Patents by Inventor Edwin Augustinus Van Gompel

Edwin Augustinus Van Gompel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20070242245
    Abstract: A lithographic apparatus is disclosed that is arranged to project a pattern from a patterning device onto a substrate, the lithographic apparatus has a substrate table configured to hold a substrate. The substrate table includes a conditioning system configured to hold a conditioning fluid and to condition the substrate table. The conditioning system includes a pressure damper that is in fluid communication with the conditioning system and is arranged to dampen a pressure variation in the conditioning system.
    Type: Application
    Filed: April 3, 2007
    Publication date: October 18, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Maurice Wijckmans, Martinus Agnes Cuijpers, Martinus Hendrikus Leenders, Frits Van Der Meulen, Joost Ottens, Theodorus Cadee, Frederik De Jong, Wilhelmus Franciscus Simons, Edwin Augustinus Van Gompel, Martin Smeets, Rob Jansen, Gerardus Adrianus Kusters, Martijn Van Baren
  • Publication number: 20060087630
    Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
    Type: Application
    Filed: August 29, 2005
    Publication date: April 27, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Nicolaas Kemper, Henrikus Cox, Sjoerd Donders, Roelof Graaf, Christiaan Hoogendam, Nicolaas Kate, Martinus Hendrikus Leenders, Jeroen Mertens, Frits Meulen, Joost Ottens, Franciscus Maria Teunissen, Jan-Gerard Toorn, Martinus Verhagen, Marco Polizzi, Edwin Augustinus Van Gompel, Johannes Smeulers, Stefan Belfroid