Abstract: A magnetic write head having a write coil configured to dissipate heat away from the write head to minimize thermal protrusion. The write coil is formed as a helical coil having upper and lower leads that are connected by electrically conductive studs formed therebetween. The first and leads extend beyond the studs to form heat conducting fins that conduct heat away from the write head where it can be dissipated into surrounding structure.

Abstract: A method and apparatus for providing a write head with an improved pole tip to improve overwrite and/or adjacent track interference. A cross pole tip writer is provided with a shape that is designed to reduce the saturation on the pole tip and aid in the concentration of flux to the down track.

Abstract: A magnetic head including a media heating device that is fabricated within the magnetic head structure. The media heating device includes an electrically resistive element that is fabricated above the first magnetic pole layer close to the ABS surface of the head. A P1 pole pedestal is fabricated above the heating element. Electrical insulation layers are fabricated beneath and above the heating element to prevent electrical shorting to the P1 pole layer and the P1 pole pedestal that are disposed beneath and above the heating element, respectively.

Abstract: A method of making a magnetic head involves providing a partially constructed magnetic head which has a top surface formed by a front P2 pole tip, a back gap P2 pedestal, and insulator materials disposed between the front P2 pole tip and the back gap P2 pedestal; forming a layer of selectively etchable materials over the top surface of the partially constructed magnetic head, the layer having a front edge that is recessed away from an air bearing surface (ABS); forming additional insulator materials over the selectively etchable material layer and over a front portion of the front P2 pole tip; performing a chemical-mechanical polishing (CMP) to form a substantially coplanar top surface with the selectively etchable material layer and the additional insulator materials; etching to remove the selectively etchable material layer; depositing yoke layer materials over the resulting structure; and performing a chemically-mechanically polishing (CMP) to form a substantially coplanar top surface with the yoke layer m