Patents by Inventor Edward A. McFadden

Edward A. McFadden has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic process analysis and control system
    Patent number: 4890239
    Abstract: A lithographic process analysis and control system which provides a modeled verison of a lithographic process in the dimensions of feature width, focus and exposure. This system uses the model to quickly determine the range of focus and exposure limits for obtaining the desired feature width. The system has flexible graphic display capability for displaying graphic representations of the data as measured and modeled.
    Type: Grant
    Filed: October 20, 1987
    Date of Patent: December 26, 1989
    Assignee: Shipley Company, Inc.
    Inventors: Christopher P. Ausschnitt, Edward A. McFadden, Raul V. Tan