Abstract: The invention relates to functionalized dihydro- and tetrahydro-quinazoline compounds, pharmaceutical compositions comprising such compounds, and the use of such compounds as heparanase inhibitors for the treatment of diseases or conditions related to heparanase.

Abstract: The invention relates to functionalized quinazoline compounds, pharmaceutical compositions comprising such compounds, and the use of such compounds as heparanase inhibitors for the treatment of diseases or conditions related to heparanse activity.

Abstract: The invention relates to functionalized quinazoline compounds, pharmaceutical compositions comprising such compounds, and the use of such compounds as heparanase inhibitors for the treatment of diseases or conditions related to heparanse activity.

Abstract: The invention relates to functionalized dihydro- and tetrahydro-quinazoline compounds, pharmaceutical compositions comprising such compounds, and the use of such compounds as heparanase inhibitors for the treatment of diseases or conditions related to heparanase.

Abstract: A ducted shelf for an open-fronted display unit employing air curtains comprises a duct extending forwardly or rearwardly through the shelf and communicating at a forward end with a discharge or return opening, the duct being wider in the widthwise direction at the forward end than at a rearward end of the duct. Guide walls divide the duct into a group of channels disposed successively side-by-side in the widthwise direction. Each channel has a respective length reflecting a degree of widthwise offset between the rearward end and the forward end of that channel. A longer channel of the group has a greater width in the widthwise direction at its rearward and forward ends than a shorter channel of the group.

Abstract: A ducted shelf for an open-fronted display unit employing air curtains. The shelf has a supply duct at a lower level communicating with a downwardly-facing forward discharge outlet and a return duct at an upper level communicating with an upwardly-facing forward return inlet. In front-to-back section through the shelf, a forward supply duct extension in front of the supply duct narrows forwardly above the discharge outlet and a forward return duct extension in front of the return duct reaches downwardly to the lower level of the shelf to lie forwardly of the supply duct. This beneficially reduces the thickness of the front of the shelf.

Abstract: A refrigerated display unit having an open-fronted cabinet providing a product display space accessible through an access opening provided by the open front. Cooling means produces cold air to refrigerate items in the product display space. A cold air curtain is provided across the access opening using a forwardly-positioned discharge outlet communicating with a supply duct and a forwardly-positioned return inlet in communication with a return duct receiving air from the air curtain. The air curtain is substantially unsupported by the any supplementary cooling airflow supplied into the product display space separately from the air curtain.

Abstract: A refrigerated display unit having an open-fronted cabinet providing a product display space accessible through an access opening provided by the open front. Cooling means produces cold air to refrigerate items in the product display space. A cold air curtain is provided across the access opening using a forwardly-positioned discharge outlet communicating with a supply duct and a forwardly-positioned return inlet in communication with a return duct receiving air from the air curtain. The air curtain is substantially unsupported by the any supplementary cooling airflow supplied into the product display space separately from the air curtain.

Abstract: A ducted shelf for an open-fronted display unit employing air curtains comprises a duct extending forwardly or rearwardly through the shelf and communicating at a forward end with a discharge or return opening, the duct being wider in the widthwise direction at the forward end than at a rearward end of the duct. Guide walls divide the duct into a group of channels disposed successively side-by-side in the widthwise direction. Each channel has a respective length reflecting a degree of widthwise offset between the rearward end and the forward end of that channel. A longer channel of the group has a greater width in the widthwise direction at its rearward and forward ends than a shorter channel of the group.

Abstract: A ducted shelf for an open-fronted display unit employing air curtains. The shelf has a supply duct at a lower level communicating with a downwardly-facing forward discharge outlet and a return duct at an upper level communicating with an upwardly-facing forward return inlet. In front-to-back section through the shelf, a forward supply duct extension in front of the supply duct narrows forwardly above the discharge outlet and a forward return duct extension in front of the return duct reaches downwardly to the lower level of the shelf to lie forwardly of the supply duct. This beneficially reduces the thickness of the front of the shelf.

Abstract: A ducted shelf assembly for a refrigerated display appliance comprises separate upper and lower supports, each being separately engageable with support formations to hold the shelf structure at a desired height against a wall of the display appliance. At least one duct element is separate from and disposed between the lower support and the upper support, the duct element then being supported by the lower support and retained by the upper support.

Abstract: A refrigerated display unit (1), having an open-fronted cabinet providing a product display space (3) accessible through an access opening (39) provided by the open front. Cooling means (27) produces cold air to refrigerate items in the product display space (3). A cold air curtain is provided across the access opening (39) using a forwardly-positioned discharge outlet (5) communicating with a supply duct (45) and a forwardly-positioned return inlet (7) in communication with a return duct (41) receiving air from the air curtain (9). The air curtain (9) is substantially unsupported by any supplementary cooling airflow supplied into the product display space (3) separately from the air curtain (9).

Abstract: A refrigerated display unit (1), having an open-fronted cabinet providing a product display space (3) accessible through an access opening (39) provided by the open front. Cooling means (27) produces cold air to refrigerate items in the product display space (3). A cold air curtain is provided across the access opening (39) using a forwardly-positioned discharge outlet (5) communicating with a supply duct (45) and a forwardly-positioned return inlet (7) in communication with a return duct (41) receiving air from the air curtain (9). The air curtain (9) is substantially unsupported by any supplementary cooling airflow supplied into the product display space (3) separately from the air curtain (9).

Abstract: A drain valve and method for assembling a drain valve. A valve assembly is inserted into a pipe, and a reduced diameter portion is formed in the pipe to create a substantially water-tight seal between a portion of the valve assembly and the pipe. A second reduced diameter portion may be formed in the pipe to provide a thrust bearing surface for resisting sliding movement of the valve assembly within the pipe. A transverse hole is provided in the pipe to provide access to a rotatable mechanism in the valve assembly to permit and restrict fluid flow through the drain valve.

Abstract: A method of processing a workpiece in the chamber of a plasma reactor includes introducing a process gas into the chamber, capacitively coupling VHF plasma source power into a process region of the chamber that overlies the wafer while inductively coupling RF plasma source power into the process region. A particular plasma ion density level is established by maintaining the total amount of plasma source power inductively and capacitively coupled into the process region at a level that provides the desired plasma ion density. The plasma ion density radial distribution in the process region is controlled by adjusting the ratio between the amounts of the (VHF) capacitively coupled power and the inductively coupled power while continuing to maintain the level of total plasma source power.

Abstract: A method of processing a workpiece in the chamber of a plasma reactor includes introducing a process gas into the chamber, simultaneously (a) capacitively coupling VHF plasma source power into a process region of the chamber that overlies the wafer, and (b) inductively coupling RF plasma source power into the process region, and controlling radial distribution of plasma ion density in the process region by controlling the effective frequency of the VHF source power. In a preferred embodiment, the step of coupling VHF source power is performed by coupling VHF source power from different generators having different VHF frequencies, and the step of controlling the effective frequency is performed by controlling the ratio of power coupled by the different generators.

Abstract: A plasma reactor for processing a workpiece includes a reactor chamber and a workpiece support within the chamber, the chamber having a ceiling facing the workpiece support, an inductively coupled plasma source power applicator overlying the ceiling, and an RF power generator coupled to the inductively coupled source power applicator, a capacitively coupled plasma source power applicator comprising a source power electrode at one of: (a) the ceiling (b) the workpiece support, and plural VHF power generators of different fixed frequencies coupled to the capacitively coupled source power applicator, and a controller for independently controlling the power output levels of the plural VHF generators so as to control an effective VHF frequency applied to the source power electrode.

Abstract: A method of processing a workpiece in the chamber of a plasma reactor includes introducing a process gas into the chamber, simultaneously (a) capacitively coupling VHF plasma source power into a process region of the chamber that overlies the wafer, and (b) inductively coupling RF plasma source power into the process region, and controlling plasma ion density by controlling the effective frequency of the VHF source power. In a preferred embodiment, the step of coupling VHF source power is performed by coupling VHF source power from different generators having different VHF frequencies, and the step of controlling the effective frequency is performed by controlling the ratio of power coupled by the different generators.

Abstract: A method of processing a workpiece in the chamber of a plasma reactor includes introducing a process gas into the chamber, capacitively coupling VHF plasma source power into a process region of the chamber that overlies the wafer while inductively coupling RF plasma source power into the process region. A particular plasma ion density level is established by maintaining the total amount of plasma source power inductively and capacitively coupled into the chamber at a level that provides the desired plasma ion density. Chemical species distribution or content in the process region plasma is controlled by adjusting the ratio between the amounts of the capacitively coupled power and the inductively coupled power while continuing to maintain the level of total plasma source power.

Abstract: A method of processing a workpiece in the chamber of a plasma reactor includes introducing a process gas into the chamber, simultaneously (a) capacitively coupling VHF plasma source power into a process region of the chamber that overlies the wafer, and (b) inductively coupling RF plasma source power into the process region, and adjusting the extent of dissociation of species in the plasma by adjusting the ratio between the amounts of the capacitively coupled VHF power and the inductively coupled power. The method may further include controlling plasma ion density in the chamber by controlling the total amount of plasma source power capacitively and inductively coupled into the process region.