Abstract: A microwave excited ultraviolet lamp system with a data logging and retrieval circuit and method for operating the same. The data logging and retrieval circuit stores operational data in a cache memory using a FIFO data storage protocol. The contents of the cache memory are periodically copied to a larger removable memory so that the removable memory contains a relatively long historical record of the system operational parameters. The data logging and retrieval circuit includes a data port configured to load the contents of the cache memory into an external device when the device is coupled to the data port. A second data port allows the external device to supply power to the data logging and retrieval circuit so that data may be retrieved when the internal power supply is malfunctioning. Data stored in the removable memory may be protected so that it may only be accessed by authorized personnel.

Abstract: A system, method, and computer program product for optimizing the cooling of a UV bulb during a UV irradiation process is described. A power level in which to operate the UV bulb is received. In addition, a particular type of UV bulb being used in the UV irradiation process is received. Thereafter, at least one optimal UV cooling parameter that corresponds to the power level and the type of UV bulb is retrieved from a UV source parameters database. At least one control signal is then sent to a cooling device that is based on the retrieved optimal UV cooling parameter, and the control signal instructs the cooling device to cool the particular type of UV bulb according to the retrieved optimal UV cooling parameter during the UV irradiation process.

Abstract: A system, method, and computer program product for optimizing the cooling of a UV bulb during a UV irradiation process is described. A power level in which to operate the UV bulb is received. In addition, a particular type of UV bulb being used in the UV irradiation process is received. Thereafter, at least one optimal UV cooling parameter that corresponds to the power level and the type of UV bulb is retrieved from a UV source parameters database. At least one control signal is then sent to a cooling device that is based on the retrieved optimal UV cooling parameter, and the control signal instructs the cooling device to cool the particular type of UV bulb according to the retrieved optimal UV cooling parameter during the UV irradiation process.

Abstract: A UV system for irradiating a substrate includes a lamphead having an enclosure with an interior. A UV bulb is positioned in the interior and is capable of emitting UV energy when excited by RF energy. The UV system also includes a solid state RF source capable of generating the RF energy. The RF energy is transmitted to the UV bulb, which causes the UV bulb to ignite and emit the UV energy from the interior of the lamphead.

Abstract: Embodiments of the invention provide an apparatus, method, and program product to control a lamp system. The apparatus comprises a plasma lamp bulb (20) and a microwave generator (12) operable to generate a microwave energy field to excite the plasma lamp bulb (20) to emit ultraviolet light (24). The apparatus further comprises a sensor (70) to measure the intensity of the ultraviolet light (24) and a reflector (42) positioned between the plasma lamp bulb (20) and the sensor (70) The reflector (42) is operable to reflect at least a portion of the ultraviolet light (24) generated by the plasma lamp bulb (20). The method comprises receiving a target intensity for the ultraviolet light (24) and measuring an intensity of the ultraviolet light (24) using a sensor (70). The method further comprises comparing the target intensity to the measured intensity and, in response to the comparison, adjusting power to a microwave generator (12) to adjust the intensity of the ultraviolet light (24).

Abstract: Apparatus for generating ultraviolet light and methods of operating an ultraviolet light source. The apparatus may include a microwave chamber (16) enclosing an interior space, a light source (10) with a lamp head (28) coupled to the microwave chamber (16), an ultraviolet (UV) transmissive member (88) positioned above the lamp face (32) and below the interior space to define a plenum (116) therebetween, and an exhaust system (100) coupled in fluid communication with the plenum. The lamp head (28) has a lamp face (32) through which ultraviolet light (34) and cooling air (30) are emitted. The UV transmissive member (88) is configured to transmit the ultraviolet light (34) into the interior space and to divert the cooling air (30) from the interior space. The exhaust system (100) configured to exhaust the cooling air (30) from the plenum (116).

Abstract: A UV system for irradiating a substrate includes a lamphead having an enclosure with an interior. A UV bulb is positioned in the interior and is capable of emitting UV energy when excited by RF energy. The UV system also includes a solid state RF source capable of generating the RF energy. The RF energy is transmitted to the UV bulb, which causes the UV bulb to ignite and emit the UV energy from the interior of the lamphead.

Abstract: An apparatus for generating ultraviolet light and irradiating a 450 mm diameter semi-conductor wafer. The apparatus includes a plenum and an array of nine RF irradiator units coupled with the plenum. Each irradiator unit includes a plasma lamp bulb and an RF generator operable to generate a radiation energy field to excite the plasma lamp bulb and emit the ultraviolet light. The nine irradiator units are arranged in three rows with three of the irradiator units in each row.

Abstract: An apparatus for generating ultraviolet light for irradiating a substrate. The apparatus includes a housing enclosing an interior space. The housing includes an inlet for receiving a cooling air flow, and a window configured to emit ultraviolet light and discharge the cooling air flow. A lamp bulb is mounted within the interior space between the inlet and the window. First and second microwave generators are mounted between the inlet and the lamp bulb. A plate is positioned between the inlet and the first and second microwave generators, the plate at least partially defining a plenum within the housing and including first and second openings generally aligned with the respective first and second microwave generators to direct first and second portions of the cooling air flow at the first and second microwave generators.

Abstract: A microwave excited ultraviolet lamp system with a data logging and retrieval circuit and method for operating the same. The data logging and retrieval circuit stores operational data in a cache memory using a FIFO data storage protocol. The contents of the cache memory are periodically copied to a larger removable memory so that the removable memory contains a relatively long historical record of the system operational parameters. The data logging and retrieval circuit includes a data port configured to load the contents of the cache memory into an external device when the device is coupled to the data port. A second data port allows the external device to supply power to the data logging and retrieval circuit so that data may be retrieved when the internal power supply is malfunctioning. Data stored in the removable memory may be protected so that it may only be accessed by authorized personnel.

Abstract: An apparatus for generating ultraviolet light and irradiating a 450 mm diameter semi-conductor wafer. The apparatus includes a plenum and an array of nine RF irradiator units coupled with the plenum. Each irradiator unit includes a plasma lamp bulb and an RF generator operable to generate a radiation energy field to excite the plasma lamp bulb and emit the ultraviolet light. The nine irradiator units are arranged in three rows with three of the irradiator units in each row.

Abstract: Embodiments of the invention provide an apparatus, method, and program product to control a lamp system. The apparatus comprises a plasma lamp bulb (20) and a microwave generator (12) operable to generate a microwave energy field to excite the plasma lamp bulb (20) to emit ultraviolet light (24). The apparatus further comprises a sensor (70) to measure the intensity of the ultraviolet light (24) and a reflector (42) positioned between the plasma lamp bulb (20) and the sensor (70) The reflector (42) is operable to reflect at least a portion of the ultraviolet light (24) generated by the plasma lamp bulb (20). The method comprises receiving a target intensity for the ultraviolet light (24) and measuring an intensity of the ultraviolet light (24) using a sensor (70). The method further comprises comparing the target intensity to the measured intensity and, in response to the comparison, adjusting power to a microwave generator (12) to adjust the intensity of the ultraviolet light (24).

Abstract: Apparatus for generating ultraviolet light and methods of operating an ultraviolet light source. The apparatus may include a microwave chamber (16) enclosing an interior space, a light source (10) with a lamp head (28) coupled to the microwave chamber (16), an ultraviolet (UV) transmissive member (88) positioned above the lamp face (32) and below the interior space to define a plenum (116) therebetween, and an exhaust system (100) coupled in fluid communication with the plenum. The lamp head (28) has a lamp face (32) through which ultraviolet light (34) and cooling air (30) are emitted. The UV transmissive member (88) is configured to transmit the ultraviolet light (34) into the interior space and to divert the cooling air (30) from the interior space. The exhaust system (100) configured to exhaust the cooling air (30) from the plenum (116).

Abstract: A microwave-excited ultraviolet lamp system includes a microwave chamber cooled with air drawn through the chamber by a negative pressure source. A filter provided at an inlet of the lamp system prevents particulate material from entering the microwave chamber.

Abstract: An ultraviolet radiation curing system is disclosed for treating a substrate, such as fiber optic cable or silicone tubing. The system comprises a processing chamber allowing transport of a continuous piece of substrate to be treated. As the substrate moves through the processing chamber, ultraviolet radiation from a plasma lamp activated by a microwave generator treats the surface of the substrate. The system comprises two elliptical reflectors of different sizes so that larger diameter substrates may be efficiently treated with ultraviolet radiation. The system may also comprise an ultraviolet-transmissive conduit enclosing the substrate and split into a first portion and a second portion, where the second portion is movable from the first portion to open the conduit and allow insertion or alignment of the substrate within the conduit and processing chamber.

Abstract: An ultraviolet radiation curing system is disclosed for treating a substrate, such as fiber optic cable or silicone tubing. The system comprises a processing chamber allowing transport of a continuous piece of substrate to be treated. As the substrate moves through the processing chamber, ultraviolet radiation from a plasma lamp activated by a microwave generator treats the surface of the substrate. The system comprises two elliptical reflectors of different sizes so that larger diameter substrates may be efficiently treated with ultraviolet radiation. The system may also comprise an ultraviolet-transmissive conduit enclosing the substrate and split into a first portion and a second portion, where the second portion is movable from the first portion to open the conduit and allow insertion or alignment of the substrate within the conduit and processing chamber.

Abstract: A microwave-excited ultraviolet lamp system includes a microwave chamber cooled with air drawn through the chamber by a negative pressure source. A filter provided at an inlet of the lamp system prevents particulate material from entering the microwave chamber.

Abstract: A microwave powered lamp head assembly includes a shutter assembly which may be activated to selectively allow transmission of light from the microwave powered lamp bulb. The shutter assembly allows unrestricted airflow when it is in the closed position so that the active lamp bulb may still be cooled, while preventing the transmission of UV radiation through the shutter. The shutter assembly is in close sealing relation with respect to the optical cavity holding the lamp bulb when in the closed position to minimize the escape of UV radiation.

Abstract: A microwave powered lamp head assembly includes a shutter assembly which may be activated to selectively allow transmission of light from the microwave powered lamp bulb. The shutter assembly allows unrestricted airflow when it is in the closed position so that the active lamp bulb may still be cooled, while preventing the transmission of UV radiation through the shutter. The shutter assembly is in close sealing relation with respect to the optical cavity holding the lamp bulb when in the closed position to minimize the escape of UV radiation.

Abstract: An air atomizing nozzle assembly for electrostatic spray guns. The nozzle assembly includes a fluid tip through which liquid coating material is emitted, an air cap having openings through which pressurized air passes to atomize the liquid coating material emitted from the nozzle and having a pair of opposed air horns through which pressurized air passes to shape the atomized coating material into a flat fan spray pattern, and a retaining ring for securing the air cap to the gun barrel and fluid tip. An annular diffuser is located within an internal chamber in the nozzle assembly which receives the prezzurized fan-shaping air from a passageway passing through the barrel of the gun, redirects it, and equalizes the flow of the fan-shaping air to the opposed air horns. The present invention is particularly useful in applications having low liquid coating material flow rates on the order of less than about 3 fluid ounces of material per minute.