Abstract: Method and apparatus for particle irradiation of a target, wherein the anisotropic contrast deflection of an irradiation modulator for producing the exposure pattern is produced step by step, the magnitude of the potential difference between the electrodes of a comb electrode is being set, and the structuring of a line probe is controlled by a control logic according to given specifications by utilization of potential setting patterns.

Abstract: The invention relates to a method of and device for producing any desired patterns on a target. The irradiating beam is modulated over the entire cross-sectional area by an electro-magnetic field, which is obtained by a line or two-dimensionally shaped electrode grid, each individual electrode of which can be differently charged and which reflects the irradiation beam or produces a respective strip.

Abstract: This invention is in concern of a method of and a device for adjusting a shaped-electron-beam working device which includes means for deflecting a shaped electron beam in the target plane and means for varying the shaped, preferably rectangular electron beam. The working device is adjusted with respect to the adjustment categories pupil, format or shape, and with respect to format calibration. The adjustment operations are performed substantially without any back-effects upon already obtained adjusted positions so that considerably short adjustment times are obtained.The inventional adjustment method provides a definite adjustment sequence for correcting aberrations visualized via display means, and also provides the device for performing the necessary steps.The invention is employed preferably in lithographic devices for producing microcircuits.