Patents by Inventor Eduardus Boon

Eduardus Boon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method, and device manufactured thereby for calibrating an imaging system with a sensor
    Publication number: 20060279719
    Abstract: A lithographic apparatus comprises an illumination system, an array of individually controllable elements, a projection system, a substrate table, and a sensor system. The illumination system supplies a beam of radiation. The array of individually controllable elements patterns the beam. The projection system projects the patterned beam onto a target plane, the patterned beam comprising an array of radiation spots. The substrate table supports a substrate, such that a target surface of the substrate is substantially coincident with the target plane. The sensor system comprises an array of detector elements arranged to receive at least one of the spots. The sensor system measures an energy of the or each received spot and provides an output signal indicative of the energy of the or each received spot.
    Type: Application
    Filed: June 13, 2005
    Publication date: December 14, 2006
    Applicant: ASML Netherlands B.V.
    Inventors: Willem Venema, Anastasius Bruinsma, Joeri Lof, Eduardus Boon