Patents by Inventor Edward W. Rutter

Edward W. Rutter has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Polymer remover
    Publication number: 20040229762
    Abstract: Compositions useful for the removal of polymeric material from substrates, such as magnetoresistive sensors, are provided. Methods of removing such polymeric material from magnetoresistive sensors and methods of manufacturing magnetoresistive sensors are also provided.
    Type: Application
    Filed: May 13, 2004
    Publication date: November 18, 2004
    Applicant: Rohm and Haas Electronic Materials, L.L.C.
    Inventor: Edward W. Rutter
  • Stripper
    Publication number: 20040220066
    Abstract: Compositions suitable for removing polymeric material, particularly post-plasma etch polymeric material, from a substrate are provided. These compositions contain one or more quaternary ammonium silicates as the active component. Methods of removing polymeric material using these compositions are also provided.
    Type: Application
    Filed: April 30, 2004
    Publication date: November 4, 2004
    Applicant: Rohm and Haas Electronic Materials, L.L.C.
    Inventor: Edward W. Rutter
  • Stripping method
    Publication number: 20040076910
    Abstract: Compositions and methods for the removal of patterned photodefinable materials, such as photoresists and/or photoimageable dielectric materials, from substrates are provided. Such compositions and methods are useful in the manufacture of electronic devices. Methods of reworking electronic device substrates by removing patterned photodefinable material from an underlying organic film are also provided.
    Type: Application
    Filed: April 5, 2003
    Publication date: April 22, 2004
    Applicant: Shipley Company, L.L.C.
    Inventors: Edward W. Rutter, Cuong Manh Tran, Edward C. Orr
  • High resolution photoresist compositions
    Publication number: 20030003391
    Abstract: The invention provides photoresists and resist preparative methods. Methods of the invention include treatment of a resist resin with methylene chloride or other organic solvent to remove low molecular weight materials. It has been found that the treated resin can be formulated into resists that provide manufactured electronic devices with significantly reduced defects.
    Type: Application
    Filed: February 8, 2001
    Publication date: January 2, 2003
    Applicant: Shipley Company, L.L.C.
    Inventors: George G. Barclay, Robert G. Heumann, Edward W. Rutter, Jung-Kuang R. Chen, Margaret C. Lawson, George M. Jordhamo, Timothy M. Hughes, Wayne M. Moreau, Ann Marie Mewherter
  • Aperture fill
    Publication number: 20020110665
    Abstract: Disclosed are compositions and methods for providing substantially planarized surfaces in the manufacture of electronic devices. Also disclosed are compositions and methods for protecting apertures in the manufacture of electronic devices.
    Type: Application
    Filed: March 27, 2002
    Publication date: August 15, 2002
    Applicant: Shipley Company, L.L.C.
    Inventors: Edward W. Rutter, Peter Trefonas, Edward K. Pavelchek
  • Compatibilization treatment
    Publication number: 20010036748
    Abstract: Disclosed are compositions and methods for improving compatibility of imaging layers with dielectric layers. Also disclosed are methods of reducing or eliminating poisoning of photoresists during electronic device manufacture.
    Type: Application
    Filed: May 2, 2001
    Publication date: November 1, 2001
    Applicant: Shipley Company, L.L.C.
    Inventors: Edward W. Rutter, Leo L. Linehan