Abstract: RF-compositions including surfactants, foam stabilizers, monomers, polymers, urethanes, intermediates, metal complexes, phosphate esters as well as telomerization methods are provided.

Abstract: Telomer compositions are provided that can include at least one taxogen unit and a telogon unit, the taxogen unit being one or more of TFP, PFP, VDF, TFMA, PMVE, VF, TFE, CTFE, BrTFE, HFP, dichlorodifluoroethylene, chlorodifluoroethylene, bromodifluoroethylene, ethylenealkyl ether, ethylene, and propylene; the telogen unit being one or more of RFQ or RClQ, wherein the RF group can be an alkyl group having at least four fluorine atoms, the RCl group can be —CCl3, and the Q group can be H, Br, or I. Chemical production processes are also provided that can include exposing a taxogen to a telogen to form a telomer.

Abstract: Production processes and systems are provided that include reacting halogenated compounds, dehalogenating compounds, reacting alcohol's, reacting olefins and a saturated compounds, reacting reactants having at least two —CF3 groups with reactants having cyclic groups. RF-compositions such as RF-intermediates, RF-surfactants, RF-monomers, RF-monomer units, RF-metal complexes, RF-phosphate esters, RF-glycols, RF-urethanes, and/or RF-foam stabilizers. The RF portion can include at least two —CF3 groups, at least three —CF3 groups, and/or at least two —CF3 groups and at least two —CH2— groups. Detergents, emulsifiers, paints, adhesives, inks, wetting agents, foamers, and defoamers including the RF-surfactant composition are provided. Acrylics, resins, and polymers are provided that include a RF-monomer unit. Compositions are provided that include a substrate having a RF-composition thereover.

Abstract: Production processes and systems are provided that include reacting halogenated compounds, dehalogenating compounds, reacting alcohols, reacting olefins and a saturated compounds, reacting reactants having at least two —CF3 groups with reactants having cyclic groups. RF-compositions such as RF-intermediates, RF-surfactants, RF-monomers, RF-monomer units, RF-metal complexes, RF-phosphate esters, RF-glycols, RF-urethanes, and/or RF-foam stabilizers. The RF portion can include at least two —CF3 groups, at least three —CF3 groups, and/or at least two —CF3 groups and at least two —CH2— groups. Detergents, emulsifiers, paints, adhesives, inks, wetting agents, foamers, and defoamers including the RF-surfactant composition are provided. Acrylics, resins, and polymers are provided that include a RF-monomer unit. Compositions are provided that include a substrate having a RF-composition thereover.

Abstract: Compositions comprising are provided wherein RF is a fluorine containing moiety comprising (CF3)2CFCH2(CF3)CH—, (CF3)2CFCH2((CF3)2CF)CH—, (CF3)2CFCH2((CF3)2CH)CH—, (CF3)2CHCH2((CF3)2CF)CH—, ((CF3)2CFCH2)2CH—, (CF3)2CFCH2CF—, (CF3)2CF—, (CF3)2CH—, CF3—, or CnF2n+1—, n being an integer from 2 to 20; R1 is F or H; R2 comprises (CF3)2CF—, (CF3)2CH—, CF3—, F, or H; and R3 comprises (CF3)2CF—, (CF3)2CH—, CF3—, F, or H, such compositions can produced according to processes, and utilized to prevent combustion utilizing systems.

Abstract: There is disclosed a novel mixture of polyhydroxy phenolic curing agents, such as novolac resins blended with a mixture of mono, bis and tris hydroxyaryl phosphine oxides for co-curing epoxy resins and imparting flame resistance thereto. A preferred composition includes a mixture of monohydroxyaryl, bishydroxyaryl and trishydroxyaryl phosphine oxide and a benzoguanamine/phenol/formaldehyde terpolymer which is used along with an epoxy resin to produce flame-resistant printed wiring boards without the use of halogens.