Patents by Inventor Edward Robins
Edward Robins has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9641615Abstract: A distributed network of storage elements (DNSE) is provided in which the physical capacity of each drive is split into a set of equal sized logical splits which are individually protected within the DNSE using separate RAID groups. To reduce restoration latency, members of the RAID groups having a member in common on a given drive are spread within the DNSE to minimize the number of sets of drives within the DNSE that have RAID members in common. By causing the splits to be protected by RAID groups, restoration of the splits may occur in parallel involving multiple drives within the DNSE. By minimizing the overlap between RAID members on various drives, failure of a given drive will not require multiple reads from another drive in the DNSE. Likewise, spare splits are distributed to enable write recovery to be performed in parallel on multiple drives within the DNSE.Type: GrantFiled: March 31, 2014Date of Patent: May 2, 2017Assignee: EMC IP HOLDING COMPANY LLCInventors: Edward Robins, Kevin E. Granlund, Seema Pai, Evgeny Malkevich, Stephen Richard Ives, Roii Raz, Barak Bejerano
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Patent number: 8530045Abstract: A process for the production of a polymeric film comprising a copolyester having an acid component and a diol component, said acid component comprising a dicarboxylic acid and a sulfomonomer containing a sulfonate group attached to the aromatic nucleus of an aromatic dicarboxylic acid, said process comprising the steps of: (i) melt-extruding a layer of said copolyester; (ii) stretching the extrudate in at least one direction; (iii) heat-setting the film by raising the temperature of the stretched film to a temperature T1 in a first heating zone such that (TM?T1 is in the range of from 5 to 30° C., and then raising the temperature of the film to a temperature T2 in a second heating zone such that (TM?T2 is in the range of from 0 to 10° C.Type: GrantFiled: February 23, 2010Date of Patent: September 10, 2013Inventors: William Alasdair MacDonald, Pierre Georges Osborne Moussalli, Kenneth Evans, Julian Peter Attard, David Boyce, Brian John Farmer, David Edward Robins
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Publication number: 20110206607Abstract: Disclosed herein are compounds of Formula (I), or a pharmaceutically acceptable salt, ester, amide, thereof; and methods of modulating the activity of a cannabinoid CB2 receptor comprising contacting a compound of Formula I with the cannabinoid CB2 receptor. Also disclosed are methods of imaging of a tissue by positron emission tomography, the method comprising administering to the subject a compound of Formula I, wherein the compound comprises a radioisotope. Also disclosed are methods of measuring the relative concentration of cannabinoid CB2 receptors in tissue of a subject, by using a compound of Formula I which comprises a radioisotope. In addition, method of diagnosing a disorder in a subject are disclosed.Type: ApplicationFiled: May 9, 2008Publication date: August 25, 2011Inventors: Roger Olsson, Ethan Burstein, Anne Eeg Knapp, Jorgen Eskildsen, Joel Castillo, James Nairne, Veronique Morisson-Iveson, Edward Robins, Alex Gibson
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Publication number: 20100212804Abstract: A process for the production of a polymeric film comprising a copolyester having an acid component and a diol component, said acid component comprising a dicarboxylic acid and a sulfomonomer containing a sulfonate group attached to the aromatic nucleus of an aromatic dicarboxylic acid, said process comprising the steps of: (i) melt-extruding a layer of said copolyester; (ii) stretching the extrudate in at least one direction; (iii) heat-setting the film by raising the temperature of the stretched film to a temperature T1 in a first heating zone such that (TM?T1 is in the range of from 5 to 30° C., and then raising the temperature of the film to a temperature T2 in a second heating zone such that (TM?T2 is in the range of from 0 to 10° C.Type: ApplicationFiled: February 23, 2010Publication date: August 26, 2010Applicant: DuPont Teijin Films U.S. Limited PartnershipInventors: William Alasdair MacDonald, Pierre Georges Osborne Moussalli, Kenneth Evans, Jullian Peter Attard, David Boyce, Christopher Charles Naylor, Brian John Farmer, David Edward Robins
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Patent number: 7718104Abstract: A process for the production of a polymeric film comprising a copolyester having an acid component and a diol component, said acid component comprising a dicarboxylic acid and a sulfomonomer containing a sulfonate group attached to the aromatic nucleus of an aromatic dicarboxylic acid, said process comprising the steps of: (i) melt-extruding a layer of said copolyester; (ii) stretching the extrudate in at least one direction; (iii) heat-setting the film by raising the temperature of the stretched film to a temperature T1 in a first heating zone such that (TM-T1) is in the range of from 5 to 30° C., and then raising the temperature of the film to a temperature T2 in a second heating zone such that (TM-T2 is in the range of from 0 to 10° C.Type: GrantFiled: December 6, 2002Date of Patent: May 18, 2010Assignee: Dupont Teijin Films US Ltd.Inventors: William Alasdair MacDonald, Pierre Georges Osborne Moussalli, Kenneth Evans, Julian Peter Attard, David Boyce, Christopher Charles Naylor, Brian John Farmer, legal representative, David Edward Robins, legal representative
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Publication number: 20100105949Abstract: Radiolabelled acid chlorides may be synthesised by reacting a radiolabelled carboxylic acid with a solid-phase supported chlorinating agent.Type: ApplicationFiled: January 4, 2010Publication date: April 29, 2010Inventors: DAVID ROBERT TURTON, Edward Robins
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Patent number: 7642375Abstract: Radiolabelled acid chlorides may be synthesised by reacting a radiolabelled carboxylic acid with a solid-phase supported chlorinating agent.Type: GrantFiled: March 18, 2005Date of Patent: January 5, 2010Assignee: Hammersmith Imanet LimitedInventors: David Robert Turton, Edward Robins
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Patent number: 7521262Abstract: The present invention is directed to a silicon substrate having a monolayer formed by an electrochemically-induced reaction between silicon hydride moieties on the silicon surface and optionally substituted alkynes covalently bound to the surface of the silicon substrate and to a method for electrochemically producing such a functionalized silicon substrate. The method of forming a covalently bound monolayer on a silicon surface comprises the steps of contacting the silicon surface with a C2-C24 alkyne and electrografting optionally substituted alkynes to the silicon surface.Type: GrantFiled: December 10, 2004Date of Patent: April 21, 2009Assignee: Purdue Research FoundationInventors: Jillian M. Buriak, Michael P. Stewart, Edward Robins
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Publication number: 20070287837Abstract: Radiolabelled acid chlorides may be synthesised by reacting a radiolabelled carboxylic acid with a solid-phase supported chlorinating agent.Type: ApplicationFiled: March 18, 2005Publication date: December 13, 2007Inventors: David Turton, Edward Robins
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Publication number: 20060120958Abstract: The invention relates to a process for the production of an 18F-labelled tracer which comprises treatment of a solid support-bound precursor of formula (I): SOLID SUPPORT-LINKER-I+-TRACER (I) Y? wherein the TRACER is of formula (A): or an amine protected derivative thereof, wherein Y? is an anion, preferably trifluoromethylsulphonate (triflate) anion; and R1 is either (i) a group CH—NP1AP2A in which P1A and P2A are each independently hydrogen or a protecting group, or (ii) a carbonyl group; with 18F? to produce the labelled tracer of formula (II) or an amine protected derivative thereof, wherein R1 is as defined for the compound of formula (I).Type: ApplicationFiled: December 19, 2003Publication date: June 8, 2006Inventors: Frank Brady, Saijnder Luthra, Edward Robins
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Publication number: 20050106401Abstract: The present invention is directed to a silicon substrate having a monolayer formed by an electrochemically-induced reaction between silicon hydride moieties on the silicon surface and optionally substituted alkynes covalently bound to the surface of the silicon substrate and to a method for electrochemically producing such a functionalized silicon substrate. The method of forming a covalently bound monolayer on a silicon surface comprises the steps of contacting the silicon surface with a C2-C24 alkyne and electrografting optionally substituted alkynes to the silicon surface.Type: ApplicationFiled: December 10, 2004Publication date: May 19, 2005Inventors: Jillian Buriak, Michael Stewart, Edward Robins
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Patent number: 6846681Abstract: The present invention is directed to a silicon substrate having a monolayer formed by an electrochemically-induced reaction between silicon hydride moieties on the silicon surface and optionally substituted alkynes covalently bound to the surface of the silicon substrate and to a method for electrochemically producing such a functionalized silicon substrate. The method of forming a covalently bound monolayer on a silicon surface comprises the steps of contacting the silicon surface with a C2-C24 alkyne and electrografting optionally substituted alkynes to the silicon surface.Type: GrantFiled: July 19, 2002Date of Patent: January 25, 2005Assignee: Purdue Research FoundationInventors: Jillian M. Buriak, Michael P. Stewart, Edward Robins
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Publication number: 20020197389Abstract: The present invention is directed to a silicon substrate having a monolayer formed by an electrochemically-induced reaction between silicon hydride moieties on the silicon surface and optionally substituted alkynes covalently bound to the surface of the silicon substrate and to a method for electrochemically producing such a functionalized silicon substrate. The method of forming a covalently bound monolayer on a silicon surface comprises the steps of contacting the silicon surface with a C2-C24 alkyne and electrografting optionally substituted alkynes to the silicon surface.Type: ApplicationFiled: July 19, 2002Publication date: December 26, 2002Inventors: Jillian M. Buriak, Michael P. Stewart, Edward Robins
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Patent number: 6485986Abstract: The present invention is directed to a silicon substrate having a monolayer formed by an electrochemically-induced reaction between silicon hydride moieties on the silicon surface and optionally substituted alkynes covalently bound to the surface of the silicon substrate and to a method for electrochemically producing such a functionalized silicon substrate. The method of forming a covalently bound monolayer on a silicon surface comprises the steps of contacting the silicon surface with a C2-C24 alkyne and electrografting optionally substituted alkynes to the silicon surface.Type: GrantFiled: November 20, 2000Date of Patent: November 26, 2002Assignee: Purdue Research FoundationInventors: Jillian M. Buriak, Michael P. Stewart, Edward Robins
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Patent number: 3961483Abstract: The present invention discloses an engine with 25 to 70% better overall efficiency with exhaust emissions within present EPA 1975 standards. The vane type rotary engine uses exhaust from a multichamber Otto cycle engine to power a Stirling cycle engine on the same shaft. Fuel burned in the high surface to volume ratio chambers in the Otto cycle produce very little NO.sub.2 + N.sub.0 gas while producing excessive amounts of unburned hydrocarbons. Air injection into the extremely hot exhaust gases characteristic of the vane type engine is used in a hot wall continuous burning afterburner to remove unburned hydrocarbons and boost the temperature prior to the Stirling cycle hot side heat exchanger.Type: GrantFiled: July 3, 1975Date of Patent: June 8, 1976Assignee: The Boeing CompanyInventor: Edward Robin Wiley