Patents by Inventor Edward A. Bennett
Edward A. Bennett has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 11886123Abstract: A super-resolution system for nano-patterning is disclosed, comprising an exposure head that enables a super-resolution patterning exposures. The super-resolution exposures are carried out using electromagnetic radiation and plasmonic structure, and in some embodiments, plasmonic structures having specially designed super-resolution apertures, of which the “bow-tie” and “C-aperture” are examples. These apertures create small but bright images in the near-field transmission pattern. A writing head comprising one or more of these apertures is held in close proximity to a medium for patterning. In some embodiments, a data processing system is provided to re-interpret the data to be patterned into a set of modulation signals used to drive the multiple individual channels and multiple exposures, and a detection means is provided to verify the data as written.Type: GrantFiled: March 7, 2022Date of Patent: January 30, 2024Inventors: Franklin Mark Schellenberg, Keith Edward Bennett
-
Publication number: 20230061484Abstract: A caramel includes water, glycerol, fat, and about 10% by weight or greater of at least one protein source including at least one protein. A method of forming a caramel includes combining water, glycerol, fat, and about 10% by weight or greater of at least one protein source including at least one protein to form a caramel composition. The method also includes hydrating the protein at a hydrating temperature less than a denaturation temperature of the protein to achieve the caramel having a predetermined water activity without denaturing the protein. The caramel includes about 25% by weight or greater of the protein source, and the protein is not in a denatured state in the caramel. A comestible product includes a protein core layer and a layer of a slab-able caramel adhering to the protein core layer.Type: ApplicationFiled: August 30, 2021Publication date: March 2, 2023Inventors: Yumin You, Chelsea Denise Hager, Supapong Siris, John Edward Bennett, JR., Yvette Thibault Pascua Cubides
-
Publication number: 20220197150Abstract: A super-resolution system for nano-patterning is disclosed, comprising an exposure head that enables a super-resolution patterning exposures. The super-resolution exposures are carried out using electromagnetic radiation and plasmonic structure, and in some embodiments, plasmonic structures having specially designed super-resolution apertures, of which the “bow-tie” and “C-aperture” are examples. These apertures create small but bright images in the near-field transmission pattern. A writing head comprising one or more of these apertures is held in close proximity to a medium for patterning. In some embodiments, a data processing system is provided to re-interpret the data to be patterned into a set of modulation signals used to drive the multiple individual channels and multiple exposures, and a detection means is provided to verify the data as written.Type: ApplicationFiled: March 7, 2022Publication date: June 23, 2022Inventors: Franklin Mark Schellenberg, Keith Edward Bennett
-
Patent number: 11269258Abstract: A super-resolution system for nano-patterning is disclosed, comprising an exposure head that enables a super-resolution patterning exposures. The super-resolution exposures are carried out using electromagnetic radiation and plasmonic structures, and in some embodiments, plasmonic structures having specially designed super-resolution apertures, of which the “bow-tie” and “C-aperture” are examples. These apertures create small but bright images in the near-field transmission pattern. A writing head comprising one or more of these apertures is held in close proximity to a medium for patterning. In some embodiments, a data processing system is provided to re-interpret the data to be patterned into a set of modulation signals used to drive the multiple individual channels and multiple exposures, and a detection means is provided to verify the data as written.Type: GrantFiled: December 31, 2020Date of Patent: March 8, 2022Inventors: Franklin Mark Schellenberg, Keith Edward Bennett
-
Publication number: 20210124273Abstract: A super-resolution system for nano-patterning is disclosed, comprising an exposure head that enables a super-resolution patterning exposures. The super-resolution exposures are carried out using electromagnetic radiation and plasmonic structures, and in some embodiments, plasmonic structures having specially designed super-resolution apertures, of which the “bow-tie” and “C-aperture” are examples. These apertures create small but bright images in the near-field transmission pattern. A writing head comprising one or more of these apertures is held in close proximity to a medium for patterning. In some embodiments, a data processing system is provided to re-interpret the data to be patterned into a set of modulation signals used to drive the multiple individual channels and multiple exposures, and a detection means is provided to verify the data as written.Type: ApplicationFiled: December 31, 2020Publication date: April 29, 2021Inventors: Franklin Mark Schellenberg, Keith Edward Bennett
-
Patent number: 10884340Abstract: A super-resolution system for nano-patterning is disclosed, comprising an exposure head that enables a super-resolution patterning exposures. The super-resolution exposures are carried out using electromagnetic radiation and plasmonic structures, and in some embodiments, plasmonic structures having specially designed super-resolution apertures, of which the “bow-tie” and “C-aperture” are examples. These apertures create small but bright images in the near-field transmission pattern. A writing head comprising one or more of these apertures is held in close proximity to a medium for patterning. In some embodiments, a data processing system is provided to re-interpret the data to be patterned into a set of modulation signals used to drive the multiple individual channels and multiple exposures, and a detection means is provided to verify the data as written.Type: GrantFiled: August 17, 2020Date of Patent: January 5, 2021Inventors: Franklin Mark Schellenberg, Keith Edward Bennett
-
Publication number: 20200379356Abstract: A super-resolution system for nano-patterning is disclosed, comprising an exposure head that enables a super-resolution patterning exposures. The super-resolution exposures are carried out using electromagnetic radiation and plasmonic structures, and in some embodiments, plasmonic structures having specially designed super-resolution apertures, of which the “bow-tie” and “C-aperture” are examples. These apertures create small but bright images in the near-field transmission pattern. A writing head comprising one or more of these apertures is held in close proximity to a medium for patterning. In some embodiments, a data processing system is provided to re-interpret the data to be patterned into a set of modulation signals used to drive the multiple individual channels and multiple exposures, and a detection means is provided to verify the data as written.Type: ApplicationFiled: August 17, 2020Publication date: December 3, 2020Inventors: Franklin Mark Schellenberg, Keith Edward Bennett
-
Patent number: 10747118Abstract: A super-resolution system for nano-patterning is disclosed, comprising an exposure head that enables a super-resolution patterning exposures. The super-resolution exposures are carried out using electromagnetic radiation and plasmonic structures, and in some embodiments, plasmonic structures having specially designed super-resolution apertures, of which the “bow-tie” and “C-aperture” are examples. These apertures create small but bright images in the near-field transmission pattern. A writing head comprising one or more of these apertures is held in close proximity to a medium for patterning. In some embodiments, a data processing system is provided to re-interpret the data to be patterned into a set of modulation signals used to drive the multiple individual channels and multiple exposures, and a detection means is provided to verify the data as written.Type: GrantFiled: January 20, 2020Date of Patent: August 18, 2020Inventors: Franklin Mark Schellenberg, Keith Edward Bennett
-
Publication number: 20200166850Abstract: A super-resolution system for nano-patterning is disclosed, comprising an exposure head that enables a super-resolution patterning exposures. The super-resolution exposures are carried out using electromagnetic radiation and plasmonic structures, and in some embodiments, plasmonic structures having specially designed super-resolution apertures, of which the “bow-tie” and “C-aperture” are examples. These apertures create small but bright images in the near-field transmission pattern. A writing head comprising one or more of these apertures is held in close proximity to a medium for patterning. In some embodiments, a data processing system is provided to re-interpret the data to be patterned into a set of modulation signals used to drive the multiple individual channels and multiple exposures, and a detection means is provided to verify the data as written.Type: ApplicationFiled: January 20, 2020Publication date: May 28, 2020Inventors: Franklin Mark Schellenberg, Keith Edward Bennett
-
Patent number: 10539880Abstract: A super-resolution system for nano-patterning is disclosed, comprising an exposure head that enables a super-resolution patterning exposures. The super-resolution exposures are carried out using electromagnetic radiation and plasmonic structures, and in some embodiments, plasmonic structures having specially designed super-resolution apertures, of which the “bow-tie” and “C-aperture” are examples. These apertures create small but bright images in the near-field transmission pattern. A writing head comprising one or more of these apertures is held in close proximity to a medium for patterning. In some embodiments, a data processing system is provided to re-interpret the data to be patterned into a set of modulation signals used to drive the multiple individual channels and multiple exposures.Type: GrantFiled: January 28, 2019Date of Patent: January 21, 2020Inventors: Franklin Mark Schellenberg, Keith Edward Bennett
-
Publication number: 20190155167Abstract: A super-resolution system for nano-patterning is disclosed, comprising an exposure head that enables a super-resolution patterning exposures. The super-resolution exposures are carried out using electromagnetic radiation and plasmonic structures, and in some embodiments, plasmonic structures having specially designed super-resolution apertures, of which the “bow-tie” and “C-aperture” are examples. These apertures create small but bright images in the near-field transmission pattern. A writing head comprising one or more of these apertures is held in close proximity to a medium for patterning. In some embodiments, a data processing system is provided to re-interpret the data to be patterned into a set of modulation signals used to drive the multiple individual channels and multiple exposures.Type: ApplicationFiled: January 28, 2019Publication date: May 23, 2019Inventors: Franklin Mark Schellenberg, Keith Edward Bennett
-
Patent number: 10191385Abstract: An super-resolution system for nano-patterning is disclosed, comprising an exposure head that enables a super-resolution patterning exposures. The super-resolution exposures are carried out using electromagnetic radiation directed onto a medium using plasmonic structures, and in particular using plasmonic structures using specially designed super-resolution apertures, of which the “bow-tie” and “C-aperture” are examples. These specially designed apertures create small but bright images in the near-field transmission pattern. A printing head comprising an array of these apertures is held in close proximity to a medium for patterning. In some embodiments, a data processing system is provided to re-interpret the data to be patterned into a set of modulation signals used to drive the multiple individual channels and multiple exposures.Type: GrantFiled: February 12, 2018Date of Patent: January 29, 2019Inventors: Franklin Mark Schellenberg, Keith Edward Bennett
-
Publication number: 20180173106Abstract: An super-resolution system for nano-patterning is disclosed, comprising an exposure head that enables a super-resolution patterning exposures. The super-resolution exposures are carried out using electromagnetic radiation directed onto a medium using plasmonic structures, and in particular using plasmonic structures using specially designed super-resolution apertures, of which the “bow-tie” and “C-aperture” are examples. These specially designed apertures create small but bright images in the near-field transmission pattern. A printing head comprising an array of these apertures is held in close proximity to a medium for patterning. In some embodiments, a data processing system is provided to re-interpret the data to be patterned into a set of modulation signals used to drive the multiple individual channels and multiple exposures.Type: ApplicationFiled: February 12, 2018Publication date: June 21, 2018Inventors: Franklin Mark Schellenberg, Keith Edward Bennett
-
Patent number: 9891536Abstract: An super-resolution system for nano-patterning is disclosed, comprising an optical printing head that enables a super-resolution lithographic exposures compatible with conventional optical lithographic processes. The super-resolution exposures are carried out using light directed onto a medium using plasmonic structures, and in particular using plasmonic structures using specially designed super-resolution apertures, of which the “bow-tie” and “C-aperture” are examples. These specially designed apertures create small but bright images in the near-field transmission pattern. A printing head comprising an array of these apertures is held in close proximity to a medium for patterning. In some embodiments, a data processing system is provided to re-interpret the data to be patterned into a set of modulation signals used to drive the multiple individual channels and the multiple exposures.Type: GrantFiled: September 12, 2016Date of Patent: February 13, 2018Inventors: Franklin Mark Schellenberg, Keith Edward Bennett
-
Publication number: 20160377987Abstract: An super-resolution system for nano-patterning is disclosed, comprising an optical printing head that enables a super-resolution lithographic exposures compatible with conventional optical lithographic processes. The super-resolution exposures are carried out using light directed onto a medium using plasmonic structures, and in particular using plasmonic structures using specially designed super-resolution apertures, of which the “bow-tie” and “C-aperture” are examples. These specially designed apertures create small but bright images in the near-field transmission pattern. A printing head comprising an array of these apertures is held in close proximity to a medium for patterning. In some embodiments, a data processing system is provided to re-interpret the data to be patterned into a set of modulation signals used to drive the multiple individual channels and the multiple exposures.Type: ApplicationFiled: September 12, 2016Publication date: December 29, 2016Inventors: Franklin Mark Schellenberg, Keith Edward Bennett
-
Patent number: 9442382Abstract: An optical device for performing nanolithography is disclosed, comprising an optical printing head that enables a super-resolution lithographic exposures compatible with conventional optical lithographic processes. The super-resolution exposures are carried out using light directed onto a data recording medium using plasmonic structures, and in particular using plasmonic structures using specially designed super-resolution apertures, of which the “bow-tie” and “C-aperture” are examples. These specially designed apertures create small but bright images in the near-field transmission pattern. A printing head comprising an array of these apertures is held in close proximity to a data recording medium. A data processing system is provided to re-interpret the data to be patterned into a set of modulation signals used to drive the multiple individual channels and the multiple exposures.Type: GrantFiled: January 4, 2016Date of Patent: September 13, 2016Inventors: Franklin Mark Schellenberg, Keith Edward Bennett
-
Publication number: 20160116846Abstract: An optical device for performing nanolithography is disclosed, comprising an optical printing head that enables a super-resolution lithographic exposures compatible with conventional optical lithographic processes. The super-resolution exposures are carried out using light directed onto a data recording medium using plasmonic structures, and in particular using plasmonic structures using specially designed super-resolution apertures, of which the “bow-tie” and “C-aperture” are examples. These specially designed apertures create small but bright images in the near-field transmission pattern. A printing head comprising an array of these apertures is held in close proximity to a data recording medium. A data processing system is provided to re-interpret the data to be patterned into a set of modulation signals used to drive the multiple individual channels and the multiple exposures.Type: ApplicationFiled: January 4, 2016Publication date: April 28, 2016Inventors: Franklin Mark Schellenberg, Keith Edward Bennett
-
Patent number: 9229330Abstract: A method of performing nanolithography is disclosed, comprising the use of a system having a plasmonic writing head that enables super-resolution exposures of a material. The super-resolution exposures are carried out using light directed onto a material using plasmonic structures, and in particular using plasmonic structures having specially designed super-resolution apertures, of which the “bow-tie” and “C-aperture” are examples. These specially designed apertures create small but bright images in the near-field transmission pattern. In one embodiment, a writing head comprising an array of these apertures is held in close proximity to a lithography material. A data processing system is provided to re-interpret the data to be patterned into a set of modulation signals used to drive the multiple individual channels and the multiple exposures. A detector system using light of a second wavelength to monitor the exposures is also provided.Type: GrantFiled: August 26, 2014Date of Patent: January 5, 2016Inventors: Franklin Mark Schellenberg, Keith Edward Bennett
-
Patent number: 9128380Abstract: A method of performing nanopatterning is disclosed, comprising the use of a system comprising a plasmonic writing head that enables super-resolution exposures. The super-resolution exposures are carried out using light directed onto a data recording medium using plasmonic structures, and in particular using plasmonic structures having specially designed super-resolution apertures, of which the “bow-tie” and “C-aperture” are examples. These specially designed apertures create small but bright images in the near-field transmission pattern. In one embodiment, a writing head comprising an array of these apertures is held in close proximity to a data recording medium. A data processing system is provided to re-interpret the data to be patterned into a set of modulation signals used to drive the multiple individual channels and the multiple exposures.Type: GrantFiled: September 22, 2014Date of Patent: September 8, 2015Inventors: Franklin Mark Schellenberg, Keith Edward Bennett
-
Publication number: 20150211446Abstract: A fuel supply system for supplying a low boiling point fuel to an internal combustion engine of a vehicle includes a fuel tank that encloses a tank volume and includes a primary chamber within the tank volume, a head chamber within the tank volume, and a divider wall. The head chamber is configured to contain fuel up to a head height. The divider wall is attached to a wall of the fuel tank and separates the primary chamber and the head chamber. A fluid pathway guides fuel from along a floor of the tank in the primary chamber through the divider wall and into the head chamber at or above the head height, responsive to movement of the fuel in the primary chamber. An output port is located in a wall of the head chamber adjacent the floor.Type: ApplicationFiled: January 20, 2015Publication date: July 30, 2015Inventor: David Edward Bennett