Patents by Inventor Edwin Augustinus Matheus Van Gompel

Edwin Augustinus Matheus Van Gompel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Patent number: 10705439
    Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
    Type: Grant
    Filed: February 26, 2018
    Date of Patent: July 7, 2020
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Joost Jeroen Ottens, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Marco Polizzi, Edwin Augustinus Matheus Van Gompel, Johannes Petrus Maria Smeulers, Stefan Philip Christiaan Belfroid, Herman Vogel
  • Lithographic apparatus and device manufacturing method
    Patent number: 10248033
    Abstract: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.
    Type: Grant
    Filed: September 1, 2017
    Date of Patent: April 2, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Jeroen Johannes Sophia Maria Mertens, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Antonius Johannus Van Der Net, Franciscus Johannes Herman Maria Teunissen, Patricius Aloysius Jacobus Tinnemans, Martinus Cornelis Maria Verhagen, Jacobus Johannus Leonardus Hendricus Verspay, Edwin Augustinus Matheus Van Gompel
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20180188661
    Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
    Type: Application
    Filed: February 26, 2018
    Publication date: July 5, 2018
    Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Nicolaas Rudolf KEMPER, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Joost Jeroen Ottens, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Marco Polizzi, Edwin Augustinus Matheus Van Gompel, Johannes Petrus Maria Smeulers, Stefan Philip Christiaan Belfroid, Herman Vogel
  • Lithographic apparatus and device manufacturing method
    Patent number: 9904185
    Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
    Type: Grant
    Filed: October 24, 2016
    Date of Patent: February 27, 2018
    Assignees: ASML NETHERLANDS B.V., ASML HOLDINGS N.V.
    Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Joost Jeroen Ottens, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Marco Polizzi, Edwin Augustinus Matheus Van Gompel, Johannes Petrus Maria Smeulers, Stefan Philip Christiaan Belfroid, Herman Vogel
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20180039188
    Abstract: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.
    Type: Application
    Filed: September 1, 2017
    Publication date: February 8, 2018
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Jeroen Johannes Sophia Maria MERTENS, Sjoerd Nicolaas Lambertus DONDERS, Roelof Frederik DE GRAAF, Christiaan Alexander HOOGENDAM, Antonius Johannus VAN DER NET, Franciscus Johannes Herman Maria TEUNISSEN, Patricius Aloysius Jacobus TINNEMANS, Martinus Cornelis Maria VERHAGEN, Jacobus Johannus Leonardus Hendricus VERSPAY, Edwin Augustinus Matheus VAN GOMPEL
  • Lithographic apparatus and device manufacturing method
    Patent number: 9753380
    Abstract: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.
    Type: Grant
    Filed: August 30, 2016
    Date of Patent: September 5, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Jeroen Johannes Sophia Maria Mertens, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Antonius Johannus Van Der Net, Franciscus Johannes Herman Maria Teunissen, Patricius Aloysius Jacobus Tinnemans, Martinus Cornelis Maria Verhagen, Jacobus Johannus Leonardus Hendricus Verspay, Edwin Augustinus Matheus Van Gompel
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20170045831
    Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
    Type: Application
    Filed: October 24, 2016
    Publication date: February 16, 2017
    Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Nicolaas Rudolf KEMPER, Henrikus Herman Marie COX, Sjoerd Nicolaas Lambertus DONDERS, Roelof Frederik DE GRAAF, Christiaan Alexander HOOGENDAM, Nicolaas TEN KATE, Martinus Hendrikus Antonius LEENDERS, Jeroen Johannes Sophia Maria MERTENS, Frits VAN DER MEULEN, Joost Jeroen OTTENS, Franciscus Johannes Herman Maria TEUNISSEN, Jan-Gerard Cornelis VAN DER TOORN, Martinus Cornelis Maria VERHAGEN, Marco POLIZZI, Edwin Augustinus Matheus VAN GOMPEL, Johannes Petrus Maria SMEULERS, Stefan Philip Christiaan BELFROID, Herman VOGEL
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20160370714
    Abstract: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.
    Type: Application
    Filed: August 30, 2016
    Publication date: December 22, 2016
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Jeroen Johannes Sophia Maria MERTENS, Sjoerd Nicolaas Lambertus DONDERS, Roelof Frederik DE GRAAF, Christiaan Alexander HOOGENDAM, Antonius Johannus VAN DER NET, Franciscus Johannes Herman Maria TEUNISSEN, Patricius Aloysius Jacobus TINNEMANS, Martinus Cornelis Maria VERHAGEN, Jacobus Johannus Leonardus Hendricus VERSPAY, Edwin Augustinus Matheus VAN GOMPEL
  • Lithographic apparatus and device manufacturing method
    Patent number: 9507278
    Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
    Type: Grant
    Filed: July 22, 2015
    Date of Patent: November 29, 2016
    Assignees: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik de Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Joost Jeroen Ottens, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Marco Polizzi, Edwin Augustinus Matheus Van Gompel, Johannes Petrus Maria Smeulers, Stefan Philip Christiaan Belfroid, Herman Vogel
  • Lithographic apparatus and device manufacturing method
    Patent number: 9436097
    Abstract: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.
    Type: Grant
    Filed: December 30, 2014
    Date of Patent: September 6, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Jeroen Johannes Sophia Maria Mertens, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Antonius Johannus Van Der Net, Franciscus Johannes Herman Maria Teunissen, Patricius Aloysius Jacobus Tinnemans, Martinus Cornelis Maria Verhagen, Jacobus Johannus Leonardus Hendricus Verspay, Edwin Augustinus Matheus Van Gompel
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20150323876
    Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
    Type: Application
    Filed: July 22, 2015
    Publication date: November 12, 2015
    Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Nicolaas Rudolf KEMPER, Henrikus Herman Marie COX, Sjoerd Nicolaas Lambertus DONDERS, Roelof Frederik DE GRAAF, Christiaan Alexander HOOGENDAM, Nicolaas TEN KATE, Martinus Hendrikus Antonius LEENDERS, Jeroen Johannes Sophia Maria MERTENS, Frits VAN DER MEULEN, Joost Jeroen OTTENS, Franciscus Johannes Herman Maria TEUNISSEN, Jan-Gerard Cornelis VAN DER TOORN, Martinus Cornelis Maria VERHAGEN, Marco POLIZZI, Edwin Augustinus Matheus VAN GOMPEL, Johannes Petrus Maria SMEULERS, Stefan Philip Christiaan BELFROID, Herman VOGEL
  • Lithographic apparatus and device manufacturing method
    Patent number: 9097992
    Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
    Type: Grant
    Filed: July 19, 2011
    Date of Patent: August 4, 2015
    Assignees: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederick De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Martinus Hendrukus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Joost Jeroen Ottens, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelius Maria Verhagen, Marco Polizzi, Edwin Augustinus Matheus Van Gompel, Johannes Petrus Maria Smeulers, Stefan Philip Christiaan Belfroid, Herman Vogel
  • Lithographic apparatus and device manufacturing method
    Patent number: 8913228
    Abstract: A lithographic apparatus is disclosed that is arranged to project a pattern from a patterning device onto a substrate, the lithographic apparatus has a substrate table configured to hold a substrate. The substrate table includes a conditioning system configured to hold a conditioning fluid and to condition the substrate table. The conditioning system includes a pressure damper that is in fluid communication with the conditioning system and is arranged to dampen a pressure variation in the conditioning system.
    Type: Grant
    Filed: April 3, 2007
    Date of Patent: December 16, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Maurice Wijckmans, Martinus Agnes Willem Cuijpers, Martinus Hendrikus Antonius Leenders, Frits Van Der Meulen, Joost Jeroen Ottens, Theodorus Petrus Maria Cadee, Frederik Eduard De Jong, Wilhelmus Franciscus Johannes Simons, Edwin Augustinus Matheus Van Gompel, Martin Frans Pierre Smeets, Rob Jansen, Gerardus Adrianus Antonius Maria Kusters, Martijn Van Baren
  • Lithographic apparatus and device manufacturing method
    Patent number: 8446563
    Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
    Type: Grant
    Filed: August 14, 2009
    Date of Patent: May 21, 2013
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Joost Jeroen Ottens, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Marco Polizzi, Edwin Augustinus Matheus Van Gompel, Johannes Petrus Maria Smeulers, Stefan Philip Christiaan Belfroid, Herman Vogel
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20110273675
    Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
    Type: Application
    Filed: July 19, 2011
    Publication date: November 10, 2011
    Applicants: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederick De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelius Maria Verhagen, Marco Polizzi, Edwin Augustinus Matheus Van Gompel, Stefan Philip Christiaan Belfroid, Johannes Petrus Maria Smeulers, Herman Vogel, Martinus Hendrikus Antonius Leenders, Joost Jeroen Ottens
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20090303455
    Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
    Type: Application
    Filed: August 14, 2009
    Publication date: December 10, 2009
    Applicants: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Marco Polizzi, Edwin Augustinus Matheus Van Gompel, Stefan Philip Christiaan Belfroid, Johannes Petrus Maria Smeulers, Herman Vogel, Martinus Hendrikus Antonius Leenders, Joost Jeroen Ottens
  • Lithographic apparatus and device manufacturing method
    Patent number: 7602470
    Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
    Type: Grant
    Filed: August 29, 2005
    Date of Patent: October 13, 2009
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christian Alexander Hoogendam, Nicolaas Ten Kate, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Joost Jeroen Ottens, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Marco Polizzi, Edwin Augustinus Matheus Van Gompel, Stefan Philip Christiaan Belfroid, Johannes Petrus Maria Smeulers, Herman Vogel