Patents by Inventor Edith Yang

Edith Yang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of forming a high quality gate oxide layer having a uniform thickness
    Patent number: 6544907
    Abstract: The present invention provides a method for manufacturing a high quality oxide layer having a uniform thickness. The method includes providing a semiconductor substrate, and forming an oxide layer having a substantially uniform thickness on the semiconductor substrate, and in a zone of pressure of less than about 4 Torr or greater than about 25 Torr.
    Type: Grant
    Filed: October 12, 2000
    Date of Patent: April 8, 2003
    Assignee: Agere Systems Inc.
    Inventors: Yi Ma, Edith Yang