Patents by Inventor Edlef Buttner

Edlef Buttner has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and optical arrangement for generating a nonlinear optical signal on a material which is excited by an excitation field, and use of the method and of the optical arrangement
    Patent number: 8482738
    Abstract: A method of and an optical arrangement for generating a non-linear optical signal on a material excited by an excitation field, wherein with the excitation field coherent fields of first and second optical pulses of differing frequency are overlapped in the material in temporal and spatial relationship, wherein the first pulses of a first frequency are generated in a first beam of a first optical generator unit, and the second pulses of a second frequency are generated in a second beam of a second optical generator unit synchronously pumped by the first optical generator unit, wherein with the first pulses of the first frequency as a fundamental frequency pulses of a higher harmonic frequency thereof are generated and the second optical generator unit is pumped with the pulses of the higher harmonic frequency.
    Type: Grant
    Filed: May 5, 2008
    Date of Patent: July 9, 2013
    Assignee: APE Angewandte Physik and Electronik GmbH
    Inventors: Ingo Rimke, Cees Otto, Edlef Buttner, Hermann L. Offerhaus, Martin Jurna
  • METHOD AND OPTICAL ARRANGEMENT FOR GENERATING A NONLINEAR OPTICAL SIGNAL ON A MATERIAL WHICH IS EXCITED BY AN EXCITATION FIELD, AND USE OF THE METHOD AND OF THE OPTICAL ARRANGEMENT
    Publication number: 20100177307
    Abstract: The invention concerns a method of and an optical arrangement (10) for generating a non-linear optical signal (17) on a material (16) excited by an excitation field (2), wherein with the excitation field (2) coherent fields of first and second optical pulses of differing frequency are overlapped in the material (16) in temporal and spatial relationship, wherein the first pulses of a first frequency are generated in a first beam (3) of a first optical generator unit (1), and the second pulses of a second frequency are generated in a second beam (8) of a second optical generator unit (7) synchronously pumped by the first optical generator unit (1), wherein with the first pulses of the first frequency as a fundamental frequency pulses (5) of a higher harmonic frequency thereof are generated and the second optical generator unit (7) is pumped with the pulses of the higher harmonic frequency.
    Type: Application
    Filed: May 5, 2008
    Publication date: July 15, 2010
    Applicant: APE ANGEWANDTE PHYSIK UND ELEKTRONIK GMBH
    Inventors: Ingo Rimke, Cees Otto, Edlef Buttner, Hermann L. Offerhaus, Martin Jurna