Patents by Inventor Edgardo Anzures

Edgardo Anzures has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • PRE-APPLIED UNDERFILL
    Publication number: 20150371916
    Abstract: Underfill structures useful as pre-applied underfill materials comprise a polymer layer having a first filled polymer region having a first viscosity and a second filled polymer region having a second viscosity, wherein the first viscosity is less than the second viscosity. Electronic assemblies comprising a chip or die and a substrate are formed using such multi-layer structured pre-applied underfill.
    Type: Application
    Filed: June 23, 2014
    Publication date: December 24, 2015
    Inventors: Robert K. BARR, Edgardo ANZURES, Jeffrey M. CALVERT, Herong LEI, David FLEMING, Avin V. DHOBLE, Anupam CHOUBEY
  • PRE-APPLIED UNDERFILL
    Publication number: 20150064851
    Abstract: Underfill structures useful as pre-applied underfill materials comprise a polymer layer having a first polymer region and a second polymer region, wherein the second polymer region comprises inorganic filler. Electronic assemblies comprising a chip or die and a substrate are formed using such multi-layer structured pre-applied underfill.
    Type: Application
    Filed: September 3, 2013
    Publication date: March 5, 2015
    Inventors: Michael K. GALLAGHER, Edgardo ANZURES, David FLEMING, Avin V. DHOBLE, Chi Q. TRUONG, Anupam CHOUBEY, Jeffrey M. CALVERT
  • MELTS
    Publication number: 20110086314
    Abstract: A light-attenuating composition and method of using it are described. The light-attenuating composition may be selectively applied to a radiant energy sensitive material on the substrate. Actinic radiation applied to the composite chemically changes portions of the radiant energy sensitive material not covered by the light-attenuating composition. The light-attenuating composition attenuates light in at least the UV range and is water-soluble or water-dispersible.
    Type: Application
    Filed: December 17, 2010
    Publication date: April 14, 2011
    Applicant: Rohm and Haas Electronic Material LLC
    Inventors: Edgardo ANZURES, Robert K. Barr
  • Mask
    Patent number: 7632621
    Abstract: A mask is described for forming an image on a substrate. The mask may be selectively applied to a radiant energy sensitive material on the substrate. Actinic radiation applied to the composite chemically changes portions of the radiant energy sensitive material not covered by the mask. The mask and portions of the radiant energy sensitive material are removed using a suitable aqueous base developer. The mask is composed of aqueous base soluble or dispersible polymers and light-blocking agents.
    Type: Grant
    Filed: December 23, 2004
    Date of Patent: December 15, 2009
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Edgardo Anzures, Robert K. Barr, Thomas C. Sutter
  • Methods of forming printed circuit boards having optical functionality
    Patent number: 7583880
    Abstract: Provided are methods of forming printed circuit boards having optical functionality. The methods involve applying a dry-film to a printed circuit board substrate and forming an optical waveguide over the dry-film. The invention finds particular applicability in the electronics and optoelectronics industries.
    Type: Grant
    Filed: December 28, 2007
    Date of Patent: September 1, 2009
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Edgardo Anzures, Philip D. Knudsen
  • Melts
    Publication number: 20090214980
    Abstract: A light-attenuating composition and method of using it are described. The light-attenuating composition may be selectively applied to a radiant energy sensitive material on the substrate. Actinic radiation applied to the composite chemically changes portions of the radiant energy sensitive material not covered by the light-attenuating composition. The light-attenuating composition attenuates light in at least the UV range and is water-soluble or water-dispersible.
    Type: Application
    Filed: April 28, 2009
    Publication date: August 27, 2009
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Edgardo Anzures, Robert K. Barr
  • Methods of forming printed circuit boards having optical functionality
    Publication number: 20080187267
    Abstract: Provided are methods of forming printed circuit boards having optical functionality. The methods involve applying a dry-film to a printed circuit board substrate and forming an optical waveguide over the dry-film. The invention finds particular applicability in the electronics and optoelectronics industries.
    Type: Application
    Filed: December 28, 2007
    Publication date: August 7, 2008
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Edgardo Anzures, Philip D. Knudsen
  • Functional polymer
    Patent number: 7364834
    Abstract: A polymer having ?,? unsaturated groups and a group that generates a free radical when exposed to actinic radiation. The polymer may be self-cross-linking.
    Type: Grant
    Filed: July 13, 2005
    Date of Patent: April 29, 2008
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Robert K. Barr, Edgardo Anzures, Daniel E. Lundy
  • Dry film photoresist
    Patent number: 7323290
    Abstract: A dry film photoresist includes a functional polymer. The functional polymer has ?,?-unsaturated groups and groups that generate a free radical upon exposure to actinic radiation.
    Type: Grant
    Filed: March 18, 2003
    Date of Patent: January 29, 2008
    Assignee: Eternal Technology Corporation
    Inventors: Robert K. Barr, Edgardo Anzures, Daniel E. Lundy
  • Articles
    Publication number: 20060286382
    Abstract: Articles are described. The articles include a cured layer having nanopartilces on a support film. The support film has an adhesive for joining the article to a substrate.
    Type: Application
    Filed: June 9, 2006
    Publication date: December 21, 2006
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Edgardo Anzures, Robert Barr
  • Functional polymer
    Patent number: 7148265
    Abstract: A polymer having ?,? unsaturated groups and a group that generates a free radical when exposed to actinic radiation. The polymer may be self-cross-linking.
    Type: Grant
    Filed: March 18, 2003
    Date of Patent: December 12, 2006
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Robert K. Barr, Edgardo Anzures, Daniel E. Lundy
  • Melts
    Publication number: 20060121389
    Abstract: A light-attenuating composition and method of using it are described. The light-attenuating composition may be selectively applied to a radiant energy sensitive material on the substrate. Actinic radiation applied to the composite chemically changes portions of the radiant energy sensitive material not covered by the light-attenuating composition. The light-attenuating composition attenuates light in at least the UV range and is water-soluble or water-dispersible.
    Type: Application
    Filed: July 29, 2005
    Publication date: June 8, 2006
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Edgardo Anzures, Robert Barr
  • Functionalized polymer
    Publication number: 20060058472
    Abstract: A functionalized copolymer containing a main chain derived from polymerizable monomers and pendent functional groups terminated with one or more ? or ? ethylenically or acetylenically unsaturated groups. The functionalized copolymers are self cross-linking and are suitable for use as binders.
    Type: Application
    Filed: October 28, 2005
    Publication date: March 16, 2006
    Applicant: Shipley Company, L.L.C.
    Inventors: Edgardo Anzures, Robert Barr, Yueping Fu
  • Functional polymer
    Publication number: 20050250045
    Abstract: A polymer having ?,? unsaturated groups and a group that generates a free radical when exposed to actinic radiation. The polymer may be self-cross-linking.
    Type: Application
    Filed: July 13, 2005
    Publication date: November 10, 2005
    Applicant: Shipley Company, L.L.C.
    Inventors: Robert Barr, Edgardo Anzures, Daniel Lundy
  • Functional polymer
    Publication number: 20050250044
    Abstract: A polymer having ?,? unsaturated groups and a group that generates a free radical when exposed to actinic radiation. The polymer may be self-cross-linking.
    Type: Application
    Filed: July 13, 2005
    Publication date: November 10, 2005
    Applicant: Shipley Company, L.L.C.
    Inventors: Robert Barr, Edgardo Anzures, Daniel Lundy
  • Mask
    Publication number: 20050164121
    Abstract: A mask is described for forming an image on a substrate. The mask may be selectively applied to a radiant energy sensitive material on the substrate. Actinic radiation applied to the composite chemically changes portions of the radiant energy sensitive material not covered by the mask. The mask and portions of the radiant energy sensitive material are removed using a suitable aqueous base developer. The mask is composed of aqueous base soluble or dispersible polymers and light-blocking agents.
    Type: Application
    Filed: December 23, 2004
    Publication date: July 28, 2005
    Inventors: Edgardo Anzures, Robert Barr, Thomas Sutter
  • Photoresist processing aid and method
    Patent number: 6900003
    Abstract: A composition and method to reduce photolithographic residue and scum formation on a substrate or in a solution, and to reduce or prevent foam formation. The composition contains a diphenyl oxide compound in combination with an antifoam agent. The composition may be added to developer solutions and stripper solutions used in manufacturing printed wiring boards.
    Type: Grant
    Filed: April 7, 2003
    Date of Patent: May 31, 2005
    Assignee: Shipley Company, L.L.C.
    Inventors: Edgardo Anzures, Daniel E. Lundy, Robert K. Barr, Corey O'Connor
  • Photoresist processing aid and method
    Publication number: 20050100833
    Abstract: A composition and method to reduce photolithographic residue and scum formation on a substrate or in a solution, and to reduce or prevent foam formation. The composition contains a diphenyl oxide compound in combination with an antifoam agent. The composition may be added to developer solutions and stripper solutions used in manufacturing printed wiring boards.
    Type: Application
    Filed: November 29, 2004
    Publication date: May 12, 2005
    Applicant: Rohm and Haas Electronic Materials, L.L.C.
    Inventors: Edgardo Anzures, Daniel Lundy, Robert Barr, Corey O'Connor
  • Residue and scum reducing composition and method
    Patent number: 6887654
    Abstract: A composition and method to reduce or to prevent residue and scum formation on a substrate or in a solution. The composition contains an aromatic alkoxylate in combination with a polyol or ether or ester of a polyol. The composition also reduces or prevents foam formation such as in developing processes in the manufacturing of printed wiring boards.
    Type: Grant
    Filed: May 7, 2003
    Date of Patent: May 3, 2005
    Assignee: Shipley Company, L.L.C.
    Inventors: Daniel E. Lundy, Robert K. Barr, Edgardo Anzures, Edward J. Brady, James G. Shelnut
  • Functionalized polymer
    Publication number: 20040224259
    Abstract: A functionalized copolymer containing a main chain derived from polymerizable monomers and pendent functional groups terminated with one or more &agr; or &bgr; ethylenically or acetylenically unsaturated groups. The functionalized copolymers are self cross-linking and are suitable for use as binders.
    Type: Application
    Filed: December 11, 2003
    Publication date: November 11, 2004
    Applicant: Shipley Company, L.L.C.
    Inventors: Edgardo Anzures, Robert K. Barr, Yueping Fu