Patents by Inventor Edward Arriola

Edward Arriola has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Immersion lithography laser light source with pulse stretcher
    Patent number: 7643528
    Abstract: An apparatus and method which may comprise a pulsed gas discharge laser which may comprise a seed laser portion; an amplifier portion receiving the seed laser output and amplifying the optical intensity of each seed pulse; a pulse stretcher which may comprise: a first beam splitter operatively connected with the first delay path and a second pulse stretcher operatively connected with the second delay path; a first optical delay path tower containing the first beam splitter; a second optical delay path tower containing the second beam splitter; one of the first and second optical delay paths may comprise: a plurality of mirrors defining the respective optical delay path including mirrors located in the first tower and in the second tower; the other of the first and second optical delay paths may comprise: a plurality of mirrors defining the respective optical delay path including mirrors only in one of the first tower and the second tower.
    Type: Grant
    Filed: October 10, 2007
    Date of Patent: January 5, 2010
    Assignee: Cymer, Inc.
    Inventors: William N. Partlo, Alexander I. Ershov, German Rylov, Igor V. Fomenkov, Daniel J. W. Brown, Christian J. Wittak, Rajasekhar M. Rao, Robert A. Bergstedt, John Fitzgerald, Richard L. Sandstrom, Vladimir B. Fleurov, Robert N. Jacques, Ed Danielewicz, Robin Swain, Edward Arriola, Michael Wyatt, Walter Crosby
  • Immersion lithography laser light source with pulse stretcher
    Publication number: 20090080476
    Abstract: An apparatus and method which may comprise a pulsed gas discharge laser which may comprise a seed laser portion; an amplifier portion receiving the seed laser output and amplifying the optical intensity of each seed pulse; a pulse stretcher which may comprise: a first beam splitter operatively connected with the first delay path and a second pulse stretcher operatively connected with the second delay path; a first optical delay path tower containing the first beam splitter; a second optical delay path tower containing the second beam splitter; one of the first and second optical delay paths may comprise: a plurality of mirrors defining the respective optical delay path including mirrors located in the first tower and in the second tower; the other of the first and second optical delay paths may comprise: a plurality of mirrors defining the respective optical delay path including mirrors only in one of the first tower and the second tower.
    Type: Application
    Filed: October 10, 2007
    Publication date: March 26, 2009
    Applicant: Cymer, Inc.
    Inventors: William N. Partlo, Alexander I. Ershov, German Rylov, Igor V. Fomenkov, Daniel J.W. Brown, Christian J. Wittak, Rajasekhar M. Rao, Robert A. Bergstedt, John Fitzgerald, Richard L. Sandstrom, Vladimir B. Fleurov, Robert N. Jacques, Ed Danielewicz, Robin Swain, Edward Arriola, Mike Wyatt, Walter Crosby