Patents by Inventor Edward J. McInerney
Edward J. McInerney has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10302553Abstract: A gas exhaust by-product measurement system is provided. A gas chamber is configured to receive exhaust from the exhaust output. A light source, light detector, and at least one optical element are positioned so that a light beam from the light source is directed to the at least one optical element a plurality of times before reaching the light detector. At least one heater provides heat to the at least one optical element. A plurality of purge gas nozzles are in fluid connection with the optical cavity. A high flow line is in fluid connection between a purge gas source and the plurality of purge gas nozzles. A low flow line is in fluid connection between the purge gas source and the plurality of purge gas nozzles. At least one flow controller manages a plurality of flow rates including a high flow and a low flow.Type: GrantFiled: August 30, 2017Date of Patent: May 28, 2019Assignee: Lam Research CorporationInventors: Cristian Siladie, Luc Albarede, Yassine Kabouzi, Edward J. McInerney, Sassan Roham
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Publication number: 20190064057Abstract: A gas exhaust by-product measurement system is provided. A gas chamber is configured to receive exhaust from the exhaust output. A light source, light detector, and at least one optical element are positioned so that a light beam from the light source is directed to the at least one optical element a plurality of times before reaching the light detector. At least one heater provides heat to the at least one optical element. A plurality of purge gas nozzles are in fluid connection with the optical cavity. A high flow line is in fluid connection between a purge gas source and the plurality of purge gas nozzles. A low flow line is in fluid connection between the purge gas source and the plurality of purge gas nozzles. At least one flow controller manages a plurality of flow rates including a high flow and a low flow.Type: ApplicationFiled: August 30, 2017Publication date: February 28, 2019Inventors: Cristian SILADIE, Luc ALBAREDE, Yassine KABOUZI, Edward J. MCINERNEY, Sassan ROHAM
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Patent number: 9218945Abstract: A magnetron include a center plurality of magnets and an outer plurality of magnets arranged around the center plurality of magnets in a shape of two long sections and two shorter turnaround sections. The outer plurality of magnets are configured with at least one region of weaker magnetic field strength in at least one of the two long sections and adjacent to one of the two turnaround sections.Type: GrantFiled: December 12, 2011Date of Patent: December 22, 2015Assignee: APOLLO PRECISION BEIJING LIMITEDInventors: Fred Chetcuti, Edward J. McInerney
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Patent number: 8906450Abstract: A powder spray nozzle includes an inlet portion having an inlet diameter and an inlet length and an outlet portion having outlet diameter and an outlet length. The nozzle also includes an interface region between the inlet portion and the outlet portion having an interface diameter. A ratio of the inlet diameter to the inlet length is in a range of about 0.15 to 0.5.Type: GrantFiled: September 28, 2011Date of Patent: December 9, 2014Assignee: Hanergy Holding Group Ltd.Inventors: Edward J. McInerney, Johannes Vlcek
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Publication number: 20130146444Abstract: A magnetron include a center plurality of magnets and an outer plurality of magnets arranged around the center plurality of magnets in a shape of two long sections and two shorter turnaround sections. The outer plurality of magnets are configured with at least one region of weaker magnetic field strength in at least one of the two long sections and adjacent to one of the two turnaround sections.Type: ApplicationFiled: December 12, 2011Publication date: June 13, 2013Applicant: MiaSoleInventors: Fred Chetcuti, Edward J. McInerney
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Patent number: 6918824Abstract: An assembly for a chemical-mechanical polishing process includes a platen having an outer edge, a top surface, and at least one inlet for introducing fluid to the top surface; a manifold system, entrenched in the top surface and in communication with the at least one inlet, for channeling the fluid about the top surface; a polishing pad having a top pad surface, and a plurality of fluid delivery through-holes for introducing the fluid from the manifold system to the top pad surface; and a fluid distribution system, entrenched in the top pad surface and in communication with the through-holes, for substantially uniformly distributing the fluid about the top pad surface. The fluid distribution system includes a set of intersecting first grooves defining an array of lands, each of the first grooves having a first cross sectional area.Type: GrantFiled: September 25, 2003Date of Patent: July 19, 2005Assignee: Novellus Systems, Inc.Inventors: Dave Marquardt, Sooyun Joh, David Cohen, Edward J. McInerney
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Patent number: 6561796Abstract: Bowing of semiconductor wafers during heating is reduced by heating the wafers in a gas with a thermal conductivity and mean free path greater than that of oxygen, or by heating the wafers in a processing chamber under a pressure less than 0.1 Torr. In one embodiment, the high thermal conductivity gas is helium and heating in the helium takes place at a pressure less than 2.4 Torr.Type: GrantFiled: September 6, 2000Date of Patent: May 13, 2003Assignee: Novellus Systems, Inc.Inventors: Martin M. Barrera, George Kamian, Edward J. McInerney, Craig L. Stevens
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Patent number: 6397861Abstract: A processing chamber with a showerhead and a chuck is cleaned using an injection of a gaseous cleaning agent through an aperture in the chuck into the processing chamber. Because the aperture is located directly under the showerhead, a portion of the gaseous cleaning agent passes through the face plate of the showerhead so that the inside of the showerhead may be cleaned as well. By applying a radio frequency power supply between the chuck and the showerhead, for example, by a coil located between the chuck and showerhead or applying the power directly to the chuck and the showerhead, the gaseous cleaning agent forms a plasma. Thus, the portion of the gaseous cleaning agent that passes through the face plate and into the showerhead is a plasma. The plasma is pumped out of the chamber through a pumping port so that the plasma continuously flows through the processing chamber.Type: GrantFiled: August 10, 2000Date of Patent: June 4, 2002Assignee: Novellus Systems, Inc.Inventors: James C. Wing, Edward J. McInerney
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Patent number: 6319553Abstract: A multi-station processing chamber in which incompatible processes are performed includes multiple pedestals positioned in wells with annular gaps around the pedestals. Showerheads located above the pedestals flow reactive gases over substrates located on the pedestals. The reactive gases are drawn through the annular gaps by a pressure gradient. The reactive gases are then pumped out of the wells through an exhaust port. The narrow annular gap permits little recirculation of the reactive gases one they are drawn into the wells. Moreover, the showerheads are flush with ceiling of the chamber and the wells contain smooth contours to minimize dead space in the chamber thereby reducing residence time of the reactive gases. An indexing plate is used to lift the substrates off the pedestals and to accurately position the substrates at the next processing station.Type: GrantFiled: February 28, 2000Date of Patent: November 20, 2001Assignee: Novellus Systems, Inc.Inventors: Edward J. McInerney, Thomas M. Pratt, Shawn D. Hancock
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Patent number: 6277235Abstract: A processing chamber with a showerhead and a chuck is cleaned using an injection of a gaseous cleaning agent through an aperture in the chuck into the processing chamber. Because the aperture is located directly under the showerhead, a portion of the gaseous cleaning agent passes through the face plate of the showerhead so that the inside of the showerhead may be cleaned as well. By applying a radio frequency power supply between the chuck and the showerhead, for example, by a coil located between the chuck and showerhead or applying the power directly to the chuck and the showerhead, the gaseous cleaning agent forms a plasma. Thus, the portion of the gaseous cleaning agent that passes through the face plate and into the showerhead is a plasma. The plasma is pumped out of the chamber through a pumping port so that the plasma continuously flows through the processing chamber.Type: GrantFiled: August 11, 1998Date of Patent: August 21, 2001Assignee: Novellus Systems, Inc.Inventors: James C. Wing, Edward J. McInerney
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Patent number: 6143082Abstract: A multi-station processing chamber in which incompatible processes are performed includes multiple pedestals positioned in wells with annular gaps around the pedestals. Showerheads located above the pedestals flow reactive gases over substrates located on the pedestals. The reactive gases are drawn through the annular gaps by a pressure gradient. The reactive gases are then pumped out of the wells through an exhaust port. The narrow annular gap permits little recirculation of the reactive gases once they are drawn into the wells. Moreover, the showerheads are flush with ceiling of the chamber and the wells contain smooth contours to minimize dead space in the chamber thereby reducing residence time of the reactive gases. An indexing plate is used to lift the substrates off the pedestals and to accurately position the substrates at the next processing station.Type: GrantFiled: October 8, 1998Date of Patent: November 7, 2000Assignee: Novellus Systems, Inc.Inventors: Edward J. McInerney, Thomas M. Pratt, Shawn D. Hancock
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Patent number: 5901271Abstract: A cyclone evaporator includes an evaporator body with an evaporation chamber therein. The evaporation chamber preferably includes a thermally conductive sidewall having a generally cylindrical upper portion and a downwardly tapered lower portion. The evaporator body further includes a cover having a vapor outlet opening into the evaporation chamber and an outlet tube. The outlet tube circumscribes the vapor outlet and extends into a lower portion of the evaporation chamber. A liquid precursor passage and a carrier gas passage extend through the evaporator body and open into the evaporation chamber. In one embodiment, the carrier gas passage is positioned to direct carrier gas parallel to liquid precursor flow and intersect the liquid precursor at a liquid precursor passage outlet within the evaporation chamber. In another embodiment, the carrier gas passage is positioned to direct carrier gas across an outlet of liquid precursor passage.Type: GrantFiled: February 26, 1997Date of Patent: May 4, 1999Assignee: Novellus Systems, Inc.Inventors: Jeffrey C. Benzing, Edward J. McInerney, Michael N. Susoeff
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Patent number: 5843233Abstract: A platen supports a wafer during the deposition of tungsten, metal nitrides, other metals, and silicides in a chemical vapor deposition reactor. A deposition control gas that includes a suitable inert gas such as argon or a mixture of inert and reactant gases such as argon and hydrogen is introduced through a restrictive opening into an ambient in the reactor. An exclusion guard aligned with the platen has an extension extending over a frontside peripheral region of the wafer. Deposition control gas is introduced under the exclusion guard extension and exits through a restrictive opening between the exclusion guard extension and a wafer frontside peripheral region. The restrictive opening provides a uniform pressure of deposition control gas at the edge and frontside of the wafer to prevent deposition on the wafer edge and backside.Type: GrantFiled: June 7, 1995Date of Patent: December 1, 1998Assignee: Novellus Systems, Inc.Inventors: Everhardus P. van de Ven, Eliot K. Broadbent, Jeffrey C. Benzing, Barry L. Chin, Christopher W. Burkhart, Lawrence C. Lane, Edward J. McInerney
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Patent number: 5653813Abstract: A cyclone evaporator includes an evaporator body with an evaporation chamber therein. The evaporation chamber preferably includes a thermally conductive sidewall having a generally cylindrical upper portion and a downwardly tapered lower portion. The evaporator body further includes a cover having a vapor outlet opening into the evaporation chamber and an outlet tube. The outlet tube circumscribes the vapor outlet and extends into a lower portion of the evaporation chamber. A liquid precursor passage and a carrier gas passage extend through the evaporator body and open into the evaporation chamber. In one embodiment, the carrier gas passage is positioned to direct carrier gas parallel to liquid precursor flow and intersect the liquid precursor at a liquid precursor passage outlet within the evaporation chamber. In another embodiment, the carrier gas passage is positioned to direct carrier gas across an outlet of liquid precursor passage.Type: GrantFiled: April 3, 1995Date of Patent: August 5, 1997Assignee: Novellus Systems, Inc.Inventors: Jeffrey C. Benzing, Edward J. McInerney, Michael N. Susoeff
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Patent number: 5397809Abstract: Polyurethane foam of low thermal conductivity is prepared by employing carbon dioxide as a blowing agent, preferably in combination with a halogenated compound, typically a halocarbon or halohydrocarbon such as monofluorotrichloromethane or 1,1-dichloro-1-fluoroethane, and incorporating in the foam a carbon dioxide-reactive reagent. Sodium hydroxide and soda lime are illustrative carbon dioxide-reactive reagents. The carbon dioxide is preferably formed in situ by the reaction of water with the diisocyanate precursor of the polyurethane, and the carbon dioxide-reactivereagent is preferably introduced in admixture with a portion of the polyol precursor.Type: GrantFiled: August 1, 1994Date of Patent: March 14, 1995Assignee: General Electric CompanyInventors: William J. Ward, III, James Day, Monica A. Ferrero-Heredia, Edward J. McInerney
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Patent number: 5371113Abstract: Polyurethane foam of low thermal conductivity is prepared by employing carbon dioxide as a blowing agent, preferably in combination with a halogenated compound, typically a halocarbon or halohydrocarbon such as monofluorotrichloromethane or 1,1-dichloro-1-fluoroethane, and incorporating in the foam a carbon dioxide-reactive reagent. Sodium hydroxide and soda lime are illustrative carbon dioxide-reactive reagents. The carbon dioxide is preferably formed in situ by the reaction of water with the diisocyanate precursor of the polyurethane, and the carbon dioxide-reactivereagent is preferably introduced in admixture with a portion of the polyol precursor.Type: GrantFiled: March 29, 1993Date of Patent: December 6, 1994Assignee: General Electric CompanyInventors: William J. Ward, III, James Day, Monica A. Ferrero-Heredia, Edward J. McInerney
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Patent number: 4690746Abstract: A method for producing a film over a topologically non-planar surface of a material which has a sputter etch rate which is higher in a direction parallel to the plane of the wafer than in a direction perpendicular to the plane of the wafer. Key steps in the process include first, depositing the material by plasma enhanced chemical vapor deposition while simultaneously sputter etching it. Then second, sputter etching the material. Using this two step process, a substantially conformal or sloped film is produced by repeating the steps consecutively until the desired thickness is obtained. The film can then be substantially planarized if desired, by an extended sputter etch to selectively remove material having a sloped surface rather than a flat surface, since the etch rate is higher parallel to the plane of the wafer than perpendicular to the wafer.Type: GrantFiled: February 24, 1986Date of Patent: September 1, 1987Assignee: Genus, Inc.Inventors: Edward J. McInerney, E. Ronald Dornseif, Norman E. Zetterquist
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Patent number: 3993621Abstract: A styrene-acrylonitrile composition having reinforcing glass fibers, a brominated flame-retarding additive, and polytetrafluorethylene in amounts sufficient to prevent dripping of the composition at flaming combustion conditions.Type: GrantFiled: October 30, 1974Date of Patent: November 23, 1976Assignee: General Electric CompanyInventors: Edward J. McInerney, John C. Rieber, Douglas P. Thomas