Patents by Inventor Edgar Alberto Osorio Oliveros

Edgar Alberto Osorio Oliveros has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • HIGH FORCE LOW VOLTAGE PIEZOELECTRIC MICROMIRROR ACTUATOR
    Publication number: 20240012332
    Abstract: A micromirror array comprises a substrate, a plurality of mirrors for reflecting incident light and, for each mirror of the plurality of mirrors, at least one multilayer piezoelectric actuator for displacing the mirror, wherein the at least one multilayer piezoelectric actuator is connected to the substrate, and wherein the at least one multilayer piezoelectric actuator comprises a plurality of piezoelectric layers of piezoelectric material interleaved with a plurality of electrode layers to form a stack of layers. Also disclosed is a method of forming such a micromirror array. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and/or in an inspection and/or metrology apparatus.
    Type: Application
    Filed: November 12, 2021
    Publication date: January 11, 2024
    Applicant: ASML Netherlands B.V.
    Inventors: Luc Roger Simonne HASPESLAGH, Nitesh PANDEY, Ties Wouter VAN DER WOORD, Halil Gökay YEGEN, Guilherme BRONDANI TORRI, Sebastianus Adrianus GOORDEN, Alexander Ludwig KLEIN, Jim Vincent OVERKAMP, Edgar Alberto OSORIO OLIVEROS
  • HIGH ACCURACY TEMPERATURE-COMPENSATED PIEZORESISTIVE POSITION SENSING SYSTEM
    Publication number: 20240004184
    Abstract: A micromirror array comprises a substrate, a plurality of mirrors for reflecting incident light and, for each mirror of the plurality of mirrors, at least one piezoelectric actuator for displacing the mirror, wherein the at least one piezoelectric actuator is connected to the substrate. The micromirror array further comprises one or more pillars connecting the mirror to the at least one piezoelectric actuator. Also disclosed is a method of forming such a micromirror array. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and/or in an inspection and/or metrology apparatus.
    Type: Application
    Filed: November 8, 2021
    Publication date: January 4, 2024
    Applicant: ASML Netherlands B.V.
    Inventors: Luc Roger Simonne HASPESLAGH, Nitesh PANDEY, Ties Wouter VAN DER WOORD, Halil Gökay YEGEN, Sebastianus Adrianus GOORDEN, Alexis HUMBLET, Alexander Ludwig KLEIN, Jim Vincent OVERKAMP, Guilherme BRONDANI TORRI, Edgar Alberto OSORIO OLIVEROS
  • Method and apparatus for generating radiation
    Patent number: 9986628
    Abstract: A method of generating radiation for a lithography apparatus. The method comprises providing a continuously renewing fuel target (50) at a plasma formation location (12) and directing a continuous-wave excitation beam (6) at the plasma formation location such that fuel within the continuously renewing fuel target is excited by the continuous-wave excitation beam to a radiation generating plasma.
    Type: Grant
    Filed: October 10, 2013
    Date of Patent: May 29, 2018
    Assignee: ASML Netherlands B.V.
    Inventors: Erik Roelof Loopstra, Andrei Mikhailovich Yakunin, Vadim Yevgenyevich Banine, Andrey Nikipelov, Edgar Alberto Osorio Oliveros, Alexander Matthijs Struycken, Bert Pieter Van Drieënhuizen, Jan Bernard Plechelmus Van Schoot
  • Lithographic apparatus
    Patent number: 9599912
    Abstract: A reflector includes a reflecting surface or structure provided with a cap layer formed from Silicene or a Silicene derivative. The reflector may be provided in a lithographic apparatus.
    Type: Grant
    Filed: May 8, 2013
    Date of Patent: March 21, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventor: Edgar Alberto Osorio Oliveros
  • Multilayer mirror
    Patent number: 9329503
    Abstract: There is provided a multilayer mirror (80) comprising a layer of a first material (84) and a layer of silicon (82). The layer of the first material and the layer of silicon form a stack of layers. An exposed region of the layer of silicon comprises a modification that is arranged to improve the robustness of the exposed region of silicon.
    Type: Grant
    Filed: April 6, 2011
    Date of Patent: May 3, 2016
    Assignee: ASML Netherlands B.V.
    Inventors: Vadim Iourievich Timoshkov, Jan Bernard Plechelmus van Schoot, Antonius Theodorus Wilhelmus Kempen, Andrei Mikhailovich Yakunin, Edgar Alberto Osorio Oliveros
  • Method and Apparatus for Generating Radiation
    Publication number: 20150296602
    Abstract: A method of generating radiation for a lithography apparatus. The method comprises providing a continuously renewing fuel target (50) at a plasma formation location (12) and directing a continuous-wave excitation beam (6) at the plasma formation location such that fuel within the continuously renewing fuel target is excited by the continuous-wave excitation beam to generate a radiation generating plasma.
    Type: Application
    Filed: October 10, 2013
    Publication date: October 15, 2015
    Applicant: ASML Netherlands B.V.
    Inventors: Erik Roelof Loopstra, Andrei Mikhailovich Yakunin, Vadim Yevgenyevich Banine, Andrey Nikipelov, Edgar Alberto Osorio Oliveros, Alexander Matthijs Struycken, Bert Pieter Van Drieënhuizen, Jan Bernard Plechelmus Van Schoot
  • LITHOGRAPHIC APPARATUS
    Publication number: 20150160569
    Abstract: A reflector includes a reflecting surface or structure provided with a cap layer formed from Silicene or a Silicene derivative. The reflector may be provided in a lithographic apparatus.
    Type: Application
    Filed: May 8, 2013
    Publication date: June 11, 2015
    Inventor: Edgar Alberto Osorio Oliveros
  • Multilayer Mirror
    Publication number: 20130057840
    Abstract: There is provided a multilayer mirror (80) comprising a layer of a first material (84) and a layer of silicon (82). The layer of the first material and the layer of silicon form a stack of layers. An exposed region of the layer of silicon comprises a modification that is arranged to improve the robustness of the exposed region of silicon.
    Type: Application
    Filed: April 6, 2011
    Publication date: March 7, 2013
    Applicant: ASML NETHERLAND B.V.
    Inventors: Vadim Iourievich Timoshkov, Jan Bernard Plechelmus Van Schoot, Antonius Theodorus Wilhelmu Kempen, Andrei Mikhailovich Yakunin, Edgar Alberto Osorio Oliveros