Patents by Inventor Eddy Bos

Eddy Bos has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Device for generating a plasma discharge for patterning the surface of a substrate
    Patent number: 8702902
    Abstract: Device for generating a plasma discharge for patterning the surface of a substrate, comprising a first electrode having a first discharge portion and a second electrode having a second discharge portion, a high voltage source for generating a high voltage difference between the first and the second electrode, and positioning means for positioning the first electrode with respect to the substrate, wherein the positioning means are arranged for selectively positioning the first electrode with respect to the second electrode in a first position in which a distance between the first discharge portion and the second discharge portion is sufficiently small to support the plasma discharge at the high voltage difference, and in a second position in which the distance between the first discharge portion and the second discharge portion is sufficiently large to prevent plasma discharge at the high voltage difference.
    Type: Grant
    Filed: August 20, 2008
    Date of Patent: April 22, 2014
    Assignee: Vision Dynamics Holding B.V.
    Inventors: Paulus Petrus Maria Blom, Philip Rosing, Alquin Alphons Elisabeth Stevens, Laurentia Johanna Huijbregts, Eddy Bos
  • DEVICE FOR GENERATING A PLASMA DISCHARGE FOR PATTERNING THE SURFACE OF A SUBSTRATE
    Publication number: 20110226728
    Abstract: Device for generating a plasma discharge for patterning the surface of a substrate, comprising a first electrode having a first discharge portion and a second electrode having a second discharge portion, a high voltage source for generating a high voltage difference between the first and the second electrode, and positioning means for positioning the first electrode with respect to the substrate, wherein the positioning means are arranged for selectively positioning the first electrode with respect to the second electrode in a first position in which a distance between the first discharge portion and the second discharge portion is sufficiently small to support the plasma discharge at the high voltage difference, and in a second position in which the distance between the first discharge portion and the second discharge portion is sufficiently large to prevent plasma discharge at the high voltage difference.
    Type: Application
    Filed: August 20, 2008
    Publication date: September 22, 2011
    Applicant: VISION DYNAMICS HOLDING B.V.
    Inventors: Paulus Petrus Maria Blom, Philip Rosing, Alquin Alphons Elisabeth Stevens, Laurentia Johanna Huijbregts, Eddy Bos