Patents by Inventor Edward Gipstein

Edward Gipstein has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Preparation of resist image with methacrylate polymers
    Patent number: 4011351
    Abstract: A positive resist image is produced by exposure of a layer of non-crosslinked polymeric material to high energy radiation in a predetermined pattern, the polymeric material containing alkyl methacrylate units and polymerized units of certain other ethylenically unsaturated monomers, followed by removal of the electron degraded material from the exposed areas.
    Type: Grant
    Filed: January 29, 1975
    Date of Patent: March 8, 1977
    Assignee: International Business Machines Corporation
    Inventors: Edward Gipstein, Wayne M. Moreau, Omar U. Need, III
  • Positive polymeric electron beam resists of very great sensitivity
    Patent number: 3996393
    Abstract: It has been discovered that the sensitivity of positive acting polymeric electron beam resists is increased by well over an order of magnitude by using polymers having a molecular weight of at least one million, thereby making it possible to reduce the required radiation to below 3 .times. 10.sup..sup.-6 coulombs/cm.sup.2.
    Type: Grant
    Filed: March 25, 1974
    Date of Patent: December 7, 1976
    Assignee: International Business Machines Corporation
    Inventors: Charles A. Cortellino, Edward Gipstein, William A. Hewett, Duane E. Johnson, Wayne M. Moreau
  • Use of nitrocellulose containing 10.5 to 12% nitrogen as electron beam positive resists
    Patent number: 3985915
    Abstract: Very sensitive electron beam positive resists have been obtained using films of nitrocellulose containing 10.5 to 12% nitrogen.
    Type: Grant
    Filed: December 20, 1974
    Date of Patent: October 12, 1976
    Assignee: International Business Machines Corporation
    Inventors: Edward Gipstein, Wayne M. Moreau, Omar U. Need, III
  • Positive resists containing dimethylglutarimide units
    Patent number: 3964908
    Abstract: A process for forming an image with a positive resist using a polymer containing dimethylglutarimide units. The polymer is sensitive to both electron beam and light radiation, has a high glass transition temperature, a high temperature resistance, and is capable of very fine spatial resolution, very suitable for micro circuitry processings.
    Type: Grant
    Filed: September 22, 1975
    Date of Patent: June 22, 1976
    Assignee: International Business Machines Corporation
    Inventors: Joachim Bargon, Edward Gipstein, Hiroyuki Hiraoka
  • Thermally stable positive polycarbonate electron beam resists
    Patent number: 3961099
    Abstract: Electron beam positive resists which are sensitive to electron beam radiation and simultaneously thermally stable are prepared using polycarbonates.
    Type: Grant
    Filed: September 26, 1974
    Date of Patent: June 1, 1976
    Assignee: International Business Machines Corporation
    Inventors: Edward Gipstein, Wayne M. Moreau, Omar U. Need, III
  • Electron beam positive resists containing acetate polymers
    Patent number: 3931435
    Abstract: Very sensitive electron beam positive resists have been obtained using films of polymeric methyl methacrylate containing acetate polymers.
    Type: Grant
    Filed: December 20, 1974
    Date of Patent: January 6, 1976
    Assignee: International Business Machines Corporation
    Inventors: Edward Gipstein, Wayne M. Moreau, Omar U. Need, III