Patents by Inventor Edgar OSORIO

Edgar OSORIO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10073361
    Abstract: An EUV lithography system (1) includes: at least one optical element (13, 14) having an optical surface (13a, 14a) arranged in a vacuum environment (17) of the EUV lithography system (1), and a feed device (27) for feeding hydrogen into the vacuum environment (17), in which at least one silicon-containing surface (29a) is arranged. The feed device (27) additionally feeds an oxygen-containing gas into the vacuum environment (17) and has a metering device (28) that sets an oxygen partial pressure (pO2) at the at least one silicon-containing surface (29a) and/or at the optical surface (13a, 14a).
    Type: Grant
    Filed: April 10, 2017
    Date of Patent: September 11, 2018
    Assignees: Carl Zeiss SMT GmbH, ASML Netherlands B.V.
    Inventors: Dirk Heinrich Ehm, Stefan-Wolfgang Schmidt, Edgar Osorio, Edwin Te Sligte, Mark Zellenrath, Hella Logtenberg
  • Publication number: 20170212433
    Abstract: An EUV lithography system (1) includes: at least one optical element (13, 14) having an optical surface (13a, 14a) arranged in a vacuum environment (17) of the EUV lithography system (1), and a feed device (27) for feeding hydrogen into the vacuum environment (17), in which at least one silicon-containing surface (29a) is arranged. The feed device (27) additionally feeds an oxygen-containing gas into the vacuum environment (17) and has a metering device (28) that sets an oxygen partial pressure (pO2) at the at least one silicon-containing surface (29a) and/or at the optical surface (13a, 14a).
    Type: Application
    Filed: April 10, 2017
    Publication date: July 27, 2017
    Inventors: Dirk Heinrich EHM, Stefan-Wolfgang SCHMIDT, Edgar OSORIO, Edwin TE SLIGTE, Mark ZELLENRATH, Hella LOGTENBERG