Patents by Inventor Edward Siqi Luo

Edward Siqi Luo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11949202
    Abstract: A gas recycle system includes a gas purifier system; a gas analysis system; a gas blending system that prepares a recycled gas mixture; and a control system configured to: determine whether a measured amount of at least one intended gas component is within a first range of acceptable values; and determine whether a measured amount of the at least one impurity gas component is within a second range of acceptable values. If the measured amount of the at least one intended gas component is not within the first range of acceptable values, the control system causes the gas blending system to add an additional gas component to the purified gas mixture to prepare the recycled gas mixture; and if the measured amount of the at least one impurity gas is not within the second range of acceptable values, the control system generates an error signal.
    Type: Grant
    Filed: February 15, 2018
    Date of Patent: April 2, 2024
    Assignee: Cymer, LLC
    Inventors: Yzzer Roman Gutierrez, Walter Dale Gillespie, Edward Siqi Luo, Dinesh Adinath Kanawade
  • Patent number: 11949203
    Abstract: A gas chamber supply system includes a gas source configured to fluidly connect to a gas chamber and to supply a gas mixture to the gas chamber, the gas source including: a pre-prepared gas supply including a gas mixture, the gas mixture including a plurality of gas components and lacking a halogen; a recycled gas supply including the gas mixture; and a fluid flow switch connected to the pre-prepared gas supply and to the recycled gas supply. The gas chamber supply also includes a control system configured to: determine if the relative concentration between the gas components within the recycled gas supply is within an acceptable range; and provide a signal to the fluid flow switch to thereby select one of the pre-prepared gas supply and the recycled gas supply to as the gas source based on the determination.
    Type: Grant
    Filed: January 10, 2019
    Date of Patent: April 2, 2024
    Assignee: Cymer, LLC
    Inventors: Yzzer Roman Gutierrez, Walter Dale Gillespie, Edward Siqi Luo, Dinesh Adinath Kanawade
  • Patent number: 11754541
    Abstract: An apparatus includes: a gas maintenance system having a gas supply system fluidly connected to one or more gas discharge chambers; a detection apparatus fluidly connected to each gas discharge chamber; and a control system connected to the gas maintenance system and the detection apparatus. The detection apparatus includes: a vessel defining a reaction cavity that houses a metal oxide and is fluidly connected to the gas discharge chamber for receiving mixed gas including fluorine from the gas discharge chamber in the reaction cavity, the vessel enabling a reaction between the fluorine of the received mixed gas and the metal oxide to form a new gas mixture including oxygen; and an oxygen sensor fluidly connected to the new gas mixture to sense an amount of oxygen within the new gas mixture. The control system is configured to estimate a concentration of fluorine in the received mixed gas.
    Type: Grant
    Filed: September 10, 2018
    Date of Patent: September 12, 2023
    Assignee: Cymer, LLC
    Inventors: Joshua Jon Thornes, Rahul Ahlawat, Edward Siqi Luo, Gamaralalage G. Padmabandu
  • Publication number: 20230016894
    Abstract: Provided is a light source apparatus and an electrode design for use in a discharge chamber of the light source apparatus. The discharge chamber is configured to hold a gas discharge medium configured to output a light beam. The light source apparatus include a pair of opposed electrodes configured to excite a gas medium to form a discharge plasma. At least one electrode of the pair of opposing electrodes may include recessed portions or hollowed-out portions at each end of the electrode, or at other suitable locations. The disclosed electrode structures improve uniformity of the erosion profile of the electrodes, significantly extending the lifespan of the discharge chamber by redistributing the discharge particle flux through the electrode with an optimized design of the electrode geometry, as the local discharge particle flux is reduced at the recessed portions.
    Type: Application
    Filed: December 10, 2020
    Publication date: January 19, 2023
    Inventors: Edward Siqi Luo, Zhou Wang
  • Patent number: 11349273
    Abstract: Disclosed is a laser discharge chamber in which useful lifetime is extended by local electrical tuning using one or a combination of design of the chamber internal geometry, placement and distribution of components within the chamber such as electrodes, current returns, and capacitors, and selective electrical isolation of portions of the components.
    Type: Grant
    Filed: December 17, 2018
    Date of Patent: May 31, 2022
    Assignee: Cymer, LLC
    Inventors: Edward Siqi Luo, Richard Carl Ujazdowski, Shuang Xu
  • Publication number: 20210066880
    Abstract: Disclosed is a laser discharge chamber in which useful lifetime is extended by local electrical tuning using one or a combination of design of the chamber internal geometry, placement and distribution of components within the chamber such as electrodes, current returns, and capacitors, and selective electrical isolation of portions of the components
    Type: Application
    Filed: December 17, 2018
    Publication date: March 4, 2021
    Inventors: Edward Siqi Luo, Richard Carl Ujazdowski, Shuang Xu
  • Publication number: 20200358240
    Abstract: A gas recycle system includes a gas purifier system; a gas analysis system; a gas blending system that prepares a recycled gas mixture; and a control system configured to: determine whether a measured amount of at least one intended gas component is within a first range of acceptable values; and determine whether a measured amount of the at least one impurity gas component is within a second range of acceptable values. If the measured amount of the at least one intended gas component is not within the first range of acceptable values, the control system causes the gas blending system to add an additional gas component to the purified gas mixture to prepare the recycled gas mixture; and if the measured amount of the at least one impurity gas is not within the second range of acceptable values, the control system generates an error signal.
    Type: Application
    Filed: February 15, 2018
    Publication date: November 12, 2020
    Inventors: Yzzer Roman Gutierrez, Walter Dale Gillespie, Edward Siqi Luo, Dinesh Adinath Kanawade
  • Publication number: 20200358241
    Abstract: A gas chamber supply system includes a gas source configured to fluidly connect to a gas chamber and to supply a gas mixture to the gas chamber, the gas source including: a pre-prepared gas supply including a gas mixture, the gas mixture including a plurality of gas components and lacking a halogen; a recycled gas supply including the gas mixture; and a fluid flow switch connected to the pre-prepared gas supply and to the recycled gas supply. The gas chamber supply also includes a control system configured to: determine if the relative concentration between the gas components within the recycled gas supply is within an acceptable range; and provide a signal to the fluid flow switch to thereby select one of the pre-prepared gas supply and the recycled gas supply to as the gas source based on the determination.
    Type: Application
    Filed: January 10, 2019
    Publication date: November 12, 2020
    Inventors: Yzzer Roman Gutierrez, Walter Dale Gillespie, Edward Siqi Luo, Dinesh Adinath Kanawade
  • Publication number: 20200340965
    Abstract: An apparatus includes: a gas maintenance system having a gas supply system fluidly connected to one or more gas discharge chambers; a detection apparatus fluidly connected to each gas discharge chamber; and a control system connected to the gas maintenance system and the detection apparatus. The detection apparatus includes: a vessel defining a reaction cavity that houses a metal oxide and is fluidly connected to the gas discharge chamber for receiving mixed gas including fluorine from the gas discharge chamber in the reaction cavity, the vessel enabling a reaction between the fluorine of the received mixed gas and the metal oxide to form a new gas mixture including oxygen; and an oxygen sensor fluidly connected to the new gas mixture to sense an amount of oxygen within the new gas mixture. The control system is configured to estimate a concentration of fluorine in the received mixed gas.
    Type: Application
    Filed: September 10, 2018
    Publication date: October 29, 2020
    Inventors: Joshua Jon Thornes, Rahul Ahlawat, Edward Siqi Luo, Gamaralalage G. Padmabandu