Patents by Inventor Eddie Feigel

Eddie Feigel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Absorbing reflector for semiconductor processing chamber
    Patent number: 10306708
    Abstract: Embodiments of the disclosure generally relate to a reflector for use in a thermal processing chamber. In one embodiment, the thermal processing chamber generally includes an upper dome, a lower dome opposing the upper dome, the upper dome and the lower dome defining an internal volume of the processing chamber, a substrate support disposed within the internal volume, and a reflector positioned above and proximate to the upper dome, wherein the reflector has a heat absorptive coating layer deposited on a side of the reflector facing the substrate support.
    Type: Grant
    Filed: November 28, 2017
    Date of Patent: May 28, 2019
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Kin Pong Lo, Paul Brillhart, Balasubramanian Ramachandran, Satheesh Kuppurao, Daniel Redfield, Joseph M. Ranish, James Francis Mack, Kailash Kiran Patalay, Michael Olsen, Eddie Feigel, Richard Halpin, Brett Vetorino
  • ABSORBING REFLECTOR FOR SEMICONDUCTOR PROCESSING CHAMBER
    Publication number: 20180084610
    Abstract: Embodiments of the disclosure generally relate to a reflector for use in a thermal processing chamber. In one embodiment, the thermal processing chamber generally includes an upper dome, a lower dome opposing the upper dome, the upper dome and the lower dome defining an internal volume of the processing chamber, a substrate support disposed within the internal volume, and a reflector positioned above and proximate to the upper dome, wherein the reflector has a heat absorptive coating layer deposited on a side of the reflector facing the substrate support.
    Type: Application
    Filed: November 28, 2017
    Publication date: March 22, 2018
    Inventors: Kin Pong LO, Paul BRILLHART, Ramachandran BALASUBRAMANIAN, Satheesh KUPPURAO, Daniel REDFIELD, Joseph M. RANISH, James Francis MACK, Kailash Kiran PATALAY, Michael OLSEN, Eddie FEIGEL, Richard HALPIN, Brett VETORINO
  • Absorbing reflector for semiconductor processing chamber
    Patent number: 9832816
    Abstract: Embodiments of the disclosure generally relate to a reflector for use in a thermal processing chamber. In one embodiment, the thermal processing chamber generally includes an upper dome, a lower dome opposing the upper dome, the upper dome and the lower dome defining an internal volume of the processing chamber, a substrate support disposed within the internal volume, and a reflector positioned above and proximate to the upper dome, wherein the reflector has a heat absorptive coating layer deposited on a side of the reflector facing the substrate support.
    Type: Grant
    Filed: April 22, 2014
    Date of Patent: November 28, 2017
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Kin Pong Lo, Paul Brillhart, Balasubramanian Ramachandran, Satheesh Kuppurao, Daniel Redfield, Joseph M. Ranish, James Francis Mack, Kailash Kiran Patalay, Michael Olsen, Eddie Feigel, Richard Halpin, Brett Vetorino
  • ABSORBING REFLECTOR FOR SEMICONDUCTOR PROCESSING CHAMBER
    Publication number: 20140376898
    Abstract: Embodiments of the disclosure generally relate to a reflector for use in a thermal processing chamber. In one embodiment, the thermal processing chamber generally includes an upper dome, a lower dome opposing the upper dome, the upper dome and the lower dome defining an internal volume of the processing chamber, a substrate support disposed within the internal volume, and a reflector positioned above and proximate to the upper dome, wherein the reflector has a heat absorptive coating layer deposited on a side of the reflector facing the substrate support.
    Type: Application
    Filed: April 22, 2014
    Publication date: December 25, 2014
    Inventors: Kin Pong Lo, Paul Brillhart, Balasubramanian Ramachandran, Satheesh Kuppurao, Daniel Redfield, Joseph M. Ranish, James Francis Mack, Kailash Kiran Patalay, Michael Olsen, Eddie Feigel, Richard Halpin, Brett Vetorino