Patents by Inventor E. Putna

E. Putna has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Reducing photoresist line edge roughness using chemically-assisted reflow
    Publication number: 20050084807
    Abstract: Line edge roughness may be reduced by treating a patterned photoresist with a plasticizer. The plasticizer may be utilized in a way to surface treat the photoresist after development. Thereafter, the plasticized photoresist may be subjected to a heating step to reflow the photoresist. The reflow process may reduce the line edge roughness of the patterned, developed photoresist.
    Type: Application
    Filed: October 17, 2003
    Publication date: April 21, 2005
    Inventors: Robert Meagley, Michael Goodner, E. Putna, Shan Clark, Wang Yueh