Abstract: A micromechanical component having at least two caverns is provided, the caverns being delimited by the micromechanical component and a cap, and the caverns having different internal atmospheric pressures. The micromechanical component and cap are hermetically joined to one another at a first specifiable atmospheric pressure, then an access to at least one cavern is produced, and subsequently the access is hermetically closed off at a second specifiable atmospheric pressure.

Abstract: A micromechanical cap structure and a corresponding manufacturing method are described. The micromechanical cap structure includes a first wafer with a micromechanical functional structure, and a second wafer to form a cap over the micromechanical functional structure. The first and second wafers have in their interior a support structure with a metal-semiconductor contact, and in their edge zone a bonding structure. The edge zone of the second wafer, when in the capped state, is arched in relation to the interior of the second wafer.

Abstract: A micromechanical component having a substrate beneath at least one structured layer, in the structured layer at least one functional structure being formed, a cap which covers the functional structure, between the cap and the functional structure at least one cavity being formed, and a connecting layer which connects the cap to structured layer, as well as a method for producing the micromechanical component. To obtain a compact and robust component, the connecting layer is formed from an anodically bondable glass, i.e. a bond glass, which has a thickness in the range of 300 nm to 100 ?m, which may in particular be in the range of 300 nm to 50 ?m.

Abstract: A micromechanical component including a chip which is mounted on a substrate and has an encapsulated chip area which is higher than its vicinity, as well as a mounting area provided in the vicinity of the encapsulated chip area. The chip being mounted on the substrate by a mounting arrangement which is connected to the mounting area, so that the encapsulated chip area faces the substrate and is positioned at a distance therefrom. The encapsulated chip area is surrounded by an underfill beneath the chip. A method for the manufacture of the micromechanical component is also provided.

Abstract: A method for joining a silicon plate to a second plate, a laser beam being directed through the silicon plate at the second plate. In the process, the wavelength of the laser beam is selected in such a way that only a negligibly small amount of energy is absorbed in the silicon plate. A strongly absorbent material is hotmelted by the laser beam's energy and then produces a bond between the silicon plate and the second plate.

Abstract: A method for manufacturing a micromechanical component, that has at least one hollow space and a functional element that is provided at least partially in the hollow space and/or a functional layer that is provided at least partially therein, and a micromechanical component that is manufactured in accordance with the method, are described. To reduce manufacturing costs, the functional element and/or the functional layer is provided with a first protective layer at least in an area that directly or indirectly borders on a first sacrificial layer, which temporarily occupies the space of the hollow space that is subsequently formed in one or a plurality of etching steps, the material of the first protective layer being selected such that at least one etching process and/or etching medium, which etches or dissolves the first sacrificial layer, either does not substantially attack the first protective layer or does so only at a reduced etching rate in comparison to the first sacrificial layer.

Abstract: A method for anodic bonding of wafers and a device essentially composed of such bonded wafers. An intermediate layer is placed between two wafers, after which the two wafers are anodically bonded. The method and the device have the advantage of being implementable and manufacturable, respectively, in a particularly cost-effective manner. The anodically bonded intermediate layer plastically encloses any possible particles present or evens out differences in height of the wafer surfaces to be bonded and thus prevents any extensive bond defects from occurring.

Abstract: A micromechanical component having a substrate beneath at least one structured layer, in the structured layer at least one functional structure being formed, a cap which covers the functional structure, between the cap and the functional structure at least one cavity being formed, and a connecting layer which connects the cap to structured layer, as well as a method for producing the micromechanical component. To obtain a compact and robust component, the connecting layer is formed from an anodically bondable glass, i.e. a bond glass, which has a thickness in the range of 300 nm to 100 ?m, which may in particular be in the range of 300 nm to 50 ?m.

Abstract: A micromechanical cap structure and a corresponding manufacturing method are described. The micromechanical cap structure includes a first wafer with a micromechanical functional structure, and a second wafer to form a cap over the micromechanical functional structure. The first and second wafers have in their interior a support structure with a metal-semiconductor contact, and in their edge zone a bonding structure. The edge zone of the second wafer, when in the capped state, is arched in relation to the interior of the second wafer.

Abstract: A micromechanical component having a substrate beneath at least one structured layer, in the structured layer at least one functional structure being formed, a cap which covers the functional structure, between the cap and the functional structure at least one cavity being formed, and a connecting layer which connects the cap to structured layer, as well as a method for producing the micromechanical component. To obtain a compact and robust component, the connecting layer is formed from an anodically bondable glass, i.e. a bond glass, which has a thickness in the range of 300 nm to 100 &mgr;m, which may in particular be in the range of 300 nm to 50 &mgr;m.

Abstract: A method is proposed for joining a silicon plate (1) to a second plate (2), a laser beam being directed through the silicon plate (1) at the second plate (2). In the process, the wavelength of the laser beam is selected in such a way that only a negligibly small amount of energy is absorbed in the silicon plate (1). A strongly absorbent material is hotmelted by the laser beam's energy and then produces a bond between the silicon plate (1) and the second plate (2).

Abstract: The present invention relates to a method for manufacturing a micromechanical component (100), that has at least one hollow space (110) and a functional element (12) that is provided at least partially in the hollow space (110) and/or a functional layer (13a, 13b, 13c) that is provided at least partially therein, and to a micromechanical component (100) that is manufactured in accordance with the method, according to the species of the relevant independent patent claim.

Abstract: A micromechanical component having a substrate beneath at least one structured layer, in the structured layer at least one functional structure being formed, a cap which covers the functional structure, between the cap and the functional structure at least one cavity being formed, and a connecting layer which connects the cap to structured layer, as well as a method for producing the micromechanical component. To obtain a compact and robust component, the connecting layer is formed from an anodically bondable glass, i.e. a bond glass, which has a thickness in the range of 300 nm to 100 &mgr;m, which may in particular be in the range of 300 nm to 50 &mgr;m.

Abstract: A device, having at least one micromechanical surface structure patterned on a silicon substrate and a cap wafer covering the at least one surface structure. The cap wafer is formed from a glass wafer.

Abstract: A method for sectioning a substrate wafer into a plurality of substrate chips enables a process management that is particularly timesaving and flexible with respect to the producible surface areas of the substrate chips. For this purpose, the substrate chips are separated from one another by a selective deep patterning method, a plasma etching method in particular.

Abstract: A method for sectioning a substrate wafer into a plurality of substrate chips enables a process management that is particularly timesaving and flexible with respect to the producible surface areas of the substrate chips. For this purpose, the substrate chips are separated from one another by a selective deep patterning method, a plasma etching method in particular.

Abstract: A bonding pad structure, in particular for a micromechanical sensor, includes a substrate, an electrically insulating sacrificial layer provided on the substrate, a patterned conductor path layer buried in the sacrificial layer, a contact hole provided in the sacrificial layer, and a bonding pad base, composed of an electrically conductive material. The bonding pad base has a first region extending over the sacrificial layer, and a second layer in contact with the conductor path region and extending through the contact hole. A protective layer is provided at least temporarily on the sacrificial layer in a specific region beneath and around the bonding pad base to prevent underetching of the sacrificial layer beneath the bonding pad base during etching of the sacrificial layer in such a way that the substrate and/or the conductor path is exposed.

Abstract: A method for producing acceleration sensors is proposed, in which a silicon layer that is deposited in an epitaxial application system is used. Above sacrificial layers (2) applied to the substrate (1), the material grows in the form of a polysilicon layer (6), which has a certain surface roughness. By application of a photoresist and by a wet etching process, this surface roughness is eliminated. Alternatively, chemical-mechanical smoothing is contemplated.

Abstract: An inside sealing sleeve 1 comprised of an expandable steel band for insertion in leaking pipes in need of repair is provided with an arresting arrangement 4 which permits very small detent steps. For this purpose, the internal band end 2 is provided with a slot 5 having two rows of teeth 8, 9, while a tensioning pinion 10, a guide pinion 11 and a locking pinion 12 are rotatably seated on the external band end 3. A tensioning spring 17 engages the pivot axle of the locking pinion 12, it keeps the locking pinion 12 in engagement with the guide pinion 11 and pushes it into the gap 21 between locking pinion 10 and guide pinion 11.

Abstract: A resilient sealing sleeve supported by a mounting cart is directed to a leakage point in pipes in order to seal them. The sealing sleeve is raised to the top of the pipe by a raising and lowering device, and widened there in the circumferential direction by a widening device provided on the mounting cart. A stopping device on the sealing sleeve holds the sleeve in its widened position for the purpose of sealing the pipe.