Patents by Inventor Edward J. Delawski

Edward J. Delawski has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Effect-particle orientation and apparatus therefor
    Patent number: 7375335
    Abstract: A method and apparatus for determining the effect-particle orientation in a film or coating are disclosed. The method comprises using opposing directional reflectance measurements, preferably in continuous processes and allows for an on-line evaluation system to provide more specific control over particle orientation, thereby allowing for better color matching between and among various panels or articles.
    Type: Grant
    Filed: October 7, 2004
    Date of Patent: May 20, 2008
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Randall Allen Vogel, John C. Modla, Edward J. Delawski
  • YARN SENSOR
    Publication number: 20020000526
    Abstract: A sensor for monitoring a yarn parameter, such as degree of interlace, operates by transmitting radiation from a transparent wear surface to a detector. The yarn contacts the wear surface as that the moving yarn continuously wipes the wear surface clean. A hinge assembly, including a pin, may be used with this sensor, where the pin swings toward the moving yarn to keep the yarn in contact with the wear surface.
    Type: Application
    Filed: April 13, 1999
    Publication date: January 3, 2002
    Inventors: EDWARD J. DELAWSKI, JOHN C. MODLA
  • Etching of nanoscale structures
    Patent number: 5210425
    Abstract: A process for etching with an atomic force microscope using a two-dimensional metal chalcogenide as the substrate, is disclosed.
    Type: Grant
    Filed: August 30, 1991
    Date of Patent: May 11, 1993
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Edward J. Delawski, Bruce A. Parkinson