Maarten Marinus Johannes Wilhelmus Van Herpen, Dzmitry Labetski