Patents by Inventor Ecran Adem

Ecran Adem has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Vapor treatment for repairing damage of low-k dielectric
    Patent number: 6713382
    Abstract: A method of manufacturing a semiconductor device includes forming a first level, forming a first barrier layer over the first level, forming a dielectric layer over the first barrier layer, forming an opening having side surfaces through the dielectric layer, etching the first barrier layer, and filling the opening with metal to form a first metal feature. The process also includes the step of replacing hydroxyl terminated ions on the side surfaces. This step of replacing the hydroxyl terminated ions can occur after the opening is formed or after the first barrier layer is etched. A semiconductor device produced by the method of manufacturing is also disclosed.
    Type: Grant
    Filed: January 31, 2002
    Date of Patent: March 30, 2004
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Suzette K. Pangrle, Ecran Adem, Calvin Gabriel, Lynne A. Okada