Patents by Inventor Edward K. Pavelchek
Edward K. Pavelchek has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8142988Abstract: Organic coating composition are provided including antireflective coating compositions that can reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing or via-fill layer. Preferred compositions of the invention comprise contain a crosslinker component that is resistant to sublimination or other migration crosslinker from the composition coating layer during lithographic processing.Type: GrantFiled: March 20, 2006Date of Patent: March 27, 2012Assignee: Rohm and Haas Electronic Materials LLCInventors: Anthony Zampini, Edward K. Pavelchek
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Patent number: 7632630Abstract: The present invention provides new photoresist compositions that comprise a resin binder, a photoactive component, particularly an acid generator, and a dye material that contains one or more chromophores that can reduce undesired reflections of exposure radiation. Preferred dye compounds are polymeric materials that include one or more chromophores such as anthracene and other polycyclic moieties that effectively absorb deep UV exposure radiation.Type: GrantFiled: May 3, 2006Date of Patent: December 15, 2009Assignee: Rohm and Haas Electronic Materials LLCInventors: James Michael Mori, James W. Thackeray, Roger F. Sinta, Rosemary Bell, Robin L. Miller-Fahey, Timothy G. Adams, Thomas M. Zydowsky, Edward K. Pavelchek, Manual doCanto
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Publication number: 20090220888Abstract: The present invention provides new photoresist compositions that comprise a resin binder, a photoactive component, particularly an acid generator, and a dye material that contains one or more chromophores that can reduce undesired reflections of exposure radiation. Preferred dye compounds are polymeric materials that include one or more chromophores such as anthracene and other polycyclic moieties that effectively absorb deep UV exposure radiation.Type: ApplicationFiled: December 12, 2008Publication date: September 3, 2009Applicant: Shipley Company, L.L.C.Inventors: James Michael Mori, James W. Thackeray, Roger F. Sinta, Rosemary Bell, Robin L. Miller-Fahey, Timothy G. Adams, Thomas M. Zydowsky, Edward K. Pavelchek, Manual doCanto
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Patent number: 7147983Abstract: The present invention provides new photoresist compositions that comprise a resin binder, a photoactive component, particularly an acid generator, and a dye material that contains one or more chromophores that can reduce undesired reflections of exposure radiation. Preferred dye compounds are polymeric materials that include one or more chromophores such as anthracene and other polycyclic moieties that effectively absorb deep UV exposure radiation.Type: GrantFiled: October 7, 1996Date of Patent: December 12, 2006Assignee: Shipley Company, L.L.C.Inventors: James Michael Mori, James W. Thackeray, Roger F. Sinta, Rosemary Bell, Robin L. Miller-Fahey, Timothy G. Adams, Thomas M. Zydowsky, Edward K. Pavelchek, Manuel doCanto
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Patent number: 7026101Abstract: Antireflective compositions are provided that contain a basic additive material. Such use of a basic material can significantly decrease or even completely eliminate notching of an overcoated photoresist relief image. Antireflective formulations of the invention are preferably crosslinking compositions and may contain a resin component in addition to the basic additive. Antireflective compositions of the invention can be effectively used at a variety of wavelengths used to expose an overcoated photoresist layer, including 248 nm and 193 nm.Type: GrantFiled: July 30, 2001Date of Patent: April 11, 2006Assignee: Shipley Company, LLCInventors: Peter Trefonas, III, Manuel doCanto, Edward K. Pavelchek
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Patent number: 7018717Abstract: New organic-based radiation absorbing compositions are provided that are suitable for use as an antireflective coating composition (“ARC”) for an overcoated photoresist. These compositions also serve effectively as a hard mask layer by exhibiting a sufficient plasma etch selectively from an undercoated dielectric layer.Type: GrantFiled: June 9, 2003Date of Patent: March 28, 2006Assignee: Shipley Company, L.L.C.Inventor: Edward K. Pavelchek
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Patent number: 6890448Abstract: New organic-based radiation absorbing compositions are provided that are suitable for use as an antireflective coating composition (“ARC”) for an overcoated photoresist. These compositions also serve effectively as a hard mask layer by exhibiting a sufficient plasma etch selectively from an undercoated dielectric layer.Type: GrantFiled: June 11, 1999Date of Patent: May 10, 2005Assignee: Shipley Company, L.L.C.Inventor: Edward K. Pavelchek
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Patent number: 6887648Abstract: Antireflective compositions are provided that contain an ionic thermal acid generator material. Use of such a thermal acid generator material can significantly increase the shelf life of solutions of antireflective compositions in protic media. Antireflective compositions of the invention can be effectively used at a variety of wavelengths used to expose an overcoated photoresist layer, including 248 nm and 193 nm.Type: GrantFiled: June 2, 2004Date of Patent: May 3, 2005Assignee: Shipley Company, L.L.C.Inventors: Edward K. Pavelchek, Peter Trefonas, III
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Patent number: 6855466Abstract: The present invention provides new light absorbing compositions suitable for use as antireflective coating compositions (“ARCs”), including for deep UV applications. The antireflective compositions of the invention are particularly useful where a planarizing coating layer is required. ARCs of the invention contain a low molecular weight resin, a plasticizer compound and/or a low Tg resin. The invention also includes methods for applying forming planarizing ARC coating layers.Type: GrantFiled: September 15, 2001Date of Patent: February 15, 2005Assignee: Shipley Company, L.L.C.Inventors: Edward K. Pavelchek, Timothy G. Adams, Manuel doCanto, Suzanne Coley, George G. Barclay
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Patent number: 6849373Abstract: The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition, particularly for deep UV applications. The antireflective compositions of the invention comprise a photoacid generator that is activated during exposure of an overcoated photoresist. Antireflective compositions of the invention can significantly reduce undesired footing of an overcoated resist relief image.Type: GrantFiled: July 14, 2001Date of Patent: February 1, 2005Inventors: Edward K. Pavelchek, Manuel DoCanto
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Publication number: 20040219453Abstract: Antireflective compositions are provided that contain an ionic thermal acid generator material. Use of such a thermal acid generator material can significantly increase the shelf life of solutions of antireflective compositions in protic media. Antireflective compositions of the invention can be effectively used at a variety of wavelengths used to expose an overcoated photoresist layer, including 248 nm and 193 nm.Type: ApplicationFiled: June 2, 2004Publication date: November 4, 2004Applicant: Shipley Company, L.L.C.Inventors: Edward K. Pavelchek, Peter Trefonas
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Patent number: 6767689Abstract: Antireflective compositions are provided that contain an ionic thermal acid generator material. Use of such a thermal acid generator material can significantly increase the shelf life of solutions of antireflective compositions in protic media. Antireflective compositions of the invention can be effectively used at a variety of wavelengths used to expose an overcoated photoresist layer, including 248 nm and 193 nm.Type: GrantFiled: May 10, 2002Date of Patent: July 27, 2004Assignee: Shipley Company, L.L.C.Inventors: Edward K. Pavelchek, Peter Trefonas, III
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Patent number: 6749765Abstract: Disclosed are compositions and methods for providing substantially planarized surfaces in the manufacture of electronic devices. Also disclosed are compositions and methods for protecting apertures in the manufacture of electronic devices.Type: GrantFiled: March 27, 2002Date of Patent: June 15, 2004Assignee: Shipley Company, L.L.C.Inventors: Edward W. Rutter, Jr., Peter Trefonas, III, Edward K. Pavelchek
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Patent number: 6653049Abstract: The present invention provides new light absorbing compositions suitable for use as antireflective coating compositions (“ARCs”), particularly for deep UV applications. The antireflective compositions of the invention in general comprise a resin binder component that contains a high molecular weight polymer, e.g. a polymer having an Mw of at least about 40,000 daltons. ARCs of the invention exhibit exceptional conformality upon application to a substrate surface. For example, ARCs of the invention can coat substantial topography such as vertical and sloping steps with high conformality.Type: GrantFiled: February 17, 2001Date of Patent: November 25, 2003Assignee: Shipley Company, L.L.C.Inventors: Edward K. Pavelchek, Manuel DoCanto, Timothy G. Adams
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Publication number: 20030209515Abstract: New organic-based radiation absorbing compositions are provided that are suitable for use as an antireflective coating composition (“ARC”) for an overcoated photoresist. These compositions also serve effectively as a hard mask layer by exhibiting a sufficient plasma etch selectively from an undercoated dielectric layer.Type: ApplicationFiled: June 9, 2003Publication date: November 13, 2003Applicant: Shipley Company, L.L.C.Inventor: Edward K. Pavelchek
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Patent number: 6602652Abstract: The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition (ARC), particularly suitable for short wavelength imaging applications such as 193 nm. The ARCs of the invention are preferably used with an overcoated resist layer (i.e. bottom layer ARCs) and in general comprise novel ARC resin binders that can effectively absorb reflected sub-200 nm exposure radiation.Type: GrantFiled: April 20, 2002Date of Patent: August 5, 2003Assignee: Shipley Company, L.L.C.Inventors: Timothy G. Adams, Edward K. Pavelchek, Roger F. Sinta, Manuel DoCanto, Robert F. Blacksmith, Peter Trefonas, III
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Publication number: 20030008237Abstract: Antireflective compositions are provided that contain an ionic thermal acid generator material. Use of such a thermal acid generator material can significantly increase the shelf life of solutions of antireflective compositions in protic media. Antireflective compositions of the invention can be effectively used at a variety of wavelengths used to expose an overcoated photoresist layer, including 248 nm and 193 nm.Type: ApplicationFiled: May 10, 2002Publication date: January 9, 2003Applicant: Shipley Company, L.L.C.Inventors: Edward K. Pavelchek, Peter Trefonas
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Publication number: 20020195419Abstract: New organic-based radiation absorbing compositions are provided that are suitable for use as an antireflective coating composition (“ARC”) for an overcoated photoresist. These compositions also serve effectively as a hard mask layer by exhibiting a sufficient plasma etch selectively from an undercoated dielectric layer.Type: ApplicationFiled: June 11, 1999Publication date: December 26, 2002Inventor: EDWARD K. PAVELCHEK
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Publication number: 20020172896Abstract: The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition (ARC), particularly suitable for short wavelength imaging applications such as 193 nm. The ARCs of the invention are preferably used with an overcoated resist layer (i.e. bottom layer ARCs) and in general comprise novel ARC resin binders that can effectively absorb reflected sub-200 nm exposure radiation.Type: ApplicationFiled: April 20, 2002Publication date: November 21, 2002Applicant: Shipley Company, L.L.C.Inventors: Timothy G. Adams, Edward K. Pavelchek, Roger F. Sinta, Manuel DoCanto, Robert F. Blacksmith, Peter Trefonas
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Patent number: 6461717Abstract: Disclosed are compositions and methods for providing substantially planarized surfaces in the manufacture of electronic devices. Also disclosed are compositions and methods for protecting apertures in the manufacture of electronic devices.Type: GrantFiled: April 24, 2000Date of Patent: October 8, 2002Assignee: Shipley Company, L.L.C.Inventors: Edward W. Rutter, Jr., Peter Trefonas, III, Edward K. Pavelchek