Patents by Inventor Edward J. Reardon, Jr.

Edward J. Reardon, Jr. has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5698376
    Abstract: In a method of providing a resist pattern on a substrate surface, a layer of photoimageable composition is applied to a substrate, which photoimageable composition provides a tack-free surface. The photoimageable composition comprises:A) between about 25 and about 75 wt % of a binder polymer, B) between about 20 and about 60 wt % of a photopolymerizeable material which is a multifunctional photopolymerizeable monomer or short chain oligomer, and C) between about 2 and about 20 wt % of a photoinitiator chemical system (the weight percentages are based on the total weight of components A)-C)). The binder polymer A) comprises a backbone formed of between about 45 and about 65 mole percent of monomers which are selected from the group i) consisting of styrene, C.sub.1 14 C.sub.
    Type: Grant
    Filed: March 20, 1996
    Date of Patent: December 16, 1997
    Assignee: Morton International, Inc.
    Inventors: James J. Briguglio, Charles R. Keil, Vinai Ming Tara, Edward J. Reardon, Jr., Randall W. Kautz
  • Patent number: 5609991
    Abstract: A photoimageable composition, useful as a photoresist for forming a printed circuit board, is both alkaline aqueous developable but, subsequent to exposure and development, is processable in highly alkaline environments, such as additive plating baths and ammoniacal etchants. The photoimageable composition is tack-free and is resistance to polymerization inhibition by oxygen, and is therefore particularly suitable for contact printing. The photoimageable composition comprises A) between about 25 and about 75 wt % of a binder polymer, B) between about 20 and about 60 wt % of a photopolymerizeable material which is a multifunctional photopolymerizeable monomer or short chain oligomer, and C) between about 2 and about 20 wt % of a photoimageable chemical system, the weight percentages being based on the total weight of components A)-C).
    Type: Grant
    Filed: August 3, 1995
    Date of Patent: March 11, 1997
    Assignee: Morton International, Inc.
    Inventors: James J. Briguglio, Charles R. Keil, Vinai M. Tara, Edward J. Reardon, Jr., Randall W. Kautz
  • Patent number: 4343885
    Abstract: Compositions containing a polymerizable, curable or crosslinkable component, a photoinitiator, a fluoran colorformer and a latent activator that releases or promotes the release of a Lewis acid, will become insoluble and change color under the influence of actinic radiation. These compositions are particularly useful to make dry film photoresists, which are widely used in the electronics industry to manufacture printed circuits.
    Type: Grant
    Filed: October 8, 1980
    Date of Patent: August 10, 1982
    Assignee: Dynachem Corporation
    Inventor: Edward J. Reardon, Jr.