Patents by Inventor Edith Goldner

Edith Goldner has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Deposition profile modification through process chemistry
    Patent number: 7122485
    Abstract: Disclosed are methods for modifying the topography of HDP CVD films by modifying the composition of the reactive mixture. The methods allow for deposition profile control independent of film deposition rate. They rely on changes in the process chemistry of the HDP CVD system, rather than hardware modifications, to modify the local deposition rates on the wafer. The invention provides methods of modifying the film profile by altering the composition of the reactive gas mixture, in particular the hydrogen content. In this manner, deposition profile and wiw uniformity are decoupled from deposition rate, and can be controlled without hardware modifications.
    Type: Grant
    Filed: December 9, 2002
    Date of Patent: October 17, 2006
    Assignee: Novellus Systems, Inc.
    Inventors: George D. Papasouliotis, Edith Goldner, Vishal Gauri, Md Sazzadur Rahman, Vikram Singh