Patents by Inventor Edward K. Pavelchek

Edward K. Pavelchek has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8142988
    Abstract: Organic coating composition are provided including antireflective coating compositions that can reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing or via-fill layer. Preferred compositions of the invention comprise contain a crosslinker component that is resistant to sublimination or other migration crosslinker from the composition coating layer during lithographic processing.
    Type: Grant
    Filed: March 20, 2006
    Date of Patent: March 27, 2012
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Anthony Zampini, Edward K. Pavelchek
  • Patent number: 7632630
    Abstract: The present invention provides new photoresist compositions that comprise a resin binder, a photoactive component, particularly an acid generator, and a dye material that contains one or more chromophores that can reduce undesired reflections of exposure radiation. Preferred dye compounds are polymeric materials that include one or more chromophores such as anthracene and other polycyclic moieties that effectively absorb deep UV exposure radiation.
    Type: Grant
    Filed: May 3, 2006
    Date of Patent: December 15, 2009
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: James Michael Mori, James W. Thackeray, Roger F. Sinta, Rosemary Bell, Robin L. Miller-Fahey, Timothy G. Adams, Thomas M. Zydowsky, Edward K. Pavelchek, Manual doCanto
  • Publication number: 20090220888
    Abstract: The present invention provides new photoresist compositions that comprise a resin binder, a photoactive component, particularly an acid generator, and a dye material that contains one or more chromophores that can reduce undesired reflections of exposure radiation. Preferred dye compounds are polymeric materials that include one or more chromophores such as anthracene and other polycyclic moieties that effectively absorb deep UV exposure radiation.
    Type: Application
    Filed: December 12, 2008
    Publication date: September 3, 2009
    Applicant: Shipley Company, L.L.C.
    Inventors: James Michael Mori, James W. Thackeray, Roger F. Sinta, Rosemary Bell, Robin L. Miller-Fahey, Timothy G. Adams, Thomas M. Zydowsky, Edward K. Pavelchek, Manual doCanto
  • Patent number: 7147983
    Abstract: The present invention provides new photoresist compositions that comprise a resin binder, a photoactive component, particularly an acid generator, and a dye material that contains one or more chromophores that can reduce undesired reflections of exposure radiation. Preferred dye compounds are polymeric materials that include one or more chromophores such as anthracene and other polycyclic moieties that effectively absorb deep UV exposure radiation.
    Type: Grant
    Filed: October 7, 1996
    Date of Patent: December 12, 2006
    Assignee: Shipley Company, L.L.C.
    Inventors: James Michael Mori, James W. Thackeray, Roger F. Sinta, Rosemary Bell, Robin L. Miller-Fahey, Timothy G. Adams, Thomas M. Zydowsky, Edward K. Pavelchek, Manuel doCanto
  • Patent number: 7026101
    Abstract: Antireflective compositions are provided that contain a basic additive material. Such use of a basic material can significantly decrease or even completely eliminate notching of an overcoated photoresist relief image. Antireflective formulations of the invention are preferably crosslinking compositions and may contain a resin component in addition to the basic additive. Antireflective compositions of the invention can be effectively used at a variety of wavelengths used to expose an overcoated photoresist layer, including 248 nm and 193 nm.
    Type: Grant
    Filed: July 30, 2001
    Date of Patent: April 11, 2006
    Assignee: Shipley Company, LLC
    Inventors: Peter Trefonas, III, Manuel doCanto, Edward K. Pavelchek
  • Patent number: 7018717
    Abstract: New organic-based radiation absorbing compositions are provided that are suitable for use as an antireflective coating composition (“ARC”) for an overcoated photoresist. These compositions also serve effectively as a hard mask layer by exhibiting a sufficient plasma etch selectively from an undercoated dielectric layer.
    Type: Grant
    Filed: June 9, 2003
    Date of Patent: March 28, 2006
    Assignee: Shipley Company, L.L.C.
    Inventor: Edward K. Pavelchek
  • Patent number: 6890448
    Abstract: New organic-based radiation absorbing compositions are provided that are suitable for use as an antireflective coating composition (“ARC”) for an overcoated photoresist. These compositions also serve effectively as a hard mask layer by exhibiting a sufficient plasma etch selectively from an undercoated dielectric layer.
    Type: Grant
    Filed: June 11, 1999
    Date of Patent: May 10, 2005
    Assignee: Shipley Company, L.L.C.
    Inventor: Edward K. Pavelchek
  • Patent number: 6887648
    Abstract: Antireflective compositions are provided that contain an ionic thermal acid generator material. Use of such a thermal acid generator material can significantly increase the shelf life of solutions of antireflective compositions in protic media. Antireflective compositions of the invention can be effectively used at a variety of wavelengths used to expose an overcoated photoresist layer, including 248 nm and 193 nm.
    Type: Grant
    Filed: June 2, 2004
    Date of Patent: May 3, 2005
    Assignee: Shipley Company, L.L.C.
    Inventors: Edward K. Pavelchek, Peter Trefonas, III
  • Patent number: 6855466
    Abstract: The present invention provides new light absorbing compositions suitable for use as antireflective coating compositions (“ARCs”), including for deep UV applications. The antireflective compositions of the invention are particularly useful where a planarizing coating layer is required. ARCs of the invention contain a low molecular weight resin, a plasticizer compound and/or a low Tg resin. The invention also includes methods for applying forming planarizing ARC coating layers.
    Type: Grant
    Filed: September 15, 2001
    Date of Patent: February 15, 2005
    Assignee: Shipley Company, L.L.C.
    Inventors: Edward K. Pavelchek, Timothy G. Adams, Manuel doCanto, Suzanne Coley, George G. Barclay
  • Patent number: 6849373
    Abstract: The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition, particularly for deep UV applications. The antireflective compositions of the invention comprise a photoacid generator that is activated during exposure of an overcoated photoresist. Antireflective compositions of the invention can significantly reduce undesired footing of an overcoated resist relief image.
    Type: Grant
    Filed: July 14, 2001
    Date of Patent: February 1, 2005
    Inventors: Edward K. Pavelchek, Manuel DoCanto
  • Publication number: 20040219453
    Abstract: Antireflective compositions are provided that contain an ionic thermal acid generator material. Use of such a thermal acid generator material can significantly increase the shelf life of solutions of antireflective compositions in protic media. Antireflective compositions of the invention can be effectively used at a variety of wavelengths used to expose an overcoated photoresist layer, including 248 nm and 193 nm.
    Type: Application
    Filed: June 2, 2004
    Publication date: November 4, 2004
    Applicant: Shipley Company, L.L.C.
    Inventors: Edward K. Pavelchek, Peter Trefonas
  • Patent number: 6767689
    Abstract: Antireflective compositions are provided that contain an ionic thermal acid generator material. Use of such a thermal acid generator material can significantly increase the shelf life of solutions of antireflective compositions in protic media. Antireflective compositions of the invention can be effectively used at a variety of wavelengths used to expose an overcoated photoresist layer, including 248 nm and 193 nm.
    Type: Grant
    Filed: May 10, 2002
    Date of Patent: July 27, 2004
    Assignee: Shipley Company, L.L.C.
    Inventors: Edward K. Pavelchek, Peter Trefonas, III
  • Patent number: 6749765
    Abstract: Disclosed are compositions and methods for providing substantially planarized surfaces in the manufacture of electronic devices. Also disclosed are compositions and methods for protecting apertures in the manufacture of electronic devices.
    Type: Grant
    Filed: March 27, 2002
    Date of Patent: June 15, 2004
    Assignee: Shipley Company, L.L.C.
    Inventors: Edward W. Rutter, Jr., Peter Trefonas, III, Edward K. Pavelchek
  • Patent number: 6653049
    Abstract: The present invention provides new light absorbing compositions suitable for use as antireflective coating compositions (“ARCs”), particularly for deep UV applications. The antireflective compositions of the invention in general comprise a resin binder component that contains a high molecular weight polymer, e.g. a polymer having an Mw of at least about 40,000 daltons. ARCs of the invention exhibit exceptional conformality upon application to a substrate surface. For example, ARCs of the invention can coat substantial topography such as vertical and sloping steps with high conformality.
    Type: Grant
    Filed: February 17, 2001
    Date of Patent: November 25, 2003
    Assignee: Shipley Company, L.L.C.
    Inventors: Edward K. Pavelchek, Manuel DoCanto, Timothy G. Adams
  • Publication number: 20030209515
    Abstract: New organic-based radiation absorbing compositions are provided that are suitable for use as an antireflective coating composition (“ARC”) for an overcoated photoresist. These compositions also serve effectively as a hard mask layer by exhibiting a sufficient plasma etch selectively from an undercoated dielectric layer.
    Type: Application
    Filed: June 9, 2003
    Publication date: November 13, 2003
    Applicant: Shipley Company, L.L.C.
    Inventor: Edward K. Pavelchek
  • Patent number: 6602652
    Abstract: The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition (ARC), particularly suitable for short wavelength imaging applications such as 193 nm. The ARCs of the invention are preferably used with an overcoated resist layer (i.e. bottom layer ARCs) and in general comprise novel ARC resin binders that can effectively absorb reflected sub-200 nm exposure radiation.
    Type: Grant
    Filed: April 20, 2002
    Date of Patent: August 5, 2003
    Assignee: Shipley Company, L.L.C.
    Inventors: Timothy G. Adams, Edward K. Pavelchek, Roger F. Sinta, Manuel DoCanto, Robert F. Blacksmith, Peter Trefonas, III
  • Publication number: 20030008237
    Abstract: Antireflective compositions are provided that contain an ionic thermal acid generator material. Use of such a thermal acid generator material can significantly increase the shelf life of solutions of antireflective compositions in protic media. Antireflective compositions of the invention can be effectively used at a variety of wavelengths used to expose an overcoated photoresist layer, including 248 nm and 193 nm.
    Type: Application
    Filed: May 10, 2002
    Publication date: January 9, 2003
    Applicant: Shipley Company, L.L.C.
    Inventors: Edward K. Pavelchek, Peter Trefonas
  • Publication number: 20020195419
    Abstract: New organic-based radiation absorbing compositions are provided that are suitable for use as an antireflective coating composition (“ARC”) for an overcoated photoresist. These compositions also serve effectively as a hard mask layer by exhibiting a sufficient plasma etch selectively from an undercoated dielectric layer.
    Type: Application
    Filed: June 11, 1999
    Publication date: December 26, 2002
    Inventor: EDWARD K. PAVELCHEK
  • Publication number: 20020172896
    Abstract: The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition (ARC), particularly suitable for short wavelength imaging applications such as 193 nm. The ARCs of the invention are preferably used with an overcoated resist layer (i.e. bottom layer ARCs) and in general comprise novel ARC resin binders that can effectively absorb reflected sub-200 nm exposure radiation.
    Type: Application
    Filed: April 20, 2002
    Publication date: November 21, 2002
    Applicant: Shipley Company, L.L.C.
    Inventors: Timothy G. Adams, Edward K. Pavelchek, Roger F. Sinta, Manuel DoCanto, Robert F. Blacksmith, Peter Trefonas
  • Patent number: 6461717
    Abstract: Disclosed are compositions and methods for providing substantially planarized surfaces in the manufacture of electronic devices. Also disclosed are compositions and methods for protecting apertures in the manufacture of electronic devices.
    Type: Grant
    Filed: April 24, 2000
    Date of Patent: October 8, 2002
    Assignee: Shipley Company, L.L.C.
    Inventors: Edward W. Rutter, Jr., Peter Trefonas, III, Edward K. Pavelchek