Abstract: An electric field programmable film composition is disclosed containing a binder and (a) an electron donor and an electron acceptor, wherein at least one of: (i) the concentration of the electron donor is <0.05 wt % and (ii) the concentration of the electron acceptor is <0.05 wtO/o or (b) an electron donor and an electron acceptor, wherein the electron donor and/or the electron acceptor is chemically bound to the binder. Also disclosed are methods for manufacturing an electric field programmable film on a substrate. Also disclosed are memory devices, wherein the memory device comprises an electric field programmable film.

Abstract: A solid semiconductor composition includes a solid matrix of organic semiconductor molecules and a dispersion of nanorods or nanotubes in the matrix. The nanorods or nanotubes do not form a percolating structure that spans the composition.

Abstract: A microlens of the present invention may include a liquid droplet whose position and/or surface curvature may be changed (tuned), e.g., by selectively biasing one or more electrodes configured to said droplet. The droplet may then be solidified to fix a desired configuration (e.g., focal length) of the microlens. In one embodiment, the droplet has an optically curable liquid adhesive that is polymerized under exposure to UV light. Microlenses of the present invention may be used, for example, in optical devices to obtain and then maintain optimal coupling between various optical components.

Abstract: A microlens of the present invention may include a liquid droplet whose position and/or surface curvature may be changed (tuned), e.g., by selectively biasing one or more electrodes configured to said droplet. The droplet may then be solidified to fix a desired configuration (e.g., focal length) of the microlens. In one embodiment, the droplet has an optically curable liquid adhesive that is polymerized under exposure to UV light. Microlenses of the present invention may be used, for example, in optical devices to obtain and then maintain optimal coupling between various optical components.

Abstract: A method to improve the robustness of an elongated electrode used in an arc fusion apparatus for splicing optical fibers by reshaping the tip of the elongated electrode by electrolytic etching. The method involves reshaping the substantially sharp tip of the elongated electrode by immersing it as the anode in an electrolyte solution, the electrolyte solution is one capable of dissolving an oxidation product of the elongated electrode. Then a second electrode is provided at a predetermined distance from the elongated electrode in the electrolyte solution. Afterward, an electrical current is passed, or caused to flow, between the elongated electrode and the second electrode for a predetermined period of time through the electrolyte solution to reshape the substantially sharp tip of said elongated electrode into a predetermined profile having a substantially round tip.

Abstract: Lowered cost fabrication including preparation of large bodies of void-free, high-silica glass, depends upon gellation of an aqueous sol of colloidal silica particles, followed by drying and firing of such gel. Freedom from cracks in the dried gel is the consequence of included polymeric material which wets the particles. The polymeric material is removed by thermal decomposition attended upon temperature attained in firing.

Abstract: Fusion splicing of optical fiber generally requires removal of a polymer coating from the end portions of two lengths of fiber. A conventional removal method involves immersion of the fiber ends in an appropriate polymer stripping liquid, e.g., in hot, concentrated sulfuric acid. It is known that the strength of fusion splices generally is statistically distributed, such that there exists a probability that a given splice will pass at a given proof test level. We have found that the splice strength distribution can be shifted towards higher strength if the polymer stripping liquid comprises means for insuring that the liquid is essentially free of strength-reducing particles. Preferred means are concentrated nitric acid. Exemplarily, the liquid is at a temperature in the range 170.degree.-200.degree. C. and comprises concentrated (about 95%) sulfuric acid and about 5% b.v. concentrated (about 70%) nitric acid.

Abstract: Lowered cost fabrication including preparation of large bodies of void-free, high-silica glass, depends upon gellation of an aqueous sol of colloidal silica particles, followed by drying and firing of such gel. Freedom from cracks in the dried gel is the consequence of included polymeric material which wets the particles. The polymeric material is removed by thermal decomposition attended upon temperature attained in firing.

Abstract: Distributed Bragg Reflectors of high efficacy based on alternating layers of large difference in refractive index are fabricated by epitaxial growth followed by etchant removal and back-filling to produce a structure in which alternation is between layers of retained epitaxially grown material and layers of back-filled material. Such reflectors may serve simply as mirrors or may be incorporated in a variety of devices including lasers, LEDs, detectors, optical switches in which the DBRs serve e.g. for cavitation.

Abstract: Siloxane compounds formed by the reaction of a hydridosiloxane with vinylsiloxane are employed in a wide variety of uses, e.g., coatings for optical fibers and flexible layers for touch screen cathode ray tubes. These siloxane materials are substantially improved through treatment with a lower alkene such as ethylene to prevent hydrogen evolution and undesirable crosslinking.

Abstract: Disclosed is a planar optical waveguide that is manufacturable by the compression molding or embossing of a multilayer film of polymeric material. In one embodiment, the waveguide comprises a core layer of relatively high refractive index included between cladding layers of lower refractive index. The waveguiding channels are bounded by regions where the cladding layers are in contact and from which core material has been excluded.

Abstract: Circuit boards with advantageous properties are produced through the addition of a fluorescent dye. The presence of the dye allows an expeditious inspection of the metallic pattern on the circuit board by induced fluorescence. If the circuit board is two-sided, to maintain the effectiveness of the dye, a material such as a light scattering composition is added to the circuit board substrate.

Abstract: The extent of loss produced in fibers due to the presence of OH infrared absorption bands is significantly reduced through the use of specific expedients during, for example, the preform collapse procedure. In particular, during this procedure a carbon tetrahalide composition is employed to essentially prevent the presence of any residual hydrogen-containing entity from influencing the quality of the preform and thus from influencing the quality of the fiber ultimately produced.

Abstract: Circuit boards with advantageous properties are produced through the addition of a fluorescent dye. The presence of the dye allows an expeditious inspection of the metallic pattern on the circuit board by induced fluorescence.

Abstract: Conformal layers of a silicon oxide, such as silicon dioxide, are deposited at temperatures below 600 degrees C. through the decomposition of compounds such as diacetoxyditertiarybutoxysilane. The required temperatures do not significantly affect temperature-sensitive structures. Therefore, it is possible to form silicon oxide regions in the processing of devices having these structures. More generally, lowered-temperature processing can be applied to the deposition of other materials which include silicon oxide. For example, borophosphosilicate glasses can be deposited by chemical vapor deposition processing involving flash-evaporation of a mixture of liquid precursor reagents.

Abstract: Photosensitive bodies that are sensitive to ultraviolet radiation and that exhibit excellent contrast are formed from base soluble polymers such as poly(methyl methacrylate-co-methacrylic acid) physically mixed with base insoluble materials such as o,o'-dinitrobenzyl esters. The base insoluble esters decompose upon irradiation to form base soluble entities in the irradiated regions. These irradiated portions are then soluble in basic solutions that are used to develop the desired image.

Abstract: Conformal layers of a silicon oxide, such as silicon dioxide, are deposited at temperatures below 600 degrees C. through the decomposition of compounds such as diacetoxyditertiarybutoxysilane. The required temperatures do not significantly affect temperature-sensitive structures. Therefore, it is possible to form silicon oxide regions in the processing of devices having these structures.

Abstract: Photosensitive bodies that are sensitive to ultraviolet radiation and that exhibit excellent contrast are formed from base soluble polymers such as poly(methyl methacrylate-co-methacrylic acid) physically mixed with base insoluble materials such as o,o'-dinitrobenzyl esters. The base insoluble esters decompose upon irradiation to form base soluble entities in the irradiated regions. These irradiated portions are then soluble in basic solutions that are used to develop the desired image.

Abstract: The use of polymers including an indanone entity for use as a resist in a photosensitive body used in a lithographic process leads to desirable results. These resists have excellent resolution essentially equivalent to that obtainable with poly(methyl methacrylate). Additionally, the sensitivities of these polymers to the actinic radiation typically used in photolithographic processes, e.g., radiation from a mercury lamp, is significantly better than that obtained with poly(methyl methacrylate).

Abstract: Photosensitive bodies that are sensitive to ultraviolet radiation and that exhibit excellent contrast are formed from base soluble polymers such as poly(methyl methacrylate-co-methacrylic acid) physically mixed with base insoluble materials such as o-nitrobenzyl esters. The base insoluble esters decompose upon irradiation to form base soluble entities in the irradiated regions. These irradiated portions are then soluble in basic solutions that are used to develop the desired image.