Patents by Inventor Eckehard Ebert

Eckehard Ebert has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Silicon oxide/silicon nitride mask with improved integrity for semiconductor fabrication
    Patent number: 4091169
    Abstract: A semiconductor dielectric layer formed of silicon nitride having a uniform dispersion of carbon therein for providing reduced intrinsic tensile stresses of less than 10 .times. 10.sup.9 dyn/cm.sup.2.
    Type: Grant
    Filed: September 7, 1976
    Date of Patent: May 23, 1978
    Assignee: International Business Machines Corporation
    Inventors: Armin Bohg, Eckehard Ebert, Erich Mirbach