Abstract: Methods and systems for dry cleaning a semiconductor processing reaction chamber are disclosed herein. In some embodiments, a method for cleaning a semiconductor processing reaction chamber includes: performing a plasma-assisted cleaning process to clean tube deposits formed on an inner surface of the deposition reaction chamber, the plasma-assisted cleaning process comprises: providing a first reactant gas to a remote plasma source chamber to generate a plasma, wherein the plasma comprising a fluorine-containing radical; and providing the plasma from the remote plasma source chamber to the deposition reaction chamber to clean the tube deposits, and performing a chemical cleaning process by providing a second reactant gas to the deposition reaction chamber after performing the plasma dry cleaning process.

Abstract: A vertical furnace includes a heat treatment tube, at least one reactive gas inlet, first adiabatic plates and second adiabatic plates. The at least one reactive gas inlet is disposed at or near a bottom end of the heat treatment tube. The first adiabatic plates are stacked in the heat treatment tube, each of the first adiabatic plates having a flow channel structure for allowing a gas to pass through, in which all the corners in the flow channel structure are rounded. The second adiabatic plates are stacked below the first adiabatic plates in the heat treatment tube.

Abstract: A vertical furnace includes a heat treatment tube, at least one reactive gas inlet, first adiabatic plates and second adiabatic plates. The at least one reactive gas inlet is disposed at or near a bottom end of the heat treatment tube. The first adiabatic plates are stacked in the heat treatment tube, each of the first adiabatic plates having a flow channel structure for allowing a gas to pass through, in which all the corners in the flow channel structure are rounded. The second adiabatic plates are stacked below the first adiabatic plates in the heat treatment tube.

Abstract: Present patent relates to a rolling painting frame, comprising a box (1) having an opening, a scroll mechanism (2) mounted in said box (1) and a slidable drawer (3) mounted in said box (1), said box (1) comprises a bottom surface (100), an opening surface (101) opposite to said bottom surface (100) and four side surfaces; among the four side surfaces, a first side surface (102) has two mounting holes (103) on it; said scroll mechanism (2) comprises two rotary rollers (200) mounted side by side in said two mounting holes (103) respectively and a painting paper (201) which connects said two rotary rollers (200) and seals said opening of the box (1). The rolling painting frame can realize successive painting without changing the painting paper (201) frequently, it's very convenient for users to place related tools into the drawer and adjust the angle of the rolling painting frame so as to draw more comfortable.