Abstract: A shaft for a medical device includes an outer sheath and a flexible spiral wrap therein. The flexibility of the spiral wrap is modified by changing the width of the wraps of a spiral, the thickness of the wraps of a spiral, or the gap spacing of the spiral. The spacing between wraps is maintained by attaching the spiral wrap to the cover sheath that surrounds the spiral wrap at two or more locations.

Abstract: A composition and method are disclosed in which a solution comprising zingiber officinale, dioscorea and a salt are administered to a soft palate and uvula of a host. The solution preferably includes chamomile and a suitable delivery agent that will preferably hold the active ingredients in solution. The solution is preferably administered in the form of a throat spray or nose drop and may also include a flavoring agent.

Abstract: In a stapling machine, an ejector blade can be moved to eject a staple through a staple ejection slot towards an anvil adapted to clinch the ends of the arms of the staple. The staple ejector blade is moved by an actuator element. A toggle is provided which maintains the actuator element in a first position until a predetermined force has been applied to the actuator element. The toggle then releases the actuator element permitting the actuator element to move the ejector blade to eject a staple through the staple ejection slot towards the anvil.

Abstract: Photosensitive homopolymers and substantially non-crosslinked copolymers containing the recurring unit: ##EQU1## R.sub.1 may be substituted or unsubstituted alkylene, aralkylene, alkoxyalkylene or aryloxyalkylene. R.sub.2 is a substituted or unsubstituted aryl group or heterocyclic group having aromatic character. R.sub.3, R.sub.4, and R.sub.5 are hydrogen, halogen or lower alkyl. R.sub.6 and R.sub.7 may be hydrogen, halogen, nitro, lower alkyl, phenyl, substituted phenyl, phenoxy and lower alkoxy. Lithographic plates bearing these photosensitive polymers can be stored without deterioration for extended periods prior to exposure, and produce highly abrasion resistant plates on being exposed. The photosensitive polymers of the invention are preferably produced by homopolymerization of novel monomers having the general formula ##EQU2## where R.sub.1 .sub.' is alkylene, haloalkylene, alkoxyalkylene, aminoalkylene, cycloalkylene, aralkylene, cycloalkylalkylene, cyanoalkylene, and aryloxyalkylene, and R.sub.2, R.