Patents by Inventor Edwin D. Burwell

Edwin D. Burwell has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus for direct-write sputter deposition and method therefor
    Patent number: 10156011
    Abstract: A microplasma sputter deposition system suitable for directly writing two-dimensional and three-dimensional structures on a substrate is disclosed. Deposition systems in accordance with the present invention include a magnetic-field generator that provides a magnetic field that is aligned with the arrangement of an anode and a wire target. This results in a plasma discharge within a region between a wire target and an anode that is substantially a uniform sheet, which gives rise to the deposition of material on the substrate in highly uniform and radially symmetric fashion.
    Type: Grant
    Filed: October 22, 2015
    Date of Patent: December 18, 2018
    Assignee: Case Western Reserve University
    Inventors: Edwin D. Burwell, Andrew C. Barnes, Christian A. Zorman, Philip X. L. Feng, R. Mohan Sankaran
  • APPARATUS FOR DIRECT-WRITE SPUTTER DEPOSITION AND METHOD THEREFOR
    Publication number: 20160115585
    Abstract: A microplasma sputter deposition system suitable for directly writing two-dimensional and three-dimensional structures on a substrate is disclosed. Deposition systems in accordance with the present invention include a magnetic-field generator that provides a magnetic field that is aligned with the arrangement of an anode and a wire target. This results in a plasma discharge within a region between a wire target and an anode that is substantially a uniform sheet, which gives rise to the deposition of material on the substrate in highly uniform and radially symmetric fashion.
    Type: Application
    Filed: October 22, 2015
    Publication date: April 28, 2016
    Inventors: Edwin D. Burwell, Andrew C. Barnes, Christian A. Zorman, Philip X.L. Feng, R. Mohan Sankaran