Abstract: Provided herein are methods, systems, and apparatus for inhibiting decomposition of hydrogen peroxide gas through use of surface modification of production and delivery components.

Abstract: A method and chemical delivery system are provided for low temperature atomic layer deposition. Thus, methods of forming nitrogen-containing thin films by atomic layer deposition using a substantially water free hydrazine gas and plasma treatment are provided.

Abstract: Provided herein is a device for removing residual hydrogen peroxide or hydrazine from an effluent gas stream which includes a metal oxide scrubber material configured to react with residual process gases under increased temperatures. Also provided are systems and methods of using the same.

Abstract: Provided herein are methods, systems, and devices for the vapor phase delivery of high purity process gases to a critical process or application.

Abstract: A method and chemical delivery system and device are provided. One method includes contacting a non-aqueous hydrazine solution with a carrier gas and/or vacuum and delivering a gas stream comprising hydrazine to a critical process or application. One chemical delivery system and device includes a non-aqueous hydrazine solution having a vapor phase that is in contact with a carrier gas and/or vacuum. One device includes a chamber for containing a liquid comprising at least one volatile process chemical, such as a non-aqueous hydrazine solution, a hydrogen peroxide solution, or another suitable process chemical, and a head space from which the volatile can be drawn using a carrier gas and/or vacuum. Another method useful in the present invention involves drawing a process chemical from a device as a disclosed herein using a carrier or vacuum and delivering the process chemical to a critical process or application.

Abstract: Methods and delivery systems for providing a gas phase of a multi-component liquid source for delivery to a critical process application are provided. The methods include concentration of a component of the liquid source which is less volatile than water for delivery of a gas stream comprising the less volatile component to a critical process application. Critical process applications include decontamination and microelectronic processing applications.

Abstract: Provided herein are methods, systems, and devices for the vapor phase delivery of high purity process gases to a critical process or application.

Abstract: A method and chemical delivery system and device are provided. One method includes contacting a non-aqueous hydrazine solution with a carrier gas and/or vacuum and delivering a gas stream comprising hydrazine to a critical process or application. One chemical delivery system and device includes a non-aqueous hydrazine solution having a vapor phase that is in contact with a carrier gas and/or vacuum. One device includes a chamber for containing a liquid comprising at least one volatile process chemical, such as a non-aqueous hydrazine solution, a hydrogen peroxide solution, or another suitable process chemical, and a head space from which the volatile can be drawn using a carrier gas and/or vacuum. Another method useful in the present invention involves drawing a process chemical from a device as a disclosed herein using a carrier or vacuum and delivering the process chemical to a critical process or application.

Abstract: Provided herein is a device for removing residual hydrogen peroxide or hydrazine from an effluent gas stream which includes a metal oxide scrubber material configured to react with residual process gases under increased temperatures. Also provided are systems and methods of using the same.

Abstract: Provided herein are methods, systems, and devices for the vapor phase delivery of high purity process gases to a critical process or application.

Abstract: A method and chemical delivery system are provided. The method includes providing a vapor phase of a multi-component liquid source. The method further includes contacting a pre-loaded carrier gas with the vapor phase, wherein the pre-loaded carrier gas includes a carrier gas and at least one component of the multi-component liquid source and delivering a gas stream comprising at least one component of the liquid source to a critical process or application, wherein the amount of the component in the carrier gas is sufficient to keep the ratio of components in the multi-component liquid source relatively constant. The chemical delivery system includes a multi-component liquid source having a vapor phase.

Abstract: Methods and delivery systems for providing a gas phase of a multi-component liquid source for delivery to a critical process application are provided. The methods include concentration of a component of the liquid source which is less volatile than water for delivery of a gas stream comprising the less volatile component to a critical process application. Critical process applications include decontamination and microelectronic processing applications.

Abstract: A method and chemical delivery system are provided. The method includes providing a non-aqueous hydrogen peroxide solution having a vapor phase separated from the substantially non-aqueous hydrogen peroxide solution by a membrane. The method further includes contacting a carrier gas or vacuum with the vapor phase and delivering a gas stream comprising hydrogen peroxide to a critical process or application. The chemical delivery system includes a non-aqueous hydrogen peroxide solution having a vapor phase separated from the substantially non-aqueous hydrogen peroxide solution by a membrane. The system further includes a carrier gas or vacuum in fluid contact with the vapor phase and an apparatus for delivering a gas stream comprising at least one component of the hydrogen peroxide solution to a critical process or application.

Abstract: A method and chemical delivery system are provided. The method includes providing a concentrated aqueous hydrogen peroxide solution in a boiler having a head space, boiling the concentrated aqueous hydrogen peroxide solution to produce a dilute vapor comprising hydrogen peroxide within the head space of the boiler, and adding a dilute aqueous hydrogen peroxide solution to the concentrated aqueous hydrogen peroxide solution within the boiler to maintain the concentration of the aqueous hydrogen peroxide solution in the boiler. The method further includes delivering the dilute vapor comprising hydrogen peroxide to a critical process or application.

Abstract: A method and chemical delivery system are provided. The method includes providing a non-aqueous hydrogen peroxide solution having a vapor phase separated from the substantially non-aqueous hydrogen peroxide solution by a membrane. The method further includes contacting a carrier gas or vacuum with the vapor phase and delivering a gas stream comprising hydrogen peroxide to a critical process or application. The chemical delivery system includes a non-aqueous hydrogen peroxide solution having a vapor phase separated from the substantially non-aqueous hydrogen peroxide solution by a membrane. The system further includes a carrier gas or vacuum in fluid contact with the vapor phase and an apparatus for delivering a gas stream comprising at least one component of the hydrogen peroxide solution to a critical process or application.

Abstract: A method and chemical delivery system are provided. The method includes providing a vapor phase of a multi-component liquid source. The method further includes contacting a pre-loaded carrier gas with the vapor phase, wherein the pre-loaded carrier gas includes a carrier gas and at least one component of the multi-component liquid source and delivering a gas stream comprising at least one component of the liquid source to a critical process or application, wherein the amount of the component in the carrier gas is sufficient to keep the ratio of components in the multi-component liquid source relatively constant. The chemical delivery system includes a multi-component liquid source having a vapor phase.

Abstract: A brake caliper has a brake pad having a backplate with a friction material attached to one side and a loading face on an opposite side. The caliper further includes a piston that applies a force to the loading face. The brake pad is releasably attached to the piston, thereby eliminating a separate brake pad retaining structure in the caliper.

Abstract: A brake caliper has a brake pad having a backplate with a friction material attached to one side and a loading face on an opposite side. The caliper further includes a piston that applies a force to the loading face. The brake pad is releasably attached to the piston, thereby eliminating a separate brake pad retaining structure in the caliper.

Abstract: A brake caliper has a brake pad having a backplate with a friction material attached to one side and a loading face on an opposite side. The caliper further includes a piston that applies a force to the loading face. The brake pad is releasably attached to the piston, thereby eliminating a separate brake pad retaining structure in the caliper.

Abstract: A brake system includes a brake disc having a first disc face and a second disc face on a first side and a second side, respectively, of the brake disc. The brake disc is mounted rotatably fast with but longitudinally slidable on a rotatable shaft. The brake disc is clampable between a first friction surface of a fixed brake pad positioned on the first side of the brake disc and a second friction surface of a moveable brake pad positioned on the second side of the brake disc. The system further includes a disc positioner operable to define a running clearance between the first disc face and the first friction surface. The disc positioner is adjustable to maintain the running clearance as the fixed brake pad wears. A biasing member located on the second side of the brake disc maintains contact between the disc positioner and first disc face of the brake disc.