Patents by Inventor Ed Godshalk

Ed Godshalk has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Bragg mirror and method for making same
    Patent number: 8149500
    Abstract: In an embodiment, set forth by way of example and not limitation, a Bragg mirror includes a first bi-layer of a first thickness and a second bi-layer of a second thickness which is different from the first thickness. In this exemplary embodiment, the first bi-layer consists essentially of a first high impedance layer and a first low impedance layer, and the second bi-layer of a second thickness which is different from the first thickness, the second bi-layer consisting essentially of a second high impedance layer and a second low impedance layer. Preferably, the first bi-layer is configured to substantially reflect a first wavelength and the second bi-layer is configured to substantially reflect a second wavelength different from the first wavelength.
    Type: Grant
    Filed: January 30, 2010
    Date of Patent: April 3, 2012
    Assignee: TriQuint Semiconductor, Inc.
    Inventors: Ed Godshalk, Guillaume Bouche
  • Bragg Mirror and Method for Making Same
    Publication number: 20100123948
    Abstract: In an embodiment, set forth by way of example and not limitation, a Bragg mirror includes a first bi-layer of a first thickness and a second bi-layer of a second thickness which is different from the first thickness. In this exemplary embodiment, the first bi-layer consists essentially of a first high impedance layer and a first low impedance layer, and the second bi-layer of a second thickness which is different from the first thickness, the second bi-layer consisting essentially of a second high impedance layer and a second low impedance layer. Preferably, the first bi-layer is configured to substantially reflect a first wavelength and the second bi-layer is configured to substantially reflect a second wavelength different from the first wavelength.
    Type: Application
    Filed: January 30, 2010
    Publication date: May 20, 2010
    Applicant: MAXIM INTEGRATED PRODUCTS, INC.
    Inventors: Ed Godshalk, Guillaume Bouche
  • Bragg mirror optimized for shear waves
    Patent number: 7684109
    Abstract: In an embodiment, set forth by way of example and not limitation, a Bragg mirror includes a first bi-layer of a first thickness and a second bi-layer of a second thickness which is different from the first thickness. In this exemplary embodiment, the first bi-layer consists essentially of a first high impedance layer and a first low impedance layer, and the second bi-layer of a second thickness which is different from the first thickness, the second bi-layer consisting essentially of a second high impedance layer and a second low impedance layer. Preferably, the first bi-layer is configured to substantially reflect a first wavelength and the second bi-layer is configured to substantially reflect a second wavelength different from the first wavelength.
    Type: Grant
    Filed: February 28, 2007
    Date of Patent: March 23, 2010
    Assignee: Maxim Integrated Products, Inc.
    Inventors: Ed Godshalk, Guillaume Bouche
  • Bragg mirror optimized for shear waves
    Publication number: 20080204857
    Abstract: In an embodiment, set forth by way of example and not limitation, a Bragg mirror includes a first bi-layer of a first thickness and a second bi-layer of a second thickness which is different from the first thickness. In this exemplary embodiment, the first bi-layer consists essentially of a first high impedance layer and a first low impedance layer, and the second bi-layer of a second thickness which is different from the first thickness, the second bi-layer consisting essentially of a second high impedance layer and a second low impedance layer. Preferably, the first bi-layer is configured to substantially reflect a first wavelength and the second bi-layer is configured to substantially reflect a second wavelength different from the first wavelength.
    Type: Application
    Filed: February 28, 2007
    Publication date: August 28, 2008
    Applicant: Maxim Integrated Products, Inc.
    Inventors: Ed Godshalk, Guillaume Bouche