Abstract: Piperazine containing positive photoresist stripping compositions are provided. Formulations include N-aminoalkylpiperazines with the formula ##STR1## bis-N-aminoalkylpiperazines of the formula ##STR2## N-hydroxyalkylpiperazine of the formula ##STR3## and bis-hydroxyalkypiperazines with structure ##STR4## In the above formulae n=1-6. Also included are piperazine derivatives such as those of the above formulae with a branch chain alkyl of 1-6 C atoms, and 5-6 atom cycloalkyl substituted compounds wherein the cycloalkyl is substituted for --(CH.sub.2).sub.n --. Components which may be mixed with the above described piperazine in preparing the positive photoresist stripping compositions of the invention include alkyl or cycloalkyl-2-pyrrolidones of the formula ##STR5## Other amide type solvents with the boiling point in excess of 200.degree. C. as well as high boiling diethylene glycol ethers may also be incorporated.

Abstract: Process is provided for removal of chloroprenes as impurities from ethylene dichloride streams formed in the production of vinyl chloride by the thermal cracking of ethylene dichloride. The ethylene dichloride stream is subjected to distillation in a distillation zone to which free chlorine gas is introduced, thereby chlorinating the chloroprenes contained therein and forming higher boiling chlorocarbons as reaction products. The higher boiling chlorocarbons, together with ethylene dichloride, may be removed as bottoms and passed to a second distillation zone for separation of ethylene dichloride from the higher boiling impurities, thereby producing a substantially pure ethylene dichloride which may be recycled to the cracking step.

Abstract: Process and apparatus are provided for producing ethylene by the oxidative dehydrogenation of ethane wherein ethane is introduced to a cylindrical jet reactor wherein the ethane is reacted at elevated temperatures with a gas mixture containing oxygen and chlorine, introduced to the reactor through a jet positioned substantially coaxial to the longitudinal axis of the reactor.

Abstract: A process is provided for removing vinyl chloride from gaseous streams containing the same wherein the gaseous vinyl chloride stream is contacted with a hypochlorous acid solution for substantially complete absorption and reaction of the vinyl chloride, thereby minimizing the hazards associated with passage of vinyl chloride monomer to the atmosphere.

Abstract: A process is disclosed for the production of ethylene dichloride from ethane. Ethane is introduced into an autothermic (self-sustaining) cracking zone together with controlled proportions of chlorine and oxygen. The autothermic cracking zone is maintained at a temperature above about 700.degree. C. but below 1000.degree. C. for a sufficient time to convert from about 20 to 95 percent of the ethane having about 96 to 74 percent ethylene yield, respectively, based on the converted ethane. The reaction mixture, containing predominantly ethylene and hydrogen chloride, is quenched with a volatile liquid. The quenched mixture is passed, together with oxygen, into a catalytically activated oxyhydrochlorination zone to convert the ethylene, hydrogen chloride and oxygen to ethylene dichloride. If vinyl chloride is desired as a product, part or all of the produced ethylene dichloride is passed to a second cracking zone for conversion to vinyl chloride product and hydrogen chloride.