Patents by Inventor Ed Ma

Ed Ma has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Multiplexing EUV sources in reticle inspection
    Patent number: 8917432
    Abstract: The present disclosure is directed to an illumination system. The illumination system may include a base member rotatable about a rotation axis and a plurality of mirrors disposed on an outer surface of the base member along a perimeter of the base member. The mirrors may be oriented at a predetermined angle. The illumination system also includes at least two illumination sources. Each of the mirrors of the first plurality of mirrors is configured to receive radiation from the first illumination source at a first portion of each mirror at a first time. The mirror is configured to reflect the radiation to an optical path. Each of the mirrors is further configured to receive radiation from the second illumination source at a second portion of the mirror at a second time. The mirrors reflect the radiation from the second illumination source to the common optical path.
    Type: Grant
    Filed: August 1, 2012
    Date of Patent: December 23, 2014
    Assignee: KLA-Tencor Corporation
    Inventors: Daniel Wack, Daimian Wang, Karl R. Umstadter, Ed Ma, Frank Chilese
  • MULTIPLEXING EUV SOURCES IN RETICLE INSPECTION
    Publication number: 20140036333
    Abstract: The present disclosure is directed to an illumination system. The illumination system may include a base member rotatable about a rotation axis and a plurality of mirrors disposed on an outer surface of the base member along a perimeter of the base member. The mirrors may be oriented at a predetermined angle. The illumination system also includes at least two illumination sources. Each of the mirrors of the first plurality of mirrors is configured to receive radiation from the first illumination source at a first portion of each mirror at a first time. The mirror is configured to reflect the radiation to an optical path. Each of the mirrors is further configured to receive radiation from the second illumination source at a second portion of the mirror at a second time. The mirrors reflect the radiation from the second illumination source to the common optical path.
    Type: Application
    Filed: August 1, 2012
    Publication date: February 6, 2014
    Applicant: KLA-Tencor Corporation
    Inventors: Daniel Wack, Daimian Wang, Karl R. Umstadter, Ed Ma, Frank Chilese