Patents by Inventor Ebraheem Ali Azhar

Ebraheem Ali Azhar has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Facile Large Area Periodic Sub-Micron Photolithography
    Publication number: 20140199518
    Abstract: Disclosed herein are articles and methods useful for the lithographic applications. The articles comprise a wrinkling structure and a photosensitive material. The articles and methods provide low cost alternatives to conventional lithographic applications. This abstract is intended as a scanning tool for purposes of searching in the particular art and is not intended to be limiting of the present invention.
    Type: Application
    Filed: November 15, 2013
    Publication date: July 17, 2014
    Inventors: Hongbin Yu, Hanqing Jiang, Kevin Chen, Ebraheem Ali Azhar, Teng Ma