Patents by Inventor Edwin Cornelis Kadijk
Edwin Cornelis Kadijk has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11942340Abstract: An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including an improved load lock unit is disclosed. An improved load lock system may comprise a plurality of supporting structures configured to support a wafer and a conditioning plate including a heat transfer element configured to adjust a temperature of the wafer. The load lock system may further comprise a gas vent configured to provide a gas between the conditioning plate and the wafer and a controller configured to assist with the control of the heat transfer element.Type: GrantFiled: July 6, 2022Date of Patent: March 26, 2024Assignee: ASML Netherlands B.V.Inventors: Jeroen Gerard Gosen, Te-Yu Chen, Dennis Herman Caspar Van Banning, Edwin Cornelis Kadijk, Martijn Petrus Christianus Van Heumen, Erheng Wang, Johannes Andreas Henricus Maria Jacobs
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Publication number: 20230127070Abstract: Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing.Type: ApplicationFiled: December 22, 2022Publication date: April 27, 2023Applicant: ASML Netherlands B.V.Inventors: Nicolaas Rudolf KEMPER, Sjoerd Nicolaas Lambertus DONDERS, Joost Jeroen OTTENS, Edwin Cornelis KADIJK, Sergei SHULEPOV
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Publication number: 20220415678Abstract: An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including an improved load lock unit is disclosed. An improved load lock system may comprise a plurality of supporting structures configured to support a wafer and a conditioning plate including a heat transfer element configured to adjust a temperature of the wafer. The load lock system may further comprise a gas vent configured to provide a gas between the conditioning plate and the wafer and a controller configured to assist with the control of the heat transfer element.Type: ApplicationFiled: July 6, 2022Publication date: December 29, 2022Inventors: Jeroen Gerard GOSEN, Te-Yu CHEN, Dennis Herman, Caspar VAN BANNING, Edwin Cornelis KADIJK, Martijn Petrus, Christianus VAN HEUMEN, Erheng WANG, Johannes Andreas, Henricus, Maria JACOBS
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Patent number: 11537038Abstract: Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing.Type: GrantFiled: December 11, 2020Date of Patent: December 27, 2022Assignee: ASML NETHERLANDS B.V.Inventors: Nicolaas Rudolf Kemper, Sjoerd Nicolaas Lambertus Donders, Joost Jeroen Ottens, Edwin Cornelis Kadijk, Sergei Shulepov
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Patent number: 11430678Abstract: An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including an improved load lock unit is disclosed. An improved load lock system may comprise a plurality of supporting structures configured to support a wafer and a conditioning plate including a heat transfer element configured to adjust a temperature of the wafer. The load lock system may further comprise a gas vent configured to provide a gas between the conditioning plate and the wafer and a controller configured to assist with the control of the heat transfer element.Type: GrantFiled: July 17, 2019Date of Patent: August 30, 2022Assignee: ASML Netherlands B.V.Inventors: Jeroen Gerard Gosen, Te-Yu Chen, Dennis Herman Caspar Van Banning, Edwin Cornelis Kadijk, Martijn Petrus Christianus Van Heumen, Erheng Wang, Johannes Andreas Henricus Maria Jacobs
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Patent number: 11158484Abstract: An e-beam inspection tool is disclosed, the tool comprising, an electron optics system configured to generate an electron beam, an object table configured to hold a specimen, a positioning device configured to position the object table, the positioning device comprising an actuator, wherein the positioning device further comprises a heating device configured to generate a heat load and a heat load controller to control the generated heat load at least partly based on an actuator heat load generated in the actuator.Type: GrantFiled: February 28, 2020Date of Patent: October 26, 2021Assignee: ASML Netherlands B.V.Inventors: Dennis Herman Caspar Van Banning, Jeroen Gerard Gosen, Maarten Lambertus Henricus Ter Heerdt, Edwin Cornelis Kadijk
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Publication number: 20210272829Abstract: A stage apparatus including: an object table configured to hold an object; a positioning device configured to position the object table and the object held by the object table; and a remote temperature sensor configured to measure a temperature of the object table and/or the object, wherein the remote temperature sensor comprises a passive temperature sensing element.Type: ApplicationFiled: June 27, 2019Publication date: September 2, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Patriek Adrianus Alphonsus Maria BRUURS, Dennis Herman Caspar VAN BANNING, Jan-Gerard Cornelis VAN DER TOORN, Edwin Cornelis KADIJK
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Publication number: 20210173294Abstract: Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing.Type: ApplicationFiled: December 11, 2020Publication date: June 10, 2021Applicant: ASML Netherlands B.V.Inventors: Nicolaas Rudolf KEMPER, Sjoerd Nicolaas Lambertus DONDERS, Joost Jeroen OTTENS, Edwin Cornelis KADIJK, Sergei SHULEPOV
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Patent number: 10866501Abstract: Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing.Type: GrantFiled: July 20, 2011Date of Patent: December 15, 2020Assignee: ASML NETHERLANDS B.V.Inventors: Nicolaas Rudolf Kemper, Sjoerd Nicolaas Lambertus Donders, Joost Jeroen Ottens, Edwin Cornelis Kadijk, Sergei Shulepov
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Publication number: 20200203117Abstract: An e-beam inspection tool is disclosed, the tool comprising, an electron optics system configured to generate an electron beam, an object table configured to hold a specimen, a positioning device configured to position the object table, the positioning device comprising an actuator, wherein the positioning device further comprises a heating device configured to generate a heat load and a heat load controller to control the generated heat load at least partly based on an actuator heat load generated in the actuator.Type: ApplicationFiled: February 28, 2020Publication date: June 25, 2020Inventors: Dennis Herman Caspar VAN BANNING, Jeroen Gerard GOSEN, Maarten Lambertus Henricus TER HEERDT, Edwin Cornelis KADIJK
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Publication number: 20200027763Abstract: An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including an improved load lock unit is disclosed. An improved load lock system may comprise a plurality of supporting structures configured to support a wafer and a conditioning plate including a heat transfer element configured to adjust a temperature of the wafer. The load lock system may further comprise a gas vent configured to provide a gas between the conditioning plate and the wafer and a controller configured to assist with the control of the heat transfer element.Type: ApplicationFiled: July 17, 2019Publication date: January 23, 2020Inventors: Jeroen Gerard GOSEN, Te-Yu CHEN, Dennis Herman, Caspar VAN BANNING, Edwin Cornelis KADIJK, Martijn Petrus, Christianus VAN HEUMEN, Erheng WANG, Johannes Andreas, Henricus, Maria JACOBS
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Patent number: 10268128Abstract: A lithographic apparatus comprising an illumination system configured to condition a radiation beam, a support structure constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto the substrate, the lithographic apparatus being provided with a first cooling fluid circuit which is configured to cool components to a first temperature, and provided with a second cooling fluid circuit which is configured to cool components to a second temperature that is lower than the first temperature.Type: GrantFiled: June 14, 2016Date of Patent: April 23, 2019Assignee: ASML Netherlands B.V.Inventors: Franciscus Johannes Joseph Janssen, Johannes Paul Marie De La Rosette, Edwin Cornelis Kadijk, Nicolas Alban Lallemant, Jan Liefooghe, Markus Rolf Werner Matthes, Marcel Johannus Elisabeth Hubertus Muitjens, Hubert Matthieu Richard Steijns, André Gillis Van De Velde, Marinus Aart Van Den Brink
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Publication number: 20180196361Abstract: A lithographic apparatus comprising an illumination system configured to condition a radiation beam, a support structure constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto the substrate, the lithographic apparatus being provided with a first cooling fluid circuit which is configured to cool components to a first temperature, and provided with a second cooling fluid circuit which is configured to cool components to a second temperature that is lower than the first temperature.Type: ApplicationFiled: June 14, 2016Publication date: July 12, 2018Applicant: ASML Netherlands B.V.Inventors: Franciscus Johannes Joseph JANSSEN, Johannes Paul Marie DE LA ROSETTE, Edwin Cornelis KADIJK, Nicolas Alban LALLEMANT, Jan LIEFOOGHE, Markus Rolf Werner MATTHES, Marcel Johannus Elisabeth MUITJENS, Hubert Matthieu Richard STEIJNS, André Gillis VAN DE VELDE, Marinus Aart VAN DEN BRINK
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Patent number: 9235113Abstract: Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing.Type: GrantFiled: May 31, 2011Date of Patent: January 12, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Nicolaas Rudolf Kemper, Sjoerd Nicolaas Lambertus Donders, Joost Jeroen Ottens, Edwin Cornelis Kadijk, Sergei Shulepov
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Patent number: 8638421Abstract: An immersion lithographic apparatus is described in which an inlet is provided to provide cleaning fluid to a space between an object, such as a substrate, positioned on a substrate table and the substrate table.Type: GrantFiled: September 26, 2008Date of Patent: January 28, 2014Assignee: ASML Netherlands B.V.Inventors: Edwin Cornelis Kadijk, Jeroen Van Den Akker, David Lucien Anstotz
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Patent number: 8514365Abstract: An immersion lithographic apparatus is described with a drain configured to remove liquid from a gap between an edge of the substrate and the substrate table on which the substrate is supported. The drain is provided with a means to provide liquid to the drain irrespective of the position of the substrate table and/or a means to saturate gas within the drain. Those measures reduce the variations in heat load due to evaporation of liquid in the drain.Type: GrantFiled: June 1, 2007Date of Patent: August 20, 2013Assignee: ASML Netherlands B.V.Inventors: Frederik Eduard De Jong, Marcel Hendrikus Maria Beems, Marinus Aart Van Den Brink, Johannes Henricus Wilhelmus Jacobs, Martinus Hendrikus Antonius Leenders, Leon Martin Levasier, Frits Van Der Meulen, Joost Jeroen Ottens, Koen Jacobus Johannes Maria Zaal, Richard Bernardus Johannes Droste, Johannes Wilhelmus De Klerk, Peter Franciscus Wanten, Jan Cornelis Van Der Hoeven, Edwin Cornelis Kadijk, Marteijn De Jong, David Lucien Anstotz
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Patent number: 8441609Abstract: A lithographic projection apparatus is disclosed that includes a substrate table, a positioner, a projection system and a fluid handling system. The substrate table is constructed and arranged to hold a substrate, the substrate having an edge feature. The projection system is configured to project a patterned beam of radiation onto the substrate. The fluid handling system is constructed and arranged to supply a liquid flow to a space between the projection system and the substrate table and to at least partly confine the liquid to the space. The positioner is configured to position the substrate on the substrate table so that the edge feature lies downstream of the substrate in the liquid flow.Type: GrantFiled: June 19, 2009Date of Patent: May 14, 2013Assignee: ASML Netherlands B.V.Inventors: Edwin Cornelis Kadijk, Stefan Geerte Kruijswijk
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Publication number: 20110273678Abstract: Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing.Type: ApplicationFiled: July 20, 2011Publication date: November 10, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Nicolaas Rudolf KEMPER, Sjoerd Nicolaas Lambertus Donders, Joost Jeroen Ottens, Edwin Cornelis Kadijk, Sergei Shulepov
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Publication number: 20110242512Abstract: Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing.Type: ApplicationFiled: May 31, 2011Publication date: October 6, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Nicolaas Rudolf KEMPER, Sjoerd Nicolaas Lambertus DONDERS, Joost Jeroen OTTENS, Edwin Cornelis KADIJK, Sergei SHULEPOV
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Patent number: 8027019Abstract: Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing.Type: GrantFiled: March 28, 2006Date of Patent: September 27, 2011Assignee: Asml Netherlands B.V.Inventors: Nicolaas Rudolf Kemper, Sjoerd Nicolaas Lambertus Donders, Joost Jeroen Ottens, Edwin Cornelis Kadijk, Sergei Shulepov