Abstract: A high pressure fluid storage system with at least one pressure sensing unitary device (PSUD) which can perform the function of a pressure regulator device. The PSUD can be manufactured as a single unitary construction, wherein both the housing body and the internal pressure regulating mechanism are made from a single unit, material, or both. The PSUD does not have any welded components, is not assembled from a plurality of separate components, or both.

Abstract: A high pressure fluid storage device with a pressure sensing and regulating system configured for delivery of vaporized solid and liquid precursor materials at a regulated pressure range. At least some components of the pressure regulating system is contained internally within the storage device.

Abstract: A device includes a housing including a first chamber having a first pressure regulating device, a first fluid inlet, and a first fluid outlet. The first pressure regulating device includes a plurality of first levers; a first spring; and a first pressure activated device. In response to an external pressure decreasing, the first pressure activated device overcomes a first closing force and opens the first fluid inlet. A second chamber has a second pressure regulating device including a second fluid inlet and a second fluid outlet; a plurality of second levers; a second spring; and a second pressure activated device configured to constrict as the external pressure increases. In response to the external pressure decreasing, the second pressure activated device is configured to overcome a second closing force and open the second fluid inlet.

Abstract: A gas storage and dispensing container includes a storage vessel, a first gas pressure regulator, and a second gas pressure regulator. The storage vessel is configured to contain a pressurized gas. The gas storage and dispensing container has a discharge flow path for discharging the pressurized gas. The first gas pressure regulator is disposed within the storage vessel, and the second gas pressure regulator is external to the storage vessel. The discharge flow path extends through the first gas pressure regulator and the second gas pressure regulator. A method of discharging gas from a gas storage and dispensing container includes a first gas pressure regulator reducing a pressure of the pressurized gas to a first pressure and a second gas pressure regulator reducing the pressure of the pressurized gas to a second pressure.

Abstract: An assembly for ion implantation is provided herein. An assembly comprises at least one vessel configured to be fluidly coupled to an arc chamber of an ion implantation device. The at least one vessel comprises a gas component comprising BF3 and B2F4. When the gas component is supplied from the at least one vessel to the arc chamber for implantation into a substrate, a beam current of boron ions generated from the gas component is greater than a beam current of boron ions generated from a control gas component. Related systems, including ion implantation systems, and related methods are provided herein.

Abstract: A high pressure fluid storage system with at least one pressure sensing unitary device (PSUD) which can perform the function of a pressure regulator device. The PSUD can be manufactured as a single unitary construction, wherein both the housing body and the internal pressure regulating mechanism are made from a single unit, material, or both. The PSUD does not have any welded components, is not assembled from a plurality of separate components, or both.

Abstract: A delivery system for delivering a vaporized source precursor in ion implantation, including: an assembly including: a vessel having an interior volume and configured to produce the vaporized source precursor; a first heater to heat the vessel; and a manifold configured to control the output of the vaporized source precursor to an ion implantation device, wherein the assembly is configured to be disposed upstream of the source inlet flange.

Abstract: A high pressure fluid storage system with at least one pressure sensing device (PSD) which can perform the function of a pressure regulator device. The PSD can be manufactured via an additive manufacturing process to include a first and a second single unitary constructions, wherein the housing body and the internal pressure regulating mechanism are made together during the process. The PSD can be made without any welded components or bellows.

Abstract: An ion implantation system and related methods are provided herein. An ion implantation system comprises a gas supply assembly comprising at least one gas supply vessel in fluid communication with an arc chamber. The gas supply assembly is configured to supply a gas component comprising at least one of GeF4, GeH4, H2, a fluorine-containing gas, or any combination thereof. When the gas component is supplied from the at least one gas supply vessel to the arc chamber for implantation into a substrate, a beam current of Ge ions generated from the gas component is greater than a beam current of Ge ions generated from a control gas component.

Abstract: A device includes a housing including a first chamber having a first pressure regulating device, a first fluid inlet, and a first fluid outlet. The first pressure regulating device includes a plurality of first levers; a first spring; and a first pressure activated device. In response to an external pressure decreasing, the first pressure activated device overcomes a first closing force and opens the first fluid inlet. A second chamber has a second pressure regulating device including a second fluid inlet and a second fluid outlet; a plurality of second levers; a second spring; and a second pressure activated device configured to constrict as the external pressure increases. In response to the external pressure decreasing, the second pressure activated device is configured to overcome a second closing force and open the second fluid inlet.

Abstract: The present disclosure relates to an ion implantation tool source and gas delivery system. The system can include a gas source comprising one or more gas supply vessels, an ion implanter arc chamber connected to the gas source, and a gallium target contained within the ion implanter arc chamber. The one or more gas supply vessels can supply a mixture of gases of hydrogen and fluoride. The hydrogen can be from 5% to 60% of the mixture of gases.

Abstract: A high pressure fluid storage device with a pressure sensing and regulating system configured for delivery of vaporized solid and liquid precursor materials at a regulated pressure range. At least some components of the pressure regulating system is contained internally within the storage device.

Abstract: A gas storage and dispensing container includes a storage vessel, a first gas pressure regulator, and a second gas pressure regulator. The storage vessel is configured to contain a pressurized gas. The gas storage and dispensing container has a discharge flow path for discharging the pressurized gas. The first gas pressure regulator is disposed within the storage vessel, and the second gas pressure regulator is external to the storage vessel. The discharge flow path extends through the first gas pressure regulator and the second gas pressure regulator. A method of discharging gas from a gas storage and dispensing container includes a first gas pressure regulator reducing a pressure of the pressurized gas to a first pressure and a second gas pressure regulator reducing the pressure of the pressurized gas to a second pressure.

Abstract: Regulator assemblies can be tested using test fluids selected to have a molecular weight about that of a selected fluid to be dispensed from a fluid storage and delivery vessel including the regulator assembly. The test fluid can be a single gas or a mixture. The test fluid can have a molecular weight of between 80% and 110% of the molecular weight of the selected fluid dispensed from the fluid storage and delivery vessel. Regulator assemblies tested in this manner can pass evaluation when they show fewer than two spikes on the initiation of flow of the test gas. These regulator assemblies can be installed into fluid storage and delivery vessels, particularly for storage and delivery of pressurized fluids.

Abstract: An ion source apparatus for ion implantation is described, including an ion source chamber, and a consumable structure in or associated with the ion source chamber, in which the consumable structure includes a solid dopant source material susceptible to reaction with a reactive gas for release of dopant in gaseous form to the ion source chamber, wherein the solid dopant source material comprises gallium nitride, gallium oxide, either of which may be isotopically enriched with respect to a gallium isotope, or combinations thereof.

Abstract: Fluid dispensing assemblies are disclosed, for use in fluid supply packages in which such fluid dispensing assemblies as coupled to fluid supply vessels, for dispensing of fluids such as semiconductor manufacturing fluids. The fluid dispensing assemblies in specific implementations are configured to prevent application of excessive force to valve elements in the fluid dispensing assemblies, and/or for avoiding inadvertent or accidental open conditions of vessels that may result in leakage of toxic or otherwise hazardous or valuable gas. Also described are alignment devices for assisting coupling of coupling elements, e.g., coupling elements of fluid supply packages of the foregoing type, so that damage to such couplings as a result of misalignment is avoided.

Abstract: An ion source apparatus for ion implantation is described, including an ion source chamber, and a consumable structure in or associated with the ion source chamber, in which the consumable structure includes a solid dopant source material susceptible to reaction with a reactive gas for release of dopant in gaseous form to the ion source chamber, wherein the solid dopant source material comprises gallium nitride, gallium oxide, either of which may be isotopically enriched with respect to a gallium isotope, or combinations thereof.

Abstract: A fluid supply package is described, which includes a fluid storage and dispensing vessel, and a fluid dispensing assembly coupled to the vessel and configured to enable discharge of fluid from the vessel under dispensing conditions, wherein the fluid supply package includes an informational augmentation device thereon, e.g., at least one of a quick read (QR) code and an RFID tag, for informational augmentation of the package. Process systems are described including process tools and one or more fluid supply packages of the foregoing type, wherein the process tool is configured for communicative interaction with the fluid supply package(s). Various communicative arrangements are described, which are usefully employed to enhance the efficiency and operation of process systems in which fluid supply packages of the foregoing type are employed.

Abstract: A reaction system and method for preparing compounds or intermediates from solid reactant materials is provided. In a specific aspect, a reaction system and methods are provided for preparation of boron-containing precursor compounds useful as precursors for ion implantation of boron in substrates. In another specific aspect, a reactor system and methods are provided for manufacture of boron precursors such as B2F4.

Abstract: A fluid supply package comprising a pressure-regulated fluid storage and dispensing vessel, a valve head adapted for dispensing of fluid from the vessel, and an anti-pressure spike assembly adapted to combat pressure spiking in flow of fluid at inception of fluid dispensing.