Patents by Inventor Eckehard Onkels

Eckehard Onkels has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8349226
    Abstract: For increasing the laser damage threshold (LDT) of diffraction gratings, particularly of multi-layer dielectric diffraction (MLD) gratings, the invention proposes a method for treating a diffraction grating to be used in a high energy laser apparatus having a first laser with the steps of providing the diffraction grating, providing a second treatment laser and irradiating the diffraction grating with laser light from the second treatment laser until the laser damage threshold of the diffraction grating has increased. Furthermore, the invention proposes a diffraction grating treated according to the method, as well as a laser system, which comprises such a diffraction grating.
    Type: Grant
    Filed: February 16, 2006
    Date of Patent: January 8, 2013
    Assignee: GSI Helmholtzzentrum fur Schwerionenforschung GmbH
    Inventors: Stefan Borneis, Eckehard Onkels, Dasa Javorkova, Paul Neumayer
  • Publication number: 20060126697
    Abstract: An oscillator-amplifier gas discharge laser system and method is disclosed which may comprise a first laser unit which may comprise a first discharge region which may contain an excimer or molecular fluorine lasing gas medium; a first pair of electrodes defining the first discharge region containing the lasing gas medium, a line narrowing unit for narrowing a spectral bandwidth of output laser light pulse beam pulses produced in said first discharge region; a second laser unit which may comprise a second discharge chamber which may contain an excimer or molecular fluorine lasing gas medium; a second pair of electrodes defining the second discharge region containing the lasing gas medium; a pulse power system providing electrical pulses to the first pair of electrodes and to the second pair of electrodes producing gas discharges in the lasing gas medium between the respective first and second pair of electrodes, and laser parameter control mechanism modifying a selected parameter of a selected laser output lig
    Type: Application
    Filed: February 1, 2006
    Publication date: June 15, 2006
    Applicant: Cymer, Inc.
    Inventors: David Knowles, Daniel Brown, Herve Besaucele, David Myers, Alexander Ershov, William Partlo, Richard Sandstrom, Palash Das, Stuart Anderson, Igor Fomenkov, Richard Ujazdowski, Eckehard Onkels, Richard Ness, Scott Smith, William Hulburd, Jeffrey Oicles
  • Publication number: 20050271109
    Abstract: An oscillator-amplifier gas discharge laser system and method is disclosed which may comprise a first laser unit which may comprise a first discharge region which may contain an excimer or molecular fluorine lasing gas medium; a first pair of electrodes defining the first discharge region containing the lasing gas medium, a line narrowing unit for narrowing a spectral bandwidth of output laser light pulse beam pulses produced in said first discharge region; a second laser unit which may comprise a second discharge chamber which may contain an excimer or molecular fluorine lasing gas medium; a second pair of electrodes defining the second discharge region containing the lasing gas medium; a pulse power system providing electrical pulses to the first pair of electrodes and to the second pair of electrodes producing gas discharges in the lasing gas medium between the respective first and second pair of electrodes, and laser parameter control mechanism modifying a selected parameter of a selected laser output lig
    Type: Application
    Filed: August 9, 2005
    Publication date: December 8, 2005
    Applicant: Cymer, Inc.
    Inventors: David Knowles, Daniel Brown, Herve Besaucele, David Myers, Alexander Ershov, William Partlo, Richard Sandstrom, Palash Das, Stuart Anderson, Igor Fomenkov, Richard Ujazdowski, Eckehard Onkels, Richard Ness, Scot Smith, William Hulburd, Jeffrey Oicles
  • Patent number: 5529813
    Abstract: The current invention involves a process for microstructuring surfaces of oriented polymeric substrates using laser radiation having an intensity which is spatially modulated in a predetermined periodic manner. The process is especially useful for microstructuring the surfaces of textile products and films.
    Type: Grant
    Filed: May 18, 1995
    Date of Patent: June 25, 1996
    Assignee: E. I. Du Pont de Nemours and Company
    Inventors: Henry Kobsa, Hermann Bucher, Eckehard Onkels