Patents by Inventor Eduardo T. Mireles

Eduardo T. Mireles has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Symmetrical shaper for an ion beam deposition and etching apparatus
    Patent number: 7863587
    Abstract: A shaper for shaping an ion beam and that can be used for both deposition and etching is described. The shaper includes a plate that is placed between an ion beam grid and an ion beam source. The plate covers holes in the grid, and is shaped and dimensioned such that the plate does not partially cover any holes in the grid that are directly adjacent to the plate. A hole is configured to mount the shaper at a center of the grid and at least one other hole is configured to secure the shaper to the grid to prevent the shaper from rotating relative to the grid. A center mount portion covers holes in the grid. The plate has two axes of reflection symmetry. The uniformity of both deposition and etching is improved.
    Type: Grant
    Filed: January 31, 2007
    Date of Patent: January 4, 2011
    Assignee: Hitachi Global Storage Technologies, Netherlands, B.V.
    Inventors: Peter M. Dang, Jorge A. Goitia, Cherngye Hwang, Eduardo T. Mireles
  • Symmetrical shaper for an ion beam deposition and etching apparatus
    Publication number: 20080179535
    Abstract: A shaper for shaping an ion beam and that can be used for both deposition and etching is described. The shaper includes a plate that is placed between an ion beam grid and an ion beam source. The plate has two axes of reflection symmetry. The uniformity of both deposition and etching is improved.
    Type: Application
    Filed: January 31, 2007
    Publication date: July 31, 2008
    Inventors: Peter M. Dang, Jorge A. Goitia, Cherngye Hwang, Eduardo T. Mireles