Patents by Inventor Edeltraud Steiger

Edeltraud Steiger has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of removing damaged crystal regions from silicon wafers
    Patent number: 5911889
    Abstract: A method is provided to remove crystal regions from silicon wafers which are damaged as a consequence of mechanical machining of the silicon wafers. The silicon wafers are pretreated with an aqueous solution containing hydrogen fluoride. Then the wafers are etched in an aqueous solution exposed to ultrasound and containing alkali metal hydroxide at temperatures from 55.degree. C. to 95.degree. C.
    Type: Grant
    Filed: April 8, 1996
    Date of Patent: June 15, 1999
    Assignee: Wacker Siltronic Gesellschaft fur Halbleitermaterialien Aktiengesellschaft
    Inventors: Laszlo Fabry, Bernd Passer, Edeltraud Steiger