Patents by Inventor Eckart Theophile

Eckart Theophile has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140170410
    Abstract: The present invention relates to a method for applying a coating to a substrate using cold plasma, wherein particles provided with a polymer coating are fed into a cold plasma at less than 3,000 K and the particles activated by this are deposited on a substrate. The present invention furthermore relates to a substrate coating which can be obtained by the methods according to the invention. The present invention furthermore relates to the use of platelet-shaped particles with a polymer coating with an average thickness of less than 2 ?m in the coating of a substrate using a cold plasma.
    Type: Application
    Filed: July 25, 2012
    Publication date: June 19, 2014
    Applicant: ECKART GMBH
    Inventors: Markus Rupprecht, Christian Wolfrum, Marco Greb, Eckart Theophile
  • Patent number: 8696996
    Abstract: The invention relates to a device and method for generating a barrier discharge in a gas flow, comprising a reactor chamber permeable by the gas from an inflow side to an outflow side, a first electrode, a dielectric that shields the reactor chamber against the first electrode, and a second electrode, wherein the second and the first electrode can be switched to connect to a voltage source. To briefly expose a greater portion, preferably all, of the gas flow through the reactor chamber to a plasma, at least two discharge elements associated with the first electrode and made of electrically conductive material protrude at least partially into the reactor chamber and are electrically insulated from each other and the first and second electrodes, and the second electrode is disposed relative to the discharge elements such that discharges occur between the discharge elements and the second electrode in the reactor chamber.
    Type: Grant
    Filed: March 1, 2013
    Date of Patent: April 15, 2014
    Assignee: Reinhausen Plasma GmbH
    Inventors: Andreas Albrecht, Eckart Theophile