Abstract: A kind of normal incidence broadband spectroscopic polarimeter which is easy to adjust the focus, has no chromatic aberration, maintains the polarization and has simple structure. The normal incidence broadband spectroscopic polarimeter can make the probe beam normal incidence and focus on the sample surface by using at least one flat reflector element to change propagation direction of the focused beam. Moreover, the normal incidence broadband spectroscopic polarimeter contains at least one polarizer as to measure the anisotropy or non-uniform samples, such as three-dimensional profile and material optical constants of thin films consisting of the periodic structure. An optical measurement system including the normal incidence broadband spectroscopic polarimeter is also provided.

Abstract: Disclosed is a normal-incidence broadband spectroscopic polarimeter containing reference beam, comprising a light source, a first reflecting unit, a first concentrating unit, a second concentrating unit, a polarizer, a first curved mirror, a first planar mirror, a second reflecting unit and a probing unit. Also disclosed is an optical measurement system, comprising the normal-incidence broadband spectroscopic polarimeter containing reference beam. The normal-incidence broadband spectroscopic polarimeter containing reference beam achieves an integral combination of the light beams after splitting, can maintain the polarization state of the light beams while increasing the light transmission efficiency, and has a low complexity.

Abstract: Disclosed is a normal-incidence broadband spectroscopic polarimeter containing reference beam, comprising a light source, a first reflecting unit, a first concentrating unit, a second concentrating unit, a polarizer, a first curved mirror, a first planar mirror, a second reflecting unit and a probing unit. Also disclosed is an optical measurement system, comprising the normal-incidence broadband spectroscopic polarimeter containing reference beam. The normal-incidence broadband spectroscopic polarimeter containing reference beam achieves an integral combination of the light beams after splitting, can maintain the polarization state of the light beams while increasing the light transmission efficiency, and has a low complexity.

Abstract: An oblique incidence broadband spectroscopic polarimeter which is easy to adjust the focus, achromatic, maintains the polarization and has simple structure is provided. It comprise at least one polarizer (P, A), at least one curved reflector element (OAP1, OAP2, OAP3, OAP4) and at least two flat reflector elements (M1, M2). By utilizing the flat reflector element, the oblique incidence broadband spectroscopic polarimeter can change the propagate direction of beam, and compensate the polarization changes caused by the reflective focusing unit, make the polarization of beam passed the polarizer unchanged when obliquely incident and focus on the sample surface. The oblique incidence broadband spectroscopic polarimeter can accurately measure the optical constants of sample material, film thickness, and/or the critical dimension (CD) properties or three-dimensional profile for analyze the periodic structure of the sample.

Abstract: An oblique incidence broadband spectroscopic polarimeter which is easy to adjust the focus, achromatic, maintains the polarization and has simple structure is provided. It comprise at least one polarizer (P, A), at least one curved reflector element (OAP1, OAP2, OAP3, OAP4) and at least two flat reflector elements (M1, M2). By utilizing the flat reflector element, the oblique incidence broadband spectroscopic polarimeter can change the propagate direction of beam, and compensate the polarization changes caused by the reflective focusing unit, make the polarization of beam passed the polarizer unchanged when obliquely incident and focus on the sample surface. The oblique incidence broadband spectroscopic polarimeter can accurately measure the optical constants of sample material, film thickness, and/or the critical dimension (CD) properties or three-dimensional profile for analyze the periodic structure of the sample.

Abstract: A kind of normal incidence broadband spectroscopic polarimeter which is easy to adjust the focus, has no chromatic aberration, maintains the polarization and has simple structure. The normal incidence broadband spectroscopic polarimeter can make the probe beam normal incidence and focus on the sample surface by using at least one flat reflector element to change propagation direction of the focused beam. Moreover, the normal incidence broadband spectroscopic polarimeter contains at least one polarizer as to measure the anisotropy or non-uniform samples, such as three-dimensional profile and material optical constants of thin films consisting of the periodic structure. An optical measurement system including the normal incidence broadband spectroscopic polarimeter is also provided.

Abstract: An addressable micromirror array is employed in conjunction with circuit topology navigation software to rapidly wavelength sample selected measurement points in an integrated circuit region.

Abstract: An addressable micromirror array is employed in conjunction with circuit topology navigation software to rapidly wavelength sample selected measurement points in an integrated circuit region.

Abstract: In a spectrographic workpiece metrology system having an optical viewing window, the viewing window is calibrated against a reference sample of a known absolute reflectance spectrum to produce a normalized reflectance spectrum of the reference sample, which is combined with the absolute reflectance spectrum to produce a correction factor. Successive production workpieces are measured through the window and calibrated against the viewing window reflectance, and transformed to absolute reflectance spectra using the same correction factor without having to re-load the reference sample.

Abstract: An addressable micromirror array is employed in conjunction with circuit topology navigation software to rapidly wavelength sample selected measurement points in an integrated circuit region.

Abstract: Light reflected from respective image elements of a workpiece is channeled through respective light channeling elements to respective locations of a spectrographic light disperser. Spectral distributions of the respective image elements produced by the spectrographic light disperser are recorded. A processor groups similar spectral distributions into respective groups of mutually similar distributions, and classifies the groups by the number of distributions contained in each group.

Abstract: In a spectrographic workpiece metrology system having an optical viewing window, the viewing window is calibrated against a reference sample of a known absolute reflectance spectrum to produce a normalized reflectance spectrum of the reference sample, which is combined with the absolute reflectance spectrum to produce a correction factor. Successive production workpieces are measured through the window and calibrated against the viewing window reflectance, and transformed to absolute reflectance spectra using the same correction factor without having to re-load the reference sample.

Abstract: In a spectrographic workpiece metrology system having an optical viewing window, the viewing window is calibrated against a reference sample of a known absolute reflectance spectrum to produce a normalized reflectance spectrum of the reference sample, which is combined with the absolute reflectance spectrum to produce a correction factor. Successive production workpieces are measured through the window and calibrated against the viewing window reflectance, and transformed to absolute reflectance spectra using the same correction factor without having to re-load the reference sample.

Abstract: In a spectrographic workpiece metrology system having an optical viewing window, the viewing window is calibrated against a reference sample of a known absolute reflectance spectrum to produce a normalized reflectance spectrum of the reference sample, which is combined with the absolute reflectance spectrum to produce a correction factor. Successive production workpieces are measured through the window and calibrated against the viewing window reflectance, and transformed to absolute reflectance spectra using the same correction factor without having to re-load the reference sample.

Abstract: An addressable micromirror array is employed in conjunction with circuit topology navigation software to rapidly wavelength sample selected measurement points in an integrated circuit region.

Abstract: Light reflected from respective image elements of a workpiece is channeled through respective light channeling elements to respective locations of a spectrographic light disperser. Spectral distributions of the respective image elements produced by the spectrographic light disperser are recorded. A processor groups similar spectral distributions into respective groups of mutually similar distributions, and classifies the groups by the number of distributions contained in each group.

Abstract: A patterned dielectric layer is evaluated by measuring reflectance of a region which has openings. A heating beam may be chosen for having reflectance from an underlying conductive layer that is several times greater than absorptance, to provide a heightened sensitivity to presence of residue and/or changes in dimension of the openings. Reflectance may be measured by illuminating the region with a heating beam modulated at a preset frequency, and measuring power of a probe beam that reflects from the region at the preset frequency. Openings of many embodiments have sub-wavelength dimensions (i.e. smaller than the wavelength of the heating beam). The underlying conductive layer may be patterned into links of length smaller than the diameter of heating beam, so that the links float to a temperature higher than a corresponding temperature attained by a continuous trace that transfers heat away from the illuminated region by conduction.

Abstract: A patterned dielectric layer is evaluated by measuring reflectance of a region which has openings. A heating beam may be chosen for having reflectance from an underlying conductive layer that is several times greater than absorptance, to provide a heightened sensitivity to presence of residue and/or changes in dimension of the openings. Reflectance may be measured by illuminating the region with a heating beam modulated at a preset frequency, and measuring power of a probe beam that reflects from the region at the preset frequency. Openings of many embodiments have sub-wavelength dimensions (i.e. smaller than the wavelength of the heating beam). The underlying conductive layer may be patterned into links of length smaller than the diameter of heating beam, so that the links float to a temperature higher than a corresponding temperature attained by a continuous trace that transfers heat away from the illuminated region by conduction.

Abstract: Heat is applied to a conductive structure that includes one or more vias, and the temperature at or near the point of heat application is measured. The measured temperature indicates the integrity or the defectiveness of various features (e.g. vias and/or traces) in the conductive structure, near the point of heat application. Specifically, a higher temperature measurement (as compared to a measurement in a reference structure) indicates a reduced heat transfer from the point of heat application, and therefore indicates a defect. The reference structure can be in the same die as the conductive structure (e.g. to provide a baseline) or outside the die but in the same wafer (e.g. in a test structure) or outside the wafer (e.g. in a reference wafer), depending on the embodiment.