Patents by Inventor Edwin Buis

Edwin Buis has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20060139615
    Abstract: A lithographic apparatus includes a guiding mechanism to guide a movable structure such as a mask blade of a reticle masking device, a movable part connected to the movable structure, and a substantially stationary part to guide the movable part. The movable part includes a nozzle to inject a gas in a gap between the movable and stationary parts, a contactless supply of the gas from the stationary part to the movable part being provided by a gas supply outlet in the stationary part and a gas supply inlet in the movable part. The gas supply outlet includes an inlet trench in a surface of the movable part facing the gas supply outlet of the stationary part, the trench being orientated parallel to a direction of movement of the movable part. The movable part includes a motor drive part and a counter weight part connected to an end of the motor drive part facing away from the movable structure.
    Type: Application
    Filed: December 29, 2004
    Publication date: June 29, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Maurice Mee, Edwin Buis, Johannes Adrianus Antonius Dams, Johannes Andreas Henricus Jacobs, Antoine Verweij, Erik Rekkers
  • Publication number: 20060049698
    Abstract: A substrate or a patterning device used in a lithographic apparatus and a lithographic device manufacturing method are presented. The substrate and patterning device are aligned with respect to a patterning beam and are movably supported by a support. Resonances in said support, however, may render the manufactured device unusable and/ or may render the control system complex. Therefore an actuator assembly frame with flexible coupling devices coupled to the support is provided with a number of actuators configured to move the support in a number of degrees of freedom. Thus, the resonances are damped by the flexible coupling devices resulting in a larger bandwidth for the control system and thus enabling a better position accuracy of the support.
    Type: Application
    Filed: September 9, 2004
    Publication date: March 9, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Koen Maria Zaal, Edwin Buis, Henrikus Cox, Noud Gilissen, Harmen Schoot
  • Publication number: 20050146698
    Abstract: A lithographic apparatus includes a positioning system including a first and second electromagnetic actuator. Each actuator includes two mutually co-operating electromagnetical elements which are movable with respect to one another due to force acting on the elements of the respective actuator. At least one of the actuators includes a shield configured to shield the actuator from a field generated by the other actuator. In this manner, a disturbance force due to the field is prevented to act on the shielded actuator. The invention also includes a positioning system including such actuators.
    Type: Application
    Filed: October 15, 2004
    Publication date: July 7, 2005
    Applicant: ASML Netherlands B.V.
    Inventors: Sven Hol, Edwin Buis, Patricia Vreugdewater
  • Publication number: 20050056792
    Abstract: A voice coil motor used, for example, in a positioning device associated with either a first object table or a second object table in which the coil is cooled with a cooling jacket in thermal contact with the coil, the cooling jacket comprising at least one channel for circulation of a cooling fluid, the or each channel being arranged such as to be substantially located in a portion of the cooling jacket adjacent to the coil, for use, for example, in a lithographic projection apparatus including a radiation system for supplying a projection beam of radiation, a first object table for holding a mask, a second object table for holding a substrate, a projection system for imaging irradiated portions of the mask onto target portions of the substrate. The cooling jacket may be formed of a ceramic material and may be of a monolithic construction.
    Type: Application
    Filed: October 6, 2004
    Publication date: March 17, 2005
    Applicant: ASML Netherlands B.V.
    Inventors: Edwin Buis, Noud Gilissen, Yim Bun Kwan, Paulus Schapendonk