Abstract: The present invention relates to systems and methods for solid freeform fabrication, especially fused deposition modeling, as well as various articles made using the same, where the systems and methods utilize certain thermoplastic polyurethanes which are particularly suited for such processing. The useful thermoplastic polyurethanes are derived from (a) a polyisocyanate component, (b) a polyol component, and (c) an optional chain extender component where the resulting thermoplastic polyurethane has a crystallization temperature above 80° C. and retains more than 20% of its shear storage modulus at 100° C. relative to its shear storage modulus at 20° C.

Abstract: The present invention relates to systems and methods for solid freeform fabrication, especially selective laser sintering, as well as various articles made using the same, where the systems and methods utilize certain thermoplastic polyurethanes which are particularly suited for such processing. The useful thermoplastic polyurethanes are derived from (a) a polyisocyanate component, (b) a polyol component, and (c) an optional chain extender component; wherein the resulting thermoplastic polyurethane has a melting enthalpy of at least 5.5J/g, a Tc (crystallization temperature) of more than 70° C., a ?(Tm:Tc) of from 20 to 75 degrees, where ?(Tm:Tc) is the difference between the Tm (melting temperature) and Tc.

Abstract: The present invention relates to systems and methods for solid freeform fabrication, especially selective laser sintering, as well as various articles made using the same, where the systems and methods utilize certain thermoplastic polyurethanes which are particularly suited for such processing. The useful thermoplastic polyurethanes are derived from (a) a polyisocyanate component, (b) a polyol component, and (c) an optional chain extender component; wherein the resulting thermoplastic polyurethane has a melting enthalpy of at least 5.5 J/g, a Tc (crystallization temperature) of more than 70° C., a ?(Tm:Tc) of from 20 to 75 degrees, where ?(Tm:Tc) is the difference between the Tm (melting temperature) and Tc.

Abstract: The present invention relates to systems and methods for solid freeform fabrication, especially fused deposition modeling, as well as various articles made using the same, where the systems and methods utilize certain thermoplastic polyurethanes which are particularly suited for such processing. The useful thermoplastic polyurethanes are derived from (a) a polyisocyanate component, (b) a polyol component, and (c) an optional chain extender component where the resulting thermoplastic polyurethane has a crystallization temperature above 80° C. and retains more than 20% of its shear storage modulus at 100° C. relative to its shear storage modulus at 20° C.

Abstract: The present invention relates to systems and methods for solid freeform fabrication, especially selective laser sintering, as well as various articles made using the same, where the systems and methods utilize certain thermoplastic polyurethanes which are particularly suited for such processing. The useful thermoplastic polyurethanes are derived from (a) a polyisocyanate component, (b) a polyol component, and (c) an optional chain extender component; wherein the resulting thermoplastic polyurethane has a melting enthalpy of at least 5.5 J/g, a Tc (crystallization temperature) of more than 70° C., a ?(Tm:Tc) of from 20 to 75 degrees, where ?(Tm:Tc) is the difference between the Tm (melting temperature) and Tc.

Abstract: The present invention relates to systems and methods for solid freeform fabrication, especially selective laser sintering, as well as various articles made using the same, where the systems and methods utilize certain thermoplastic polyurethanes which are particularly suited for such processing. The useful thermoplastic polyurethanes are derived from (a) a polyisocyanate component, (b) a polyol component, and (c) an optional chain extender component; wherein the resulting thermoplastic polyurethane has a melting enthalpy of at least 5.5 J/g, a Tc (crystallization temperature) of more than 70° C., a ?(Tm:Tc) of from 20 to 75 degrees, where ?(Tm:Tc) is the difference between the Tm (melting temperature) and Tc.

Abstract: The present invention relates to systems and methods for solid freeform fabrication, especially fused deposition modeling, as well as various articles made using the same, where the systems and methods utilize certain thermoplastic polyurethanes which are particularly suited for such processing. The useful thermoplastic polyurethanes are derived from (a) a polyisocyanate component, (b) a polyol component, and (c) an optional chain extender component where the resulting thermoplastic polyurethane has a crystallization temperature above 80° C. and retains more than 20% of its shear storage modulus at 100° C. relative to its shear storage modulus at 20° C.

Abstract: The present invention relates to systems and methods for solid freeform fabrication, especially selective laser sintering, as well as various articles made using the same, where the systems and methods utilize certain thermoplastic polyurethanes which are particularly suited for such processing. The useful thermoplastic polyurethanes are derived from (a) a polyisocyanate component, (b) a polyol component, and (c) an optional chain extender component; wherein the resulting thermoplastic polyurethane has a melting enthalpy of at least 5.5 J/g, a Tc (crystallization temperature) of more than 70° C., a ?(Tm:Tc) of from 20 to 75 degrees, where ?(Tm:Tc) is the difference between the Tm (melting temperature) and Tc.

Abstract: The present invention relates to systems and methods for solid freeform fabrication, especially fused deposition modeling, as well as various articles made using the same, where the systems and methods utilize certain thermoplastic polyurethanes which are particularly suited for such processing. The useful thermoplastic polyurethanes are derived from (a) a polyisocyanate component, (b) a polyol component, and (c) an optional chain extender component where the resulting thermoplastic polyurethane has a crystallization temperature above 80° C. and retains more than 20% of its shear storage modulus at 100° C. relative to its shear storage modulus at 20° C.

Abstract: The disclosed technology relates to a system and approach to achieve temporary adhesion of a hot-melt bonding film to a substrate, including for example a textile, leather, synthetic leather, or nonwoven substrate, so that the hot-melt film stays in place before and during the hot-melt bonding of the substrate to one or more other parts, and can even be re-positioned if needed, and then still stay in place before and during the hot-melt bonding process. In particular, an adhesive system is disclosed comprising a hot-melt adhesive and (ii) a pressure sensitive adhesive, where the hot-melt adhesive is in the form of a continuous film and where the pressure sensitive adhesive is distributed on at least one surface of said continuous film in a discontinuous pattern. In preferred embodiments said hot-melt adhesive comprises a thermoplastic polyurethane and said pressure-sensitive adhesive comprises an acrylic polymer dispersion.